Abstract: The present invention provides an imprint apparatus which performs imprint processing of curing a resin on a substrate while pressing a mold against the resin, and transferring a pattern onto the substrate by separating the mold from the cured resin, the apparatus including a holding unit including a holding surface which comes into contact with the mold and configured to hold the mold on the holding surface, a measurement unit configured to measure a position of the mold on the holding surface, and a processing unit configured to perform preparation processing including at least one pressing operation of stabilizing the position of the mold on the holding surface by pressing the mold against the holding surface before the imprint processing.

Abstract: An exposure apparatus includes a light source; an illumination optical system that illuminates an original with the light; a substrate stage that holds and moves a substrate; a projection optical system that projects the light from the original, the projection optical system and the substrate having therebetween a first gap filled with liquid for exposure of the substrate; a first detector that detects a light quantity of light and passing along a light path of the illumination optical system; a second detector disposed on the substrate stage, to detect a light quantity of light transmitted through the illumination optical system and the projection optical system; and a calculator that determines a first conversion factor with respect to each of the plurality of exposure conditions used for conversion between a light quantity detected by the second detector with gas and a light quantity detected by the second detector with the liquid.

Abstract: An exposure apparatus includes a light source; an illumination optical system that illuminates an original with the light; a substrate stage that holds and moves a substrate; a projection optical system that projects the light from the original, the projection optical system and the substrate having therebetween a first gap filled with liquid for exposure of the substrate; a first detector that detects a light quantity of light and passing along a light path of the illumination optical system; a second detector disposed on the substrate stage, to detect a light quantity of light transmitted through the illumination optical system and the projection optical system; and a calculator that determines a first conversion factor with respect to each of the plurality of exposure conditions used for conversion between a light quantity detected by the second detector with gas and a light quantity detected by the second detector with the liquid.