Abstract: To provide an active-energy-ray-curable composition including a compound represented by General Formula (I) below: where in the General Formula (I), R is hydrogen or a methyl group; A is a structure expressed by one selected from the group consisting of Structural Formulas (II) to (VII) below, each of which may have a substituent such as an alkyl group or an alkoxy group, or both; j and k in the Structural Formulas (VI) and (VII) are an integer of 0 or more; X denotes a substituent including a heteroatom; n is an integer of 0 or more, m is an integer of 1 or more, and n+m is 3 or more, or n is an integer of 0 and m is an integer of 2; and wavy lines in the Structural Formulas (II) to (VII) each independently denote a bond with X or a (meth)acryloyl group (H2C?CR—C(?O)—):

Abstract: A photobase generator includes a compound including a first skeleton represented by the following formula (a), and a second skeleton including a nitrogen atom bonding to a bonding position of the first skeleton to form an amide group, wherein the compound generates a base, in which a hydrogen atom is bonding with the nitrogen atom of the second skeleton, by light irradiation, and the pKa of a conjugate acid of the base in water is 12 or more. In formula (a), G is a divalent aromatic group, and * represents the bonding position with the nitrogen atom.

Abstract: A photoreactive composition including a base-reactive compound, a photobase generator that is represented by the following Formula (1) and that generates a base when irradiated with light, and at least one compound selected from the group consisting of a polycyclic aromatic compound having a fused ring structure having two or more rings and a polycyclic aromatic compound having three or more aromatic rings and having a conjugated structure including any two or more of the three or more aromatic rings, in which the base-reactive compound is a compound having two or more groups that will have their polarity converted by the action of a base and that exhibit reactivity, in one molecule, or a compound having two or more groups that will react under the action of a base, in one molecule.

Abstract: A coating agent has: a film-forming component containing an organosilicon compound having a radical polymerizable functional group and an alkoxysilyl group; and a film-curing component composed so that a base and a radical can be generated on irradiation with ultraviolet light. The film-curing component includes a nonionic photobase generator having no ionic bond in the molecular structure. The content of the nonionic photobase generator is 0.1 parts by mass or more and 50 parts by mass or less, based on 100 parts by mass of the organosilicon compound.

Abstract: One embodiment of the present invention provides a curable composition, including a polyfunctional isocyanate compound, a compound selected from the group consisting of a multivalent alcohol and an epoxy compound, and a base amplifier.

Abstract: A photobase generator, includes a compound including a first skeleton represented by the following formula (a); and a second skeleton including a nitrogen atom bonding to a bonding position of the first skeleton to form an amide group, and a pyridine skeleton in addition to the nitrogen atom, in which the compound generates a base in which a hydrogen atom is bonded with the nitrogen atom of the second skeleton by light irradiation. In formula (a), G is a divalent aromatic group, and * represents the bonding position with the nitrogen atom.

Abstract: A photobase generator includes a compound including: first skeletons represented by the following formula (a); and a second skeleton including nitrogen atoms bonding to bonding positions of the first skeletons to form amide groups, wherein, in a molecule, a number of the first skeletons is two or more, a number of the nitrogen atoms, configuring the amide groups, in the second skeleton is the same as the number of the first skeletons, and at least one of the nitrogen atoms configuring the amide groups is converted into a nitrogen atom configuring a secondary amine or a tertiary amine by light irradiation. In the formula (a), G is a divalent aromatic group, and * represents the bonding position with the nitrogen atom.

Abstract: A photobase generator includes a compound including a first skeleton represented by the following formula (a), and a second skeleton including a nitrogen atom bonding to a bonding position of the first skeleton to form an amide group, wherein the compound generates a base, in which a hydrogen atom is bonding with the nitrogen atom of the second skeleton, by light irradiation, and the pKa of a conjugate acid of the base in water is 12 or more. In formula (a), G is a divalent aromatic group, and * represents the bonding position with the nitrogen atom.

Abstract: A method for manufacturing an electroconductive pattern 40, provided with: a lamination step for laminating an acid generation film 10 containing an acid proliferation agent and a photoacid generator on a polymer film 20 containing an electroconductive polymer formed on a substrate 21; a masking step for masking the top of the acid generation film 10; a light irradiation step for irradiating the laminate from the acid-generation-film 10 side; a doping step for doping the electroconductive polymer with an acid generated and proliferated in the acid generation film 10 by the light irradiation; and a releasing step for releasing the acid generation film 10 from the polymer film 20. This method makes it possible to provide an electroconductive film and a method for manufacturing an electroconductive pattern in which photoacid generation and acid proliferation effects are utilized.

Abstract: An energy-sensitive composition including a polysilane, a base generator, and a solvent, the base generator including a compound represented by formula (b1) and a photo base generator: in which Rb1 to Rb3 each independently represents a hydrogen atom, halogen atom, hydroxyl group, mercapto group, sulfide group, silyl group, silanol group, nitro group, nitroso group, sulfonato group, phosphino group, phosphinyl group, phosphonato group or organic group; Rb4 and Rb5 each independently represent a hydrogen atom, halogen atom, hydroxyl group, mercapto group, sulfide group, silyl group, silanol group, nitro group, nitroso group, sulfino group, sulfo group, sulfonato group, phosphino group, phosphinyl group, phosphono group, phosphonato group or aliphatic group; and Rb6 represents a hydrogen atom, alkyl group or alkoxy group.

Abstract: An active energy ray-curable composition is disclosed including: an anionically polymerizable compound represented by (1): wherein EWG represents an electron-withdrawing group, X represents a single bond or an oxygen atom (—O—), R represents an n-valent organic group, and n represents an integer of 1 to 6; when n is an integer of 2 to 6, the respective EWG and the respective X may be the same or different; and when n is 1, EWG and R may be bonded; and a compound (photobase generator) represented by (2): wherein ring A represents an aromatic ring that may be substituted or a heteroaromatic ring that may be substituted; R1 and R2 are the same or different and each represents a hydrogen atom or an alkyl group; R1 and R2 may be bonded to each other to form a ring together with an adjacent nitrogen atom; and the ring may be substituted.

Abstract: An energy-sensitive composition including at least one of a silane compound monomer capable of forming a polysilane compound, a silane compound oligomer and the polysilane compound, and a base generator (B) represented by the following formula (1): in which R1 to R11 each independently represents a hydrogen atom, a halogen atom, a nitro group, an alkyl group, an aryl group, an arylalkyl group or an alkoxy group, R5 and R6 may be connected to each other via a single bond or a divalent linking group, Zq+ represents a q-valent counter cation composed of a base having a pKa of 24 or more, and q represents an integer of 1 or more.

Abstract: A photoreactive composition including a base-reactive compound, a photobase generator that is represented by the following Formula (1) and that generates a base when irradiated with light, and at least one compound selected from the group consisting of a polycyclic aromatic compound having a fused ring structure having two or more rings and a polycyclic aromatic compound having three or more aromatic rings and having a conjugated structure including any two or more of the three or more aromatic rings, in which the base-reactive compound is a compound having two or more groups that will have their polarity converted by the action of a base and that exhibit reactivity, in one molecule, or a compound having two or more groups that will react under the action of a base, in one molecule.

Abstract: An active energy ray-curable composition is disclosed including: an anionically polymerizable compound represented by (1): wherein EWG represents an electron-withdrawing group, X represents a single bond or an oxygen atom (—O—), R represents an n-valent organic group, and n represents an integer of 1 to 6; when n is an integer of 2 to 6, the respective EWG and the respective X may be the same or different; and when n is 1, EWG and R may be bonded; and a compound (photobase generator) represented by (2): wherein ring A represents an aromatic ring that may be substituted or a heteroaromatic ring that may be substituted; R1 and R2 are the same or different and each represents a hydrogen atom or an alkyl group; R1 and R2 may be bonded to each other to form a ring together with an adjacent nitrogen atom; and the ring may be substituted.

Abstract: To provide an active-energy-ray-curable composition including a compound represented by General Formula (I) below: where in the General Formula (I), R is hydrogen or a methyl group; A is a structure expressed by one selected from the group consisting of Structural Formulas (II) to (VII) below, each of which may have a substituent such as an alkyl group or an alkoxy group, or both; j and k in the Structural Formulas (VI) and (VII) are an integer of 0 or more; X denotes a substituent including a heteroatom; n is an integer of 0 or more, m is an integer of 1 or more, and n+m is 3 or more, or n is an integer of 0 and m is an integer of 2; and wavy lines in the Structural Formulas (II) to (VII) each independently denote a bond with X or a (meth)acryloyl group (H2C?CR—C(?O)—):

Abstract: A method for manufacturing an electroconductive pattern 40, provided with: a lamination step for laminating an acid generation film 10 containing an acid proliferation agent and a photoacid generator on a polymer film 20 containing an electroconductive polymer formed on a substrate 21; a masking step for masking the top of the acid generation film 10; a light irradiation step for irradiating the laminate from the acid-generation-film 10 side; a doping step for doping the electroconductive polymer with an acid generated and proliferated in the acid generation film 10 by the light irradiation; and a releasing step for releasing the acid generation film 10 from the polymer film 20. This method makes it possible to provide an electroconductive film and a method for manufacturing an electroconductive pattern in which photoacid generation and acid proliferation effects are utilized.

Abstract: An object of the present invention is to provide a photocuring method, which makes it possible to rapidly and efficiently obtain a crosslinked product (resin), a compound used in the photocuring method, and a photocuring resin composition containing the compound. The present invention relates to a photocuring method, which comprises a step 1 and a step 2 performed after the step 1, a compound used in the photocuring method, and a photocuring resin composition containing the compound. Step 1: this is a step in which in the presence of (A) compound having a carbonyl group generating a radical by photoirradiation and a carboxyl group decarboxylated by photoirradiation, (B) silane coupling agent having a mercapto group or a (meth)acryl group is reacted with (C) water under acidic conditions to obtain (D) silane compound having a mercapto group or a (meth)acryl group and at least one silanol group.

Abstract: A method for manufacturing an electroconductive pattern 40, provided with: a lamination step for laminating an acid generation film 10 containing an acid proliferation agent and a photoacid generator on a polymer film 20 containing an electroconductive polymer formed on a substrate 21; a masking step for masking the top of the acid generation film 10; a light irradiation step for irradiating the laminate from the acid-generation-film 10 side; a doping step for doping the electroconductive polymer with an acid generated and proliferated in the acid generation film 10 by the light irradiation; and a releasing step for releasing the acid generation film 10 from the polymer film 20. This method makes it possible to provide an electroconductive film and a method for manufacturing an electroconductive pattern in which photoacid generation and acid proliferation effects are utilized.

Abstract: The purpose of the present invention is to provide: a novel compound which can generate a base and radical upon the irradiation with an active energy ray; a photopolymerization initiator which comprises the novel compound; and a photosensitive resin composition which contains the photopolymerization initiator, has high sensitivity and excellent storage stability, and can be formed into a cured article that does not have a metal-corrosive property. The novel compound is represented by formula (1): (wherein R1 to R6 independently represent a hydrogen atom, a hydroxy group, an alkoxy group, an organic group other than the aforementioned substituents, or the like; X represents a residue having a structure such that n hydrogen atoms are removed from a saturated hydrocarbon containing a ring structure; and n represents an integer of 1 to 6).

Abstract: It is a subject of the present invention to provide a base generator which has high solubility to general-purpose organic solvents, can dissolve directly into a base-reactive compound, such as an epoxy-based compound, further is provided with both performance of high heat resistance and low nucleophilicity, and generates a strong base, a base-reactive composition comprising the base generator and a base-reactive compound, as well as a method for generating a base, etc. The present invention relates to a compound represented by the general formula (A), a base generator comprising the compound, a base-reactive composition which comprises the base generator and a base-reactive compound, as well as a method for generating a base, etc.