Patents by Inventor Koji Miyake

Koji Miyake has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20040145979
    Abstract: A light pickup device includes a light projection optical system comprising a light source which emits light, and an objective lens which condenses the light on an optical disk, a light detection optical system comprising a light detector, and a condenser lens which condenses light reflected from the optical disk on the light detector, and an adjustment optical element for coinciding a center axis of an intensity distribution of the light condensed on the optical disk by the light projection optical system with an optical axis of the objective lens.
    Type: Application
    Filed: January 12, 2004
    Publication date: July 29, 2004
    Applicant: SHARP KABUSHIKI KAISHA
    Inventor: Koji Miyake
  • Publication number: 20040045812
    Abstract: A vacuum arc vapor deposition apparatus includes a plurality of magnetic coils for guiding a plasma produced by a vacuum arc evaporating source to the vicinity of a substrate in a film forming chamber by use of a deflection magnetic field. The vacuum arc vapor deposition apparatus further includes a coil power source for reversing a coil current to be fed to the magnetic coils, and a control unit for controlling the coil power source to reverse the flowing direction of the coil current.
    Type: Application
    Filed: September 10, 2003
    Publication date: March 11, 2004
    Inventor: Koji Miyake
  • Publication number: 20040033089
    Abstract: Disclosed is an image forming apparatus in which an increase in the service life of the intermediate transfer member is compatible with a reduction in apparatus size and cost and which provides high productivity in image formation.
    Type: Application
    Filed: February 20, 2003
    Publication date: February 19, 2004
    Applicant: FUJI XEROX CO., LTD.
    Inventors: Masaki Suto, Hiroyuki Mitsu, Koji Miyake
  • Patent number: 6692623
    Abstract: A vacuum arc vapor deposition apparatus includes a plurality of magnetic coils for guiding a plasma produced by a vacuum arc evaporating source to the vicinity of a substrate in a film forming chamber by use of a deflection magnetic field. The vacuum arc vapor deposition apparatus further includes a coil power source for reversing a coil current to be fed to the magnetic coils, and a control unit for controlling the coil power source to reverse the flowing direction of the coil current.
    Type: Grant
    Filed: March 28, 2002
    Date of Patent: February 17, 2004
    Assignee: Nissin Electric Co., Ltd.
    Inventor: Koji Miyake
  • Patent number: 6667372
    Abstract: A continuous manufacturing method of a water-absorbent polymer by continuously performing a polymerization of a hydrophilic monomer using a solution containing a hydrophilic monomer, includes at least one of the following steps (A) to (D): (A) introducing an inert gas into the solution in a continuous manner before subjecting the solution to a polymerization reaction, and subsequently removing the inert gas from the solution; (B) supplying the solution to a polymerization process, and washing out the solution with water supplied before, at, or after a timing of supplying the solution to the polymerization process; (C) detecting reaction temperatures of a polymerization reaction in non-contact manner at a plurality of points different distances away from a point where a solution is supplied; and (D) supplying water to a water-containing gel and/or transport means when transporting the water-containing gel of the water-absorbent polymer obtained in or after the polymerization reaction.
    Type: Grant
    Filed: October 31, 2000
    Date of Patent: December 23, 2003
    Assignee: Nippon Shokubai Co., Ltd.
    Inventors: Koji Miyake, Takumi Hatsuda, Sachio Fujita, Takashi Nishigaki, Kunihiko Ishizaki, Katsuhiro Kajikawa
  • Publication number: 20030231892
    Abstract: Disclosed is an image forming apparatus capable of preventing generation of an excessive difference in potential between a cleaning member and an intermediate transfer member to thereby increase the service life of the intermediate transfer member.
    Type: Application
    Filed: February 21, 2003
    Publication date: December 18, 2003
    Applicant: Fuji Xerox Co., Ltd.
    Inventors: Koji Miyake, Masaki Suto, Hiroyuki Mitsu
  • Patent number: 6656592
    Abstract: A carbon film C containing carbon as a main component, formed on the surface of a soft base material 4, characterized in that the film C is cracked A and divided into a plurality of regions B, and an average area of respective regions (blocks) surrounded by cracks A is 0.15×10−3 mm2 to 20×10−3 mm2.
    Type: Grant
    Filed: October 16, 2001
    Date of Patent: December 2, 2003
    Assignee: Nissin Electric Co., Ltd.
    Inventors: Koji Miyake, Yasuo Murakami, Jo Takeuchi, Takahiro Nakahigashi, Kiyoshi Ogata
  • Publication number: 20030176589
    Abstract: The present invention provides: a water-absorbing agent which has excellent urine resistance; a water-absorbing agent which has not only excellent urine resistance, but also excellent absorption properties that are stable to any composition of urine and show little change with time; and production processes and uses for these water-absorbing agents. The present invention water-absorbing agent exhibits a specific or larger value of absorption capacity under a load in a process in which the absorption capacity under a load is measured in a new manner using a specific liquid to be absorbed, and the present invention provides an absorbent matter and an absorbent article which display a specific or larger value of new absorption index as is, for example, led from the absorption capacity under a load or from the resin concentration using the above water-absorbing agent. The present invention further provides a production process for a water-absorbing agent having the above specific parameter.
    Type: Application
    Filed: March 3, 2003
    Publication date: September 18, 2003
    Applicant: Nippon Shokubai Co., Ltd.
    Inventors: Katsuyuki Wada, Hiroko Ueda, Naoko Takahashi, Kinya Nagasuna, Koji Miyake, Yasuhiro Fujita, Takumi Hatsuda
  • Patent number: 6599989
    Abstract: Water-absorbing agents containing polycarboxylic amine chelating agents. The water-absorbing agents are obtained by a process including the step of adding to a water-absorbent resin at least one chelating agent selected from the group consisting of polycarboxylic amines and maleic hydrophilic polymers. The polycarboxylic amine may be selected from a class that includes N-carboxymethyl-aspartic acid as one of its members or selected from a class that includes N,N′-bis(1,2-dicarboxyethyl)-ethylenediamine as one of its members. The water-absorbing agents have not only excellent urine resistance, but also excellent absorption properties that are stable to any composition of urine and show little change with time.
    Type: Grant
    Filed: February 22, 1999
    Date of Patent: July 29, 2003
    Assignee: Nippon Skokubai Co., Ltd.
    Inventors: Katsuyuki Wada, Hiroko Ueda, Naoko Takahashi, Kinya Nagasuna, Koji Miyake, Yasuhiro Fujita, Takumi Hatsuda
  • Patent number: 6586549
    Abstract: The present invention provides: a water-absorbing composition such that portions containing the water-absorbing composition in a high concentration exhibit excessive-liquid permeation buffering effects in absorbent articles comprising the water-absorbing composition and hydrophilic fibers; and a use of this water-absorbing composition. The water-absorbing composition comprises a water-absorbent resin and an excessive-liquid permeation buffer, wherein the water-absorbent resin is a product by a process including the step of further crosslinking the surface vicinity of a crosslinked polymer, and this water-absorbing composition is characterized by having a liquid permeation buffering index of not less than 0.
    Type: Grant
    Filed: July 6, 2000
    Date of Patent: July 1, 2003
    Assignee: Nippon Shokubai Co., Ltd.
    Inventors: Takumi Hatsuda, Kazuki Kimura, Koji Miyake, Eri Goto, Katsuyuki Wada
  • Patent number: 6562879
    Abstract: The present invention provides a water-absorbent resin powder and its production process and use, wherein the water-absorbent resin powder has high liquid permeability and high water absorbency. The production process for a water-absorbent resin powder, according to the present invention, comprises the step of obtaining water-absorbent crosslinked polymer particles by an aqueous solution polymerization step, and grinding the resultant crosslinked polymer particles until the bulk density thereof increases to not lower than 0.72 (g/ml). The water-absorbent resin powder is characterized by being arbitrarily pulverized and having a bulk density of not lower than 0.74 (g/ml) and a water absorption capacity of not lower than 20 (g/g) for 0.9 weight % physiological saline under a load of 0.7 psi (4.83 kPa). In addition, the absorbent structure comprises the above water-absorbent resin powder and a fibrous material. The absorbent article comprises an absorbent layer including the above absorbent structure.
    Type: Grant
    Filed: February 11, 2000
    Date of Patent: May 13, 2003
    Assignee: Nippon Shokubai Co., Ltd.
    Inventors: Takumi Hatsuda, Hiroyuki Ikeuchi, Koji Miyake, Yoshio Irie, Kunihiko Ishizaki
  • Patent number: 6510307
    Abstract: A transfer device for transferring an image on an image carrier 1 to a recording material 2, the transfer device includes a transferring member 4 adapted to nip and convey the recording material 2 between the transferring member 4 and the image carrier 1, a guard resin layer 5 having a surface microhardness not smaller than surface microhardness corresponding to polyimide, the guard resin layer 5 provided on a surface of the transferring member 4, and an adjustment resistance layer 6 provided as a ground layer of the guard resin layer 5, the adjustment resistance layer 6 adapted to inhibit an accumulation of charge in the guard resin layer 5. Or, the guard resin layer 5 made of an epoxy resin is provided on the surface of the transferring member 4, the adjustment resistance layer 6 having a smooth interface with the guard resin layer 5, the adjustment resistance layer 6 adapted to inhibit accumulation of charge in the guard resin layer.
    Type: Grant
    Filed: September 4, 2001
    Date of Patent: January 21, 2003
    Assignee: Fuji Xerox Co., Ltd.
    Inventors: Masahiro Sato, Toshihiko Mitsuhashi, Yusuke Kitagawa, Kazuya Yamanoi, Ryuichi Yamamoto, Hiroyuki Okawa, Koji Miyake, Koichi Matsumoto, Takeshi Kawai, Shoichi Morita, Toshio Masubuchi
  • Publication number: 20020157609
    Abstract: A vacuum arc vapor deposition apparatus includes a plurality of magnetic coils for guiding a plasma produced by a vacuum arc evaporating source to the vicinity of a substrate in a film forming chamber by use of a deflection magnetic field. The vacuum arc vapor deposition apparatus further includes a coil power source for reversing a coil current to be fed to the magnetic coils, and a control unit for controlling the coil power source to reverse the flowing direction of the coil current.
    Type: Application
    Filed: March 28, 2002
    Publication date: October 31, 2002
    Applicant: NISSIN ELECTRIC CO.
    Inventor: Koji Miyake
  • Patent number: 6468884
    Abstract: A method of forming a silicon-contained crystal thin film can efficiently form the crystal thin film of a relatively large thickness. In the method, hydrogen ions are implanted into a silicon-contained crystal substrate. Voids are formed by immersing the ion-implanted crystal substrate in a melted metal liquid containing, e.g., silicon and indium for heating the substrate. While pressing an ion-injected surface of the substrate, the substrate is heated by the melted metal liquid to form the voids. By cooling the liquid, the silicon in the supersaturated liquid is deposited on the surface of the substrate so that the silicon-contained crystal film is formed on the surface of the substrate. The substrate is divided in the void-formed position. Thereby, a thin film including the silicon-contained crystal film layered on a portion of the substrate is obtained. The silicon-contained crystal thin film thus obtained can be adhered to a support substrate, if necessary.
    Type: Grant
    Filed: January 19, 2001
    Date of Patent: October 22, 2002
    Assignee: Nissin Electric Co., Ltd.
    Inventors: Koji Miyake, Kiyoshi Ogata
  • Patent number: 6469080
    Abstract: The present invention provides a water-absorbent resin composition which contains an aminoacetic chelating agent and is excellent in the urine resistance, wherein the water-absorbent resin composition is excellent further in the light resistance and becomes little colored and might have deodorizability. A water-absorbent resin composition, which comprises a water-absorbent resin and an aminoacetic chelating agent, wherein the mixing ratio of the aminoacetic chelating agent in the water-absorbent resin composition is not less than 10 ppm of the water-absorbent resin, and wherein the total content of nitrilotriacetic acid and its salt in the water-absorbent resin composition is not more than 1 ppm of the water-absorbent resin composition.
    Type: Grant
    Filed: December 12, 2000
    Date of Patent: October 22, 2002
    Assignee: Nippon Shokubai Co., Ltd.
    Inventors: Koji Miyake, Shinichi Fujino, Masatoshi Nakamura, Katsuyuki Wada
  • Publication number: 20020120074
    Abstract: The present invention provides: a water-absorbing agent which has excellent urine resistance; a water-absorbing agent which has not only excellent urine resistance, but also excellent absorption properties that are stable to any composition of urine and show little change with time; and production processes and uses for these water-absorbing agents. The present invention water-absorbing agent exhibits a specific or larger value of absorption capacity under a load in a process in which the absorption capacity under a load is measured in a new manner using a specific liquid to be absorbed, and the present invention provides an absorbent matter and an absorbent article which display a specific or larger value of new absorption index as is, for example, led from the absorption capacity under a load or from the resin concentration using the above water-absorbing agent. The present invention further provides a production process for a water-absorbing agent having the above specific parameter.
    Type: Application
    Filed: February 22, 1999
    Publication date: August 29, 2002
    Inventors: KATSUYUKI WADA, HIROKO UEDA, NAOKO TAKAHASHI, KINYA NAGASUNA, KOJI MIYAKE, YASUHIRO FUJITA, TAKUMI HATSUDA
  • Publication number: 20020102115
    Abstract: A transfer device for transferring an image on an image carrier 1 to a recording material 2, the transfer device comprises a transferring member 4 adapted to nip and convey the recording material 2 between the transferring member 4 and the image carrier 1, a guard resin layer 5 having a surface microhardness not smaller than surface microhardness corresponding to polyimide, the guard resin layer 5 provided on a surface of the transferring member 4, and an adjustment resistance layer 6 provided as a ground layer of the guard resin layer 5, the adjustment resistance layer 6 adapted to inhibit an accumulation of charge in the guard resin layer 5. Or, the guard resin layer 5 made of an epoxy resin is provided on the surface of the transferring member 4, the adjustment resistance layer 6 having a smooth interface with the guard resin layer 5, the adjustment resistance layer 6 adapted to inhibit accumulation of charge in the guard resin layer.
    Type: Application
    Filed: September 4, 2001
    Publication date: August 1, 2002
    Applicant: FUJI XEROX CO., LTD.
    Inventors: Masahiro Sato, Toshihiko Mitsuhashi, Yusuke Kitagawa, Kazuya Yamanoi, Ryuichi Yamamoto, Hiroyuki Okawa, Koji Miyake, Koichi Matsumoto, Takeshi Kawai, Shoichi Morita, Toshio Masubuchi
  • Patent number: 6399668
    Abstract: A gelling material is composed of water-absorbent resin 12 wrapped in a bag composed of two laminated water-soluble sheets 1.1, the water-absorbent resin being prepared so as to enable the bag to be disintegrated by an inner pressure generated when an expanded volume of the water-absorbent resin by absorbing water through the bag exceeds a maximum volume capacity. When the gelling material is added to the aqueous fluid, the water-absorbent resin 12 is spread in the aqueous fluid at a stroke, and is diffused uniformly. Thus, the water-absorbent resin 12 is brought fully in contact with the aqueous fluid. Since this enables the aqueous fluid to be gelled in a short period of time, the aqueous fluid can be processed speedily. Even the aqueous fluids, which are difficult to be handled by the conventional gelling material, can be gelled conveniently in a short period of time, and the resulting gell can be easily handled, thereby enabling an easy disposal of the aqueous fluids, i.e., the gell.
    Type: Grant
    Filed: July 9, 1998
    Date of Patent: June 4, 2002
    Assignee: Nippon Shokubai Co., Ltd.
    Inventors: Koji Miyake, Nobuyuki Harada, Hiroshi Odanaka
  • Publication number: 20020064658
    Abstract: A carbon film C containing carbon as a main component, formed on the surface of a soft base material 4, characterized in that the film C is cracked A and divided into a plurality of regions B, and an average area of respective regions (blocks) surrounded by cracks A is 0.15×10−3 mm2 to 20×10−3 mm2.
    Type: Application
    Filed: October 16, 2001
    Publication date: May 30, 2002
    Applicant: Nissin Electric Co., Ltd
    Inventors: Koji Miyake, Yasuo Murakami, Jo Takeuchi, Takahiro Nakahigashi, Kiyoshi Ogata
  • Patent number: 6335535
    Abstract: A method for implanting negative hydrogen ions includes the following steps. Plasma containing hydrogen is generated. Negative hydrogen ions are generated in the plasma. An electric field is formed between the plasma and a substrate. Negative hydrogen ions from the plasma is accelerated by using the electric field so as to implant negative hydrogen ions into a predetermined depth of a substrate.
    Type: Grant
    Filed: June 25, 1999
    Date of Patent: January 1, 2002
    Assignee: Nissin Electric Co., LTD
    Inventors: Koji Miyake, Tsukasa Hayashi, Hajime Kuwahara