Abstract: In a method for manufacturing a metal-made three-dimensional substrate, a metal foil is passed between a pair of rollers 21 and 22. Each surface S of a pair of the rollers 21 and 22 is provided with protrusion portions 23 arranged in a grid pattern, and the protrusion portions 23 are arranged so that protrusions 23 of the one roller 22 are oriented toward the center 27 of a virtual quadrangle having four adjacent protrusion portions 23a to 23d of the other roller 21 as the apices.

Abstract: An electrode group E in which a positive electrode 1 and a negative electrode 2 are spirally-rolled interposing a separator 3 is contained in a bottomed cylindrical can 4. A metal exposure portion 1a provided on an end surface of the positive electrode 1 of the electrode group E or a metal-made current collecting plate 9 electrically connected to the metal exposure portion 1a (called a current collecting portion of a positive electrode) and a cover body 8 also functioning as a positive electrode terminal are electrically connected by a metal lead plate 5. One or more electrolyte resistant metal pressers 10 are arranged and electrically connected between the current collecting portion of the positive electrode and the cover body 8. The electrode group E is applied pressure by the cover body 8 and the bottom portion 4a of the bottomed cylindrical can 4.

Abstract: In a method for manufacturing a metal-made three-dimensional substrate, a metal foil is passed between a pair of rollers 21 and 22 . Each surface S of a pair of the rollers 21 and 22 is provided with protrusion portions 23 arranged in a grid pattern, and the protrusion portions 23 are arranged so that protrusions 23 of the one roller 22 are oriented toward the center 27 of a virtual quadrangle having four adjacent protrusion portions 23a to 23d of the other roller 21 as the apices.

Abstract: An electrode group E in which a positive electrode 1 and a negative electrode 2 are spirally-rolled interposing a separator 3 is contained in a bottomed cylindrical can 4. A metal exposure portion 1a provided on an end surface of the positive electrode 1 of the electrode group E or a metal-made current collecting plate 9 electrically connected to the metal exposure portion 1a (called a current collecting portion of a positive electrode) and a cover body 8 also functioning as a positive electrode terminal are electrically connected by a metal lead plate 5. One or more electrolyte resistant metal pressers 10 are arranged and electrically connected between the current collecting portion of the positive electrode and the cover body 8. The electrode group E is applied pressure by the cover body 8 and the bottom portion 4a of the bottomed cylindrical can 4.

Abstract: The present invention provides a chemically amplified resist composition comprising a treated resin (1), an acid generator and a solvent, wherein resin (1) is (a) a (meth)acrylic resin which is insoluble or poorly soluble in an alkali aqueous solution and becomes soluble in an alkali aqueous solution by the action of an acid, and which comprises a repeating unit having an alicyclic hydrocarbon group in its side chain or (b) a styrenic resin which is insoluble or poorly soluble in an alkali aqueous solution and becomes soluble in an alkali aqueous solution by the action of an acid, and which comprises a repeating unit derived from hydroxystyrene, and wherein the treated resin (1) is obtained by (A) contacting crude resin (1) with activated carbon at 40 to 90° C.

Abstract: The present invention provides a resist composition comprising: a resin which has a structural unit represented by the following formula (I) 1

Abstract: A positive resist composition comprising an alkali-soluble resin containing a novolak resin which is obtained by a condensation reaction of a phenol compound and a carbonyl compound and has an area in a GPC pattern of a range in that a molecular weight as converted to polystyrene is not larger than 900 not exceeding 20% of a whole pattern area excluding the unreacted phenol compound, a quinonediazide compound and a polyphenol compound of the formula: ##STR1## in which R.sub.1 and R.sub.2 are independently a hydrogen atom, a halogen atom, an alkyl group, an alkoxy group or a group: --OCOR.sub.3 in which R.sub.3 is an alkyl group or a phenyl group, x and y are independently an integer of 1 to 3, and m is an integer of 0 to 4, wherein a weight ratio of said polyphenol compound (I) to said alkali-soluble resin is from 3:10 to 5:10, which is excellent in heat resistance, sensitivity, resolution and a depth of focus and leaves no scum after development.

Abstract: A positive resist composition which comprises in admixture an alkali-soluble resin and, as a sensitizer, first and second quinone diazide sulfonic acid esters of a phenol compound, wherein(a) the first ester is a quinone diazide sulfonic acid diester of a phenol compound having not less than three hydroxyl groups which exhibits a pattern area that is not less than 40% of all pattern areas corresponding to the sensitizer in a high pressure liquid chromatography (HPLC) pattern measured with a primary detector using UV light having a wavelength of 254 nm, and(b) the second ester is a quinone diazide sulfonic acid ester that is a complete ester of a phenol compound having not less than two hydroxyl groups which exhibits a pattern area corresponding to not less than 5% and is less than 60% of all pattern areas corresponding to the sensitizer in the HPLC pattern.

Abstract: A quinone diazide sulfonic acid ester of a phenol compound of the general formula (I): ##STR1## wherein Y.sub.1, Y.sub.2, Y.sub.3 and Y.sub.4 are the same or different and each a hydrogen atom, an alkyl group, a halogen atom or a hydroxyl group, provided that at least one of Y.sub.1, Y.sub.2, Y.sub.3 and Y.sub.4 is a hydroxyl group; Z.sub.1, Z.sub.2, Z.sub.3, Z.sub.4, Z.sub.5 and Z.sub.6 are the same or different and each a hydrogen atom, an alkyl, an aryl group, a halogen atom or a hydroxyl group, provided that at least one of Z.sub.1, Z.sub.2, Z.sub.3, Z.sub.4, Z.sub.5 and Z.sub.6 is a hydroxyl group; X is ##STR2## in which R.sub.1 and R.sub.2 are the same or different and each a hydrogen atom, an alkyl group, an alkenyl group, a cyclo-alkyl group, an alkoxy group or an aryl group, provided that when at least one of R.sub.1 and R.sub.

Abstract: A radiation sensitive compound prepared by reacting a phenol compound with a quinone diazide sulfonyl halide in a mixture of a solvent having a relative dielectric constant of not larger than 10 and a solvent having a relative dielectric constant of at least 15, which compound is less colored and gives a positive resist composition having a good resolution.

Abstract: A quinone diazide sulfonic acid ester of a phenol compound of the general formula (I) or (II): ##STR1## wherein a, c and d are the same or different and a number of 0 to 3, provided that when a is 0 or 3, b is a number of 0 to 3 or when a is 1 or 2, b is 0, 1 or 2, and a+b and c+d are not less than 2; R and R' are the same or different and an alkyl group or an aryl group provides a positive resist composition having a high .gamma.-value.

Abstract: A process for preparing a positive resist composition, which process includes the steps of condensation reacting a quinone diazide sulfonyl halogenide with a phenol compound, mixing a condensation reaction mixture with a solution of an alkali-soluble resin in a resist solvent and removing impurities from the mixture, whereby the overall processing time can be shortened.

Abstract: A quinone diazide sulfonic acid ester of a phenol compound of the general formula (I): ##STR1## wherein Y.sub.1 and Y.sub.2 are each a hydrogen atom, an alkyl group or a hydroxyl group, provided that at least one of Y.sub.1 and Y.sub.2 is a hydroxyl group; Z.sub.1, Z.sub.2, Z.sub.3, Z.sub.4, Z.sub.5, Z.sub.6 and Z.sub.7 are the same or different and each a hydrogen atom, a hydroxyl group, an alkyl group, a cycloalkyl group, an aryl group or halogen atom, provided that at least two of Z.sub.1, Z.sub.2, Z.sub.3, Z.sub.4, Z.sub.5, Z.sub.6 and Z.sub.7 are hydroxyl groups; R.sub.1, R.sub.2 and R.sub.3 are the same or different and each a hydrogen atom, an alkyl group, an alkenyl group, a cycloalkyl group or an aryl group provides a positive resist composition having a high .gamma.-value.