Patents by Inventor Koji Hane

Koji Hane has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 8171876
    Abstract: The present invention provides applicators reducing generating bubble. Dispersion liquid is supplied while the pressure of a circulation tank on the delivery side is lower than the atmospheric pressure but higher than the pressure of the space in buffer tanks. The dispersion liquid in the discharge chambers is recovered while the pressure in a circulation tank serving as recovery destination is lower than the atmospheric pressure. Gas dissolution can be reduced because the dispersion liquid does not come into contact with gases at pressures higher than the atmospheric pressure and engulffing gas or deformation of solid microparticles can be avoided because no pump is used.
    Type: Grant
    Filed: April 28, 2008
    Date of Patent: May 8, 2012
    Assignee: Ulvac, Inc.
    Inventors: Takumi Namekawa, Kei Baba, Yuya Inoue, Masao Murata, Koji Hane, Robert D. Taff, Robert R. McKay, Ralph D. Fox
  • Patent number: 7671962
    Abstract: Providing a spacer forming method by which spacers can be securely formed in a predetermined region on a substrate. Ink containing granular spacers is jetted onto a crossing portion of a black matrix 5 in the shape of a lattice. Red pixel R, green pixel G and blue pixel B are formed in the openings of the lattice. The spacer containing ink is jetted onto the spacer forming positions from the nozzle by the ink jetting method. Plural drops of ink 7 are jetted onto each of the spacer forming positions on one of the opposite substrates E. The gap between the opposite substrates E can be securely maintained at a constant for filling with liquid crystal.
    Type: Grant
    Filed: October 18, 2005
    Date of Patent: March 2, 2010
    Assignee: Ulvac, Inc.
    Inventors: Yasuzo Tanaka, Masao Murata, Junpei Yuyama, Hiroshi Koshina, Hiroto Uchida, Koji Hane, Takanori Tsuji, Mitsuru Yahagi
  • Patent number: 7472987
    Abstract: According to a first invention, since a flow of a spacer dispersed liquid is formed in a transporting chamber separated from a discharging chamber by an internal filter, the spacer dispersed liquid is stably discharged through an ejection hole, while the discharging chamber on a side of a nozzle plate is not affected by the flow of the spacer dispersed liquid. According to a second invention, since a spacer dispersed liquid does not flow inside a discharging chamber in a printing state in which the spacer dispersed liquid is discharged, the spacer dispersed liquid is stably discharged through an ejection hole. To the contrary, since the spacer dispersed liquid is directed inside both the discharging chamber and the transporting chamber in a waiting state in which the spacer dispersed liquid is not discharged, spacer particles in the spacer dispersed liquid do not settle.
    Type: Grant
    Filed: April 25, 2007
    Date of Patent: January 6, 2009
    Assignee: ULVAC, Inc.
    Inventors: Hiroto Uchida, Masao Murata, Yasuzo Tanaka, Junpei Yuyama, Hiroshi Koshina, Yuya Inoue, Takanori Tsuji, Koji Hane
  • Publication number: 20080210160
    Abstract: The present invention provides applicators reducing generating bubble. Dispersion liquid is supplied while the pressure of a circulation tank on the delivery side is lower than the atmospheric pressure but higher than the pressure of the space in buffer tanks. The dispersion liquid in the discharge chambers is recovered while the pressure in a circulation tank serving as recovery destination is lower than the atmospheric pressure. Gas dissolution can be reduced because the dispersion liquid does not come into contact with gases at pressures higher than the atmospheric pressure and engulffing gas or deformation of solid microparticles can be avoided because no pump is used.
    Type: Application
    Filed: April 28, 2008
    Publication date: September 4, 2008
    Applicant: ULVAC, INC.
    Inventors: Takumi Namekawa, Kei Baba, Yuya Inoue, Masao Murata, Koji Hane, Robert D. Taff, Robert R. McKay, Ralph D. Fox
  • Publication number: 20070285609
    Abstract: To provide a spacer forming method by which spacers can be securely formed in a predetermined region on a substrate. Ink containing granular spacers is jetted onto a crossing portion of a black matrix 5 in the shape of lattice. Red pixel R, green pixel G and blue pixel B are formed in the openings of the lattice. The spacer containing ink is jetted onto the spacer forming positions from the nozzle by the ink jetting method. Plural drops of ink 7 are jetted onto each of the spacer forming positions on one of the opposite substrate E. The gap between the opposite substrates can be securely maintained at constant for filling liquid crystal.
    Type: Application
    Filed: October 18, 2005
    Publication date: December 13, 2007
    Inventors: Yasuzo Tanaka, Masao Murata, Junpei Yuyama, Hiroshi Koshina, Hiroto Uchida, Koji Hane, Takanori Tsuji, Mitsuru Yahagi
  • Publication number: 20070216739
    Abstract: According to a first invention, since a flow of a spacer dispersed liquid is formed in a transporting chamber separated from a discharging chamber by an internal filter, the spacer dispersed liquid is stably discharged through an ejection hole, while the discharging chamber on a side of a nozzle plate is not affected by the flow of the spacer dispersed liquid. According to a second invention, since a spacer dispersed liquid does not flow inside a discharging chamber in a printing state in which the spacer dispersed liquid is discharged, the spacer dispersed liquid is stably discharged through an ejection hole. To the contrary, since the spacer dispersed liquid is directed inside both the discharging chamber and the transporting chamber in a waiting state in which the spacer dispersed liquid is not discharged, spacer particles in the spacer dispersed liquid do not settle.
    Type: Application
    Filed: April 25, 2007
    Publication date: September 20, 2007
    Applicant: ULVAC INC.
    Inventors: Hiroto Uchida, Masao Murata, Yasuzo Tanaka, Junpei Yuyama, Hiroshi Koshina, Yuya Inoue, Takanori Tsuji, Koji Hane
  • Patent number: 7063657
    Abstract: A method of constructing underground galleries using a pneumatic transfer system and a stratum disposal method are provided, wherein in constructing a disposal gallery of a stratum disposal site and tunnels such as mountain tunnels or in performing stratum disposal of waste matter, the carrying-out of excavation chips or the like, the carrying-in of materials and equipment or the like and the carrying-in and positioning of waste matter may be effected safely, quickly and reliably at low cost, and the buffer material quality for waste matter may be secured. In construction, an air carrying pipeline (10) is used while extending the air carrying pipeline (10) downward as desired during excavation of a vertical shaft (2) so as to carry out vertical shaft excavation chips (a) to the ground and carry in materials and equipment including vertical shaft spray concrete (b) to the underground site.
    Type: Grant
    Filed: November 8, 2002
    Date of Patent: June 20, 2006
    Assignee: Kajima Corporation
    Inventors: Kazuo Okutsu, Hisashi Takamura, Koji Hane, Nobuyuki Matsui, Yasuyuki Hayakawa, Mitsuaki Furuichi
  • Publication number: 20050004416
    Abstract: A method of constructing underground galleries using a pneumatic transfer system and a stratum disposal method are provided, wherein in constructing a disposal gallery of a stratum disposal site and tunnels such as mountain tunnels or in performing stratum disposal of waste matter, the carrying-out of excavation chips or the like, the carrying-in of materials and equipment or the like and the carrying-in and positioning of waste matter may be effected safely, quickly and reliably at low cost, and the buffer material quality for waste matter may be secured. In construction, an air carrying pipeline (10) is used while extending the air carrying pipeline (10) downward as desired during excavation of a vertical shaft (2) so as to carry out vertical shaft excavation chips (a) to the ground and carry in materials and equipment including vertical shaft spray concrete (b) to the underground site.
    Type: Application
    Filed: November 8, 2002
    Publication date: January 6, 2005
    Inventors: Kazuo Okutsu, Hisashi Takamura, Koji Hane, Nobuyuki Matsui, Yasuyuki Hayakawa, Mitsuaki Furuichi