Patents by Inventor Koichiro Tada

Koichiro Tada has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 9674946
    Abstract: In a conductive laminate, a transparent conductive thin film laminate 2 including at least two transparent conductive thin films and a metal layer 3 are formed in this order on at least one surface of a transparent base. In the transparent conductive thin film laminate 2, a first transparent conductive thin film 21 that is closest to the metal layer 3 is a metal oxide layer, or a composite metal oxide layer containing a principal metal and at least one impurity metal. Transparent conductive thin film 22 other than the first transparent conductive thin film is a composite metal oxide layer containing a principal metal and at least one impurity metal. The content ratio of impurity metal in the first transparent conductive thin film is not the highest of content ratios of impurity metal in the transparent conductive thin films which form the transparent conductive thin film laminate 2.
    Type: Grant
    Filed: June 14, 2012
    Date of Patent: June 6, 2017
    Assignee: NITTO DENKO CORPORATION
    Inventors: Nozomi Fujino, Motoki Haishi, Koichiro Tada, Yoshimasa Sakata
  • Publication number: 20140102764
    Abstract: In a conductive laminate, a transparent conductive thin film laminate 2 including at least two transparent conductive thin films and a metal layer 3 are formed in this order on at least one surface of a transparent base. In the transparent conductive thin film laminate 2, a first transparent conductive thin film 21 that is closest to the metal layer 3 is a metal oxide layer, or a composite metal oxide layer containing a principal metal and at least one impurity metal. Transparent conductive thin film 22 other than the first transparent conductive thin film is a composite metal oxide layer containing a principal metal and at least one impurity metal. The content ratio of impurity metal in the first transparent conductive thin film is not the highest of content ratios of impurity metal in the transparent conductive thin films which form the transparent conductive thin film laminate 2.
    Type: Application
    Filed: June 14, 2012
    Publication date: April 17, 2014
    Applicant: NITTO DENKO CORPORATION
    Inventors: Nozomi Fujino, Motoki Haishi, Koichiro Tada, Yoshimasa Sakata