Abstract: A novel dynamo-electrical machine is provided that can inhibit an increase in the height of a coil end positioned toward a turn portion and improve the cooling performance around the turn portion of a segment coil. A segment coil 31 includes a first linear portion 34r, a second linear portion 34a, and a turn portion 33 including a top portion 33c. The first linear portion 34r is inserted into a specified slot 22. The second linear portion 34a is inserted into another particular slot 22 different from the specified slot 22. The turn portion 33 extends from one end face portion of a stator core 21 toward the outside of the axial direction of the stator core 21 and connects the first linear portion 34r and the second linear portion 34a. The linear portions 34r and 34a of the multiple segment coils 31 are inserted and placed in the slots 22 in a layering manner from the inner periphery to the outer periphery in the radial direction.

Abstract: A stator of an electric rotary machine includes a first abutting portion and a second abutting portion. The first abutting portion and the second abutting portion are welded by laser welding in a state where the abutting portions abut against each other, and the first abutting portion and the second abutting portion include bonding surfaces which are bonded to each other. In the axial direction, a height from an insulating cover film to the bonding surface in one abutting portion is greater than a height from an insulating cover film to the bonding surface in the other abutting portion, and in a radial direction, a protruding distance from the insulating cover film to the bonding surface in the one abutting portion is greater than a retraction distance from the insulating cover film to the bonding surface in the other abutting portion.

Abstract: A stator of an electric rotary machine includes: a stator core; and a coil including a plurality of first coil segments and a plurality of second coil segments. An end part of the projection part of the first coil segment is joined with an end part of the projection part of the second coil segment through laser welding in a state of abutting to the end part of the projection part of the second coil segment. And abutting portions abutting to each other between the projection part of the first coil segment and the projection part of the second coil segment include joining surfaces joined with each other and engaging surfaces engaged with each other and orthogonal to the joining surfaces.

Abstract: A stator of an electric rotary machine includes a first abutting portion and a second abutting portion. The first abutting portion and the second abutting portion are welded by laser welding in a state where the abutting portions abut against each other, and the first abutting portion and the second abutting portion include bonding surfaces which are bonded to each other. In the axial direction, a height from an insulating cover film to the bonding surface in one abutting portion is greater than a height from an insulating cover film to the bonding surface in the other abutting portion, and in a radial direction, a protruding distance from the insulating cover film to the bonding surface in the one abutting portion is greater than a retraction distance from the insulating cover film to the bonding surface in the other abutting portion.

Abstract: A stator of an electric rotary machine includes: a stator core; and a coil including a plurality of first coil segments and a plurality of second coil segments. An end part of the projection part of the first coil segment is joined with an end part of the projection part of the second coil segment through laser welding in a state of abutting to the end part of the projection part of the second coil segment. And abutting portions abutting to each other between the projection part of the first coil segment and the projection part of the second coil segment include joining surfaces joined with each other and engaging surfaces engaged with each other and orthogonal to the joining surfaces.

Abstract: A rotor for a rotating electric machine includes a rotor core, a plurality of permanent magnets, and a rotating shaft. The rotor core includes a through-hole, an inner circumference-side rotor core, an outer circumference-side rotor core, and a plurality of ribs. Each of the plurality of ribs includes a first curved rib and a second curved rib. The first curved rib extends to one side in a circumferential direction from an inner circumference side toward an outer circumference side. The first curved rib has a curved shape that bulges toward the outer circumference side and toward another side in the circumferential direction beyond a straight line that connects a first connecting portion between the first curved rib and the inner circumference-side rotor core and a second connecting portion between the first curved rib and the outer circumference-side rotor core.

Abstract: A rotor for a rotating electric machine includes a rotor core, a plurality of permanent magnets, and a rotating shaft. The rotor core includes a through-hole, an inner circumference-side rotor core, an outer circumference-side rotor core, and a plurality of ribs. Each of the plurality of ribs includes a first curved rib and a second curved rib. The first curved rib extends to one side in a circumferential direction from an inner circumference side toward an outer circumference side. The first curved rib has a curved shape that bulges toward the outer circumference side and toward another side in the circumferential direction beyond a straight line that connects a first connecting portion between the first curved rib and the inner circumference-side rotor core and a second connecting portion between the first curved rib and the outer circumference-side rotor core.

Abstract: A method for production of semiconductor devices which includes the steps of forming, on an interlayer insulating film formed on a substrate, a copper-containing conductive layer in such a way that its surface is exposed, performing heat treatment with a reducing gas composed mainly of hydrogen on the surface of the conductive layer, performing plasma treatment with a reducing gas on the surface of the conductive layer, thereby permitting the surface of the conductive layer to be reduced and the hydrogen adsorbed by the heat treatment to be released, and forming an oxidation resistance film that covers the surface of the conductive layer such that the surface of the conductive layer is not exposed to an oxygen-containing atmospheric gas after the plasma treatment.

Abstract: A method for production of semiconductor devices which includes the steps of forming, on an interlayer insulating film formed on a substrate, a copper-containing conductive layer in such a way that its surface is exposed, performing heat treatment with a reducing gas composed mainly of hydrogen on the surface of the conductive layer, performing plasma treatment with a reducing gas on the surface of the conductive layer, thereby permitting the surface of the conductive layer to be reduced and the hydrogen adsorbed by the heat treatment to be released, and forming an oxidation resistance film that covers the surface of the conductive layer such that the surface of the conductive layer is not exposed to an oxygen-containing atmospheric gas after the plasma treatment.