Abstract: A template and a template blank are used for imprint lithography transferring a transfer pattern in a concave and convex structure to a resin on a transfer substrate, in which a first step structure is formed on a main surface of a base, a second step structure is formed on the first step structure, and an outside region of the second step structure on an upper surface of the first step structure is covered with a light shielding film to solve the above problem.

Abstract: An imprint method using a mold and/or a transfer substrate having a mesa structure includes a resin supply step, a contact step, a curing step, and a mold release step. In the resin supply step, a balance layer is formed by supplying a molded resin also to an area outside of a pattern formation area of the transfer substrate in which a pattern structure is to be formed.

Abstract: A template and a template blank are used for imprint lithography transferring a transfer pattern in a concave and convex structure to a resin on a transfer substrate, in which a first step structure is formed on a main surface of a base, a second step structure is formed on the first step structure, and an outside region of the second step structure on an upper surface of the first step structure is covered with a light shielding film to solve the above problem.

Abstract: An imprint method using a mold and/or a transfer substrate having a mesa structure includes a resin supply step, a contact step, a curing step, and a mold release step. In the resin supply step, a balance layer is formed by supplying a molded resin also to an area outside of a pattern formation area of the transfer substrate in which a pattern structure is to be formed.

Abstract: An imprint method using a mold and/or a transfer substrate having a mesa structure includes a resin supply step, a contact step, a curing step, and a mold release step. In the resin supply step, a balance layer is formed by supplying a molded resin also to an area outside of a pattern formation area of the transfer substrate in which a pattern structure is to be formed.

Abstract: An imprint mold has a base, an uneven structure area set on a surface of the base, a measurement area set in the uneven structure area, and a measurement mark structure positioned in the measurement area, the measurement mark structure having a plurality of pattern sets each having a line/space shape. With this, a deformation occurring in a resin layer at the time of release of the resin layer from the mold is prevented, and a measurement mark can be formed with high accuracy.

Abstract: A template and a template blank are used for imprint lithography transferring a transfer pattern in a concave and convex structure to a resin on a transfer substrate, in which a first step structure is formed on a main surface of a base, a second step structure is formed on the first step structure, and an outside region of the second step structure on an upper surface of the first step structure is covered with a light shielding film to solve the above problem.

Abstract: An imprint method using a mold and/or a transfer substrate having a mesa structure includes a resin supply step, a contact step, a curing step, and a mold release step. In the resin supply step, a balance layer is formed by supplying a molded resin also to an area outside of a pattern formation area of the transfer substrate in which a pattern structure is to be formed.

Abstract: An imprint mold has a base 2, an uneven structure area A set on a surface 2a of the base 2, a measurement area 6 set in the uneven structure area A, and a measurement mark structure 7 positioned in the measurement area 6, the measurement mark structure 7 having a plurality of pattern sets 7a each having a line/space shape. With this, a deformation occurring in a resin layer at the time of release of the resin layer from the mold is prevented, and a measurement mark can be formed with high accuracy.

Abstract: Disclosed is a substrate for a flexible device which, when a TFT is produced on a flexible substrate in which a metal layer and a polyimide layer are laminated, can suppress deterioration of the electrical performance of the TFT due to the surface irregularities of the metal foil surface and can suppress detachment or cracks of the TFT. Also disclosed is a substrate for a thin film element which has excellent surface smoothness and is capable of suppressing deterioration of the characteristics of thin film elements. Also disclosed are methods for manufacturing substrates for thin film elements.

Abstract: Disclosed is a substrate for a flexible device which, when a TFT is produced on a flexible substrate in which a metal layer and a polyimide layer are laminated, can suppress deterioration of the electrical performance of the TFT due to the surface irregularities of the metal foil surface and can suppress detachment or cracks of the TFT. Also disclosed is a substrate for a thin film element which has excellent surface smoothness and is capable of suppressing deterioration of the characteristics of thin film elements. Also disclosed are methods for manufacturing substrates for thin film elements.

Abstract: In a reflection-type liquid crystal display panel (10) provided with reflective electrodes (13a), a reflective metal film (13a) is formed on an insulating layer (12) having a surface provided with minute irregularities (17) to form the reflective metal electrodes having surfaces of a shape substantially complementary to the minute irregularities. Since the surfaces of the electrodes (13a) are provided with minute irregularities, external light incident on the liquid crystal display panel is not reflected in a specular reflection mode, so that images are displayed on the liquid crystal display panel in satisfactory visibility. The insulating layer is formed by forming a positive photosensitive resin layer on a back substrate (10a), exposing the positive photosensitive resin layer to light through a transparent sheet (18) having a surface provided with minute irregularities, and subjecting the exposed positive photosensitive resin layer to a developing process.

Abstract: A low refractive index SiO2 film is provided which uses a starting material for forming an SiO2 film and has a lower refractive index than the conventional SiO2 film. A starting material gas comprising a gas containing a fluorine atom, a gas containing a silicon atom and an alkyl group having 1 to 4 carbon atoms or an alkyl group having 1 to 4 carbon atoms with a part or the whole of hydrogen atoms substituted by a fluorine atom, and a gas containing an oxygen atom is subjected to plasma CVD in a vacuum chamber 1 to form an SiO2 film on a web 2 in a plasma zone 5.

Abstract: In a reflection-type liquid crystal display panel (10) provided with reflective electrodes (13a), a reflective metal film (13a) is formed on an insulating layer (12) having a surface provided with minute irregularities (17) to form the reflective metal electrodes having surfaces of a shape substantially complementary to the minute irregularities. Since the surfaces of the electrodes (13a) are provided with minute irregularities, external light incident on the liquid crystal display panel is not reflected in a specular reflection mode, so that images are displayed on the liquid crystal display panel in satisfactory visibility. The insulating layer is formed by forming a positive photosensitive resin layer on a back substrate (10a), exposing the positive photosensitive resin layer to light through a transparent sheet (18) having a surface provided with minute irregularities, and subjecting the exposed positive photosensitive resin layer to a developing process.

Abstract: In a reflection-type liquid crystal display panel (10) provided with reflective electrodes (13a), a reflective metal film (13a) is formed on an insulating layer (12) having a surface provided with minute irregularities (17) to form the reflective metal electrodes having surfaces of a shape substantially complementary to the minute irregularities. Since the surfaces of the electrodes (13a) are provided with minute irregularities, external light incident on the liquid crystal display panel is not reflected in a specular reflection mode, so that images are displayed on the liquid crystal display panel in satisfactory visibility. The insulating layer is formed by forming a positive photosensitive resin layer on a back substrate (10a), exposing the positive photosensitive resin layer to light through a transparent sheet (18) having a surface provided with minute irregularities, and subjecting the exposed positive photosensitive resin layer to a developing process.

Abstract: A silica layer is provided which is usable as a low refractive index layer undergoing no change in its refractive index. Further, a silica layer is provided which is highly productive and usable as a medium or high refractive index layer undergoing neither reduction in transmittance nor change in spectral colors. Still further, an antireflection film using these silica layers is provided.

Abstract: A low refractive index SiO2 film is provided which uses a starting material for forming an SiO2 film and has a lower refractive index than the conventional SiO2 film.

Abstract: A silica layer is provided which is usable as a low refractive index undergoing no change in its refractive index. Further, a silica layer is provided which is highly productive and usable as a medium or high refractive index layer undergoing neither reduction in transmittance nor change in spectral colors. Still further, an antireflection film using these silica layers is provided. These silica layers are: a silica layer composed of an organic silicon compound, which has a refractive index of not less than 1.40 and not more than 1.46 (&lgr;=550 nm), and whose composition is represented by SiOxCy: H (x=1.6 to 1.9, y=0.2 to 1.0); a carbon-containing silica layer, which has a, refractive index of not less than 1.55 and less than 1.80 (&lgr;=550 nm), and whose composition is represented by SioaCb (a=0.7 to 1.7, b=0.2 to 1.4) ; and a silica layer containing carbon, which has a refractive index of not less than 1.80 and not more than 2.

Abstract: A silica layer is provided which is usable as a low refractive index undergoing no change in its refractive index. Further, a silica layer is provided which is highly productive and usable as a medium or high refractive index layer undergoing neither reduction in transmittance nor change in spectral colors. Still further, an antireflection film using these silica layers is provided. These silica layers are: a silica layer composed of an organic silicon compound, which has a refractive index of not less than 1.40 and not more than 1.46 (&lgr;=550 nm), and whose composition is represented by SiOxCy:H (x=1.6 to 1.9, y=0.2 to 1.0); a carbon-containing silica layer, which has a refractive index of not less than 1.55 and less than 1.80 (&lgr;=550 nm), and whose composition is represented by SioaCb (a=0.7 to 1.7, b=0.2 to 1.4); and a silica layer containing carbon, which has a refractive index of not less than 1.80 and not more than 2.

Abstract: In a reflection-type liquid crystal display panel (10) provided with reflective electrodes (13a), a reflective metal film (13a) is formed on an insulating layer (12) having a surface provided with minute irregularities (17) to form the reflective metal electrodes having surfaces of a shape substantially complementary to the minute irregularities. Since the surfaces of the electrodes (13a) are provided with minute irregularities, external light incident on the liquid crystal display panel is not reflected in a specular reflection mode, so that images are displayed on the liquid crystal display panel in satisfactory visibility. The insulating layer is formed by forming a positive photosensitive resin layer on a back substrate (10a), exposing the positive photosensitive resin layer to light through a transparent sheet (18) having a surface provided with minute irregularities, and subjecting the exposed positive photosensitive resin layer to a developing process.