Patents by Inventor Koji Fukuhisa

Koji Fukuhisa has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Thin metal oxide film and process for producing the same
    Patent number: 7132373
    Abstract: The present invention provides a method for producing a crystalline metal oxide thin film by first depositing a substantially amorphous metal oxide film, and thereafter, as a post treatment, exposing the film to low temperature plasma in a high frequency electric field at 180° C. or less, and the crystalline metal oxide thin film produced by this method. Because the producing method according to the present invention allows a dense and homogenous crystalline metal oxide thin film to be formed onto a substrate at a low temperature without requiring active heat treatment, a metal oxide thin film having desirable characteristics can be formed without damaging the characteristics of a substrate even if the substrate has comparatively low heat resistance.
    Type: Grant
    Filed: September 30, 2002
    Date of Patent: November 7, 2006
    Assignees: Toto Ltd., The University of Tokyo
    Inventors: Koji Fukuhisa, Akira Nakajima, Kenji Shinohara, Toshiya Watanabe, Hisashi Ohsaki, Tadashi Serikawa
  • Thin metal oxide film and process for producing the same
    Publication number: 20040241976
    Abstract: The present invention provides a method for producing a crystalline metal oxide thin film by first depositing a substantially amorphous metal oxide film, and thereafter, as a post treatment, exposing the film to low temperature plasma in a high frequency electric field at 180° C. or less, and the crystalline metal oxide thin film produced by this method. Because the producing method according to the present invention allows a dense and homogenous crystalline metal oxide thin film to be formed onto a substrate at a low temperature without requiring active heat treatment, a metal oxide thin film having desirable characteristics can be formed without damaging the characteristics of a substrate even if the substrate has comparatively low heat resistance.
    Type: Application
    Filed: June 10, 2004
    Publication date: December 2, 2004
    Inventors: Koji Fukuhisa, Akira Nakajima, Kenji Shinohara, Toshiya Watanabe, Hisashi Ohsaki, Tadashi Serikawa