Abstract: An etching mask is made of a metal such as Permalloy (NiFe) and has a T-shaped cross section made up of a vertical bar having width W1 and a lateral bar having width W2. Through ion beam etching with the etching mask, the region in the surface of a workpiece not covered with the mask is selectively removed by the ion beams applied thereto. In the mask the vertical bar has a region obstructed by the lateral bar and a redeposit portion. As a result, the region of the vertical bar near the interface between the workpiece and the vertical bar that substantially determines the pattern width does not change in width. Consequently, a pattern of the workpiece on which etching has been performed has the top width and bottom width substantially equal to width W1 of the vertical bar of the mask. The pattern is rectangular in cross section.

Abstract: A method of manufacturing a thin-film magnetic head, includes the steps of: forming, on a lower auxiliary pole, a three-layer pole tip structure consisting of a lower pole tip element, a recording gap layer and an upper pole tip element; depositing a lower insulating layer on the three-layer pole tip structure; polishing the lower insulating layer by chemical-mechanical polishing so that a top surface of the lower insulating layer is leveled lower than a top of the three-layer pole tip structure over at least a region within which a coil conductor is formed; forming the coil conductor on the lower insulating layer; forming an upper insulating to cover the coil conductor; and forming an upper auxiliary pole so that a part of which contacts to the upper pole tip element.

Abstract: A method of patterning at least one object layer, includes a step of forming a mask on the object layer, and a step of selectively etching the object layer using the mask. The mask is made of a magnetic metallic compound with a basic metal of nickel or cobalt containing at least group 3B element and/or group 5B element.

Abstract: An etching mask is made of a metal such as Permalloy (NiFe) and has a T-shaped cross section made up of a vertical bar having width W1 and a lateral bar having width W2. Through ion beam etching with the etching mask, the region in the surface of a workpiece not covered with the mask is selectively removed by the ion beams applied thereto. In the mask the vertical bar has a region obstructed by the lateral bar and a redeposit portion. As a result, the region of the vertical bar near the interface between the workpiece and the vertical bar that substantially determines the pattern width does not change in width. Consequently, a pattern of the workpiece on which etching has been performed has the top width and bottom width substantially equal to width W1 of the vertical bar of the mask. The pattern is rectangular in cross section.

Abstract: An etching mask is made of a metal such as Permalloy (NiFe) and has a T-shaped cross section made up of a vertical bar having width W1 and a lateral bar having width W2. Through ion beam etching with the etching mask, the region in the surface of a workpiece not covered with the mask is selectively removed by the ion beams applied thereto. In the mask the vertical bar has a region obstructed by the lateral bar and a redeposit portion. As a result, the region of the vertical bar near the interface between the workpiece and the vertical bar that substantially determines the pattern width does not change in width. Consequently, a pattern of the workpiece on which etching has been performed has the top width and bottom width substantially equal to width W1 of the vertical bar of the mask. The pattern is rectangular in cross section.

Abstract: A method of patterning at least one object layer, includes a step of forming a mask on the object layer, and a step of selectively etching the object layer using the mask. The mask is made of a magnetic metallic compound with a basic metal of nickel or cobalt containing at least group 3B element and/or group 5B element.

Abstract: A thin film magnetic head includes a recording gap layer, and lower and upper magnetic pole layers made of polycrystalline magnetic substances, deposited to sandwich the recording gap layer. An average particle size D of crystal substances at least in a region of the upper magnetic pole layer, near the recording gap layer with respect to a recording track width W is set to D≦W/20.

Abstract: A thin film magnetic head has a recording gap layer made of a nonmagnetic material, lower and upper magnetic pole layers made of a magnetic material, the lower and upper magnetic pole layers sandwiching the recording gap layer, and a magnetic material side layer deposited via a nonmagnetic material side layer on at least a part of a side surface of at least the upper magnetic pole layer.

Abstract: A thin-film magnetic head having an air bearing surface, includes a three-layer pole tip structure consisting of a lower pole tip element, a recording gap layer and an upper pole tip element, the structure having side surfaces, a rear surface and top surface, a lower auxiliary pole, a part of which contacts to the lower pole tip element, an upper auxiliary pole, a part of which contacts to the upper pole tip element, the upper auxiliary pole being magnetically connected at its rear portion with respect to the air bearing surface to the lower auxiliary pole so as to form a yoke together with the lower auxiliary pole, a lower insulating layer, surrounding the side surfaces and the rear surfaces of the three-layer pole tip structure, the lower insulating layer being located between the lower and upper auxiliary poles and having a top surface, a coil conductor formed on the top surface of the lower insulating layer, and an upper insulating layer covering the coil conductor, a part of the upper insulating layer be

Abstract: A first pole tip 212 at a write element 2 is provided projecting above a first yoke 211. A second pole tip 222 is adhered onto a gap film 23 that is adhered onto the first pole tip 212. The front end portion of a second yoke 221 is laminated on the second pole tip 222. At least either the first pole tip 212 or the second pole tip 222 is constituted of a material having a higher saturation magnetic flux density than that of permalloy. At least either the first yoke 211 or the second yoke 221 is constituted of a material having a higher resistivity than that of permalloy.