Patents by Inventor Koichiro IRIE

Koichiro IRIE has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Pattern evaluation system and pattern evaluation method
    Patent number: 11428652
    Abstract: Provided is a technology for evaluating a property of a pattern formed inside a sample from two-dimensional information of the sample. A pattern evaluation system of the present disclosure includes a computer subsystem that executes a process of evaluating a property of a pattern by reading a program from a memory that stores the program for evaluating the property of the pattern formed inside a sample. The computer subsystem executes a process of acquiring an image of the sample; a process of extracting a signal waveform from the image; a process of calculating a feature amount in a predetermined region of the signal waveform; a process of comparing the feature amount with a reference value of the feature amount; and a process of evaluating the property of the pattern based upon a comparison result in the comparison process.
    Type: Grant
    Filed: April 20, 2020
    Date of Patent: August 30, 2022
    Assignee: Hitachi High-Tech Corporation
    Inventors: Koichiro Irie, Ayumi Doi, Tianming Li
  • Pattern Evaluation System and Pattern Evaluation Method
    Publication number: 20200363350
    Abstract: Provided is a technology for evaluating a property of a pattern formed inside a sample from two-dimensional information of the sample. A pattern evaluation system of the present disclosure includes a computer subsystem that executes a process of evaluating a property of a pattern by reading a program from a memory that stores the program for evaluating the property of the pattern formed inside a sample. The computer subsystem executes a process of acquiring an image of the sample; a process of extracting a signal waveform from the image; a process of calculating a feature amount in a predetermined region of the signal waveform; a process of comparing the feature amount with a reference value of the feature amount; and a process of evaluating the property of the pattern based upon a comparison result in the comparison process.
    Type: Application
    Filed: April 20, 2020
    Publication date: November 19, 2020
    Inventors: Koichiro IRIE, Ayumi DOI, Tianming LI