Patents by Inventor Koji Inukai

Koji Inukai has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Method for forming resist pattern and composition for forming protective film
    Patent number: 9052600
    Abstract: A method for forming a resist pattern includes providing a resist film. A protective film is provided on the resist film using a composition for forming the protective film. The composition includes a polymer and an organic solvent. The resist film on which the protective film is provided is exposed to irradiation with EUV light or an electron beam. The exposed resist film is developed.
    Type: Grant
    Filed: September 6, 2012
    Date of Patent: June 9, 2015
    Assignee: JSR CORPORATION
    Inventors: Ken Maruyama, Koji Inukai
  • METHOD FOR FORMING RESIST PATTERN AND COMPOSITION FOR FORMING PROTECTIVE FILM
    Publication number: 20130059252
    Abstract: A method for forming a resist pattern includes providing a resist film. A protective film is provided on the resist film using a composition for forming the protective film. The composition includes a polymer and an organic solvent. The resist film on which the protective film is provided is exposed to irradiation with EUV light or an electron beam. The exposed resist film is developed.
    Type: Application
    Filed: September 6, 2012
    Publication date: March 7, 2013
    Applicant: JSR Corporation
    Inventors: Ken MARUYAMA, Koji Inukai