Abstract: A test object includes a sensor housing for vibrating together with a test object in synchronism with vibration of the test object; a piezoelectric substrate for vibrating together with the sensor housing in synchronism with vibration of the sensor housing, where a first interdigital electrode, a first terminal, a second interdigital electrode, and a second terminal are disposed on a first surface of the piezoelectric substrate, and the piezoelectric substrate is disposed inside the sensor housing to be fixed to the sensor housing; an amplifier for receiving a signal output from the second terminal as an input signal, amplifying the received input signal, and transmitting the input signal after the amplification to the first terminal as an output signal; a deformable layer being elastic and having a first surface adhered to a second surface of the piezoelectric substrate; and a heavy object having a first surface adhered to a second surface of the deformable layer.

Abstract: A method for machining a sputtering target that includes a sputtering surface, an opposing surface opposite to the sputtering surface, and an outer peripheral surface being between the sputtering surface and the opposing surface comprises the steps of: fixing the sputtering target on a fixing table by mounting the sputtering surface or the opposing surface of the sputtering target on the fixing table; and cutting the outer peripheral surface of the sputtering target by a cutting tool while rotating the cutting tool along a circumferential direction of the outer peripheral surface of the sputtering target.

Abstract: A sputtering target comprising: a backing plate; and a target material bonded via a bonding material to a bonding region of the backing plate, wherein a bonding area of a bonding portion between the target material and the backing plate accounts for 97% or more of the area of the bonding region, and wherein a maximum defect area of portions without the bonding material present between the target material and the backing plate accounts for 0.6% or less of the area of the bonding region. The sputtering target enables manufacturing of the sputtering target in which the target material is hardly peeled off during sputtering.

Abstract: A sputtering target that is less likely to cause abnormal discharge is manufactured. A method for manufacturing a sputtering target includes performing multi-stage polishing on a sputtering surface of a target material having a Vickers hardness of 100 or less being made of metal by using a plurality of abrasives having different grit numbers in ascending order of grit number from a small grit number to a large grit number.

Abstract: A sputtering target comprising: a backing plate; and a target material bonded via a bonding material to a bonding region of the backing plate, wherein a bonding area of a bonding portion between the target material and the backing plate accounts for 97% or more of the area of the bonding region, and wherein a maximum defect area of portions without the bonding material present between the target material and the backing plate accounts for 0.6% or less of the area of the bonding region. The sputtering target enables manufacturing of the sputtering target in which the target material is hardly peeled off during sputtering.

Abstract: A sputtering target packaging structure comprising: a sputtering target including a cylinder part, a flange part disposed on an opening part at one end of the cylinder part, and a cap disposed on an opening part at the other end of the cylinder part; and a packing material made up of a sheet and covering an inner surface and an outer surface of the sputtering target in a close contact state, wherein the packing material includes seal parts on both end sides of the sputtering target.

Abstract: An object of the present invention is to provide a production method for a backing plate that can reduce displacement of the groove.

Abstract: Provided is a sputtering target that is less likely to cause abnormal discharge. The sputtering target has a sputtering surface in which a lightness L in a Lab color system is more than 27 and 51 or less.

Abstract: A sputtering target that is less likely to cause abnormal discharge is manufactured. A method for manufacturing a sputtering target includes performing multi-stage polishing on a sputtering surface of a target material having a Vickers hardness of 100 or less being made of metal by using a plurality of abrasives having different grit numbers in ascending order of grit number from a small grit number to a large grit number.

Abstract: Provided is a sputtering target that is less likely to cause abnormal discharge. The sputtering target has a sputtering surface in which a lightness L in a Lab color system is more than 27 and 51 or less.

Abstract: To provide a process for producing a cylindrical target which has almost no distortion in the longitudinal direction. The process for producing a cylindrical target according to the present invention comprises the steps of: processing a target material into a cylindrical shape; providing an adapter for attachment to a sputtering apparatus, in the target material processed into the cylindrical shape; and measuring a straightness in a longitudinal direction of an appearance of the target material having the adapter to confirm whether the straightness of the target material having the adapter is within a predetermined range.

Abstract: A sputtering target packaging structure comprising: a sputtering target including a cylinder part, a flange part disposed on an opening part at one end of the cylinder part, and a cap disposed on an opening part at the other end of the cylinder part; and a packing material made up of a sheet and covering an inner surface and an outer surface of the sputtering target in a close contact state, wherein the packing material includes seal parts on both end sides of the sputtering target.

Abstract: A pseudo defect sample for adjusting an ultrasonic flaw detection measurement condition to inspect a defect within a target material, the pseudo defect sample comprising a substrate which has a first surface and a second surface opposed to the first surface, the substrate having a counterbore which is formed therein from a side of the first surface to a first depth, and a flat-bottomed hole which is formed from the bottom surface of the counterbore to a second depth and formed in a part of a bottom surface of the counterbore, and a ratio ?/d of an equivalent circle diameter ? of the flat-bottomed hole to the second depth d of the flat-bottomed hole being: 0.08 or more and less than 0.40 when the equivalent circle diameter ? of the flat-bottomed hole is less than 0.3 mm; 0.1 or more and less than 0.60 when the equivalent circle diameter ? of the flat-bottomed hole is 0.3 mm or more and less than 0.4 mm; and 0.11 or more and less than 1.60 when the equivalent circle diameter ? of the flat-bottomed hole is 0.

Abstract: A method for machining a sputtering target that includes a sputtering surface, an opposing surface opposite to the sputtering surface, and an outer peripheral surface being between the sputtering surface and the opposing surface comprises the steps of: fixing the sputtering target on a fixing table by mounting the sputtering surface or the opposing surface of the sputtering target on the fixing table; and cutting the outer peripheral surface of the sputtering target by a cutting tool while rotating the cutting tool along a circumferential direction of the outer peripheral surface of the sputtering target.

Abstract: An air conditioning apparatus includes a refrigerant circuit in which a compressor for compressing heat source-side refrigerant, a first refrigerant channel switching device, a heat source side heat exchanger, an expansion device, and intermediate heat exchangers for performing heat exchange between the heat source-side refrigerant and a heat medium different from the heat source-side refrigerant are connected by pipes. Also, the air conditioning apparatus includes a heat medium circuit in which pumps for circulating the heat medium to be used for the heat exchange performed by the intermediate heat exchangers, a use-side heat exchanger, and channel switching devices for switching passages of the heat medium heated or cooled to the use-side heat exchanger are connected by pipes.

Abstract: A pseudo defect sample for adjusting an ultrasonic flaw detection measurement condition to inspect a defect within a target material, the pseudo defect sample comprising a substrate which has a first surface and a second surface opposed to the first surface, the substrate having a counterbore which is formed therein from a side of the first surface to a first depth, and a flat-bottomed hole which is formed from the bottom surface of the counterbore to a second depth and formed in a part of a bottom surface of the counterbore, and a ratio ?/d of an equivalent circle diameter ? of the flat-bottomed hole to the second depth d of the flat-bottomed hole being: 0.08 or more and less than 0.40 when the equivalent circle diameter ? of the flat-bottomed hole is less than 0.3 mm; 0.1 or more and less than 0.60 when the equivalent circle diameter ? of the flat-bottomed hole is 0.3 mm or more and less than 0.4 mm; and 0.11 or more and less than 1.60 when the equivalent circle diameter ? of the flat-bottomed hole is 0.

Abstract: When starting a cooling operation mode from a non-operating mode, the blower device of the indoor unit from which the start command is originated is operated. When starting a heating operation mode from a non-operating mode, the blower device of the indoor unit from which the start command is originated is operated after the heat medium temperature becomes equal to or greater than a preconfigured temperature.

Abstract: To provide a process for producing a cylindrical target which has almost no distortion in the longitudinal direction. The process for producing a cylindrical target according to the present invention comprises the steps of: processing a target material into a cylindrical shape; providing an adapter for attachment to a sputtering apparatus, in the target material processed into the cylindrical shape; and measuring a straightness in a longitudinal direction of an appearance of the target material having the adapter to confirm whether the straightness of the target material having the adapter is within a predetermined range.

Abstract: An air-conditioning apparatus includes actuation control means including an actuation unit that sequentially opens heat medium flow switching devices or heat medium flow control devices on a one-by-one basis. The actuation control means performs control in such a manner that start time of driving of pumps is later than start of actuation of the heat medium flow switching devices and the heat medium flow control devices.

Abstract: In a heat medium relay unit, a drain pan is configured to have width and depth dimensions larger than dimensions of an outer shell of a heat medium relay unit main body. The outer shell includes side panels, upper frames, lower frames, and an upper end surface, the position of which is higher than those of upper end surfaces of the lower frames.