Abstract: A semiconductor device producing apparatus includes a first transporter which moves a substrate to a first unit to undergo at least a first process, and a second transporter, other than the first transporter, which moves the substrate to a second unit, to undergo at least a second process.

Abstract: The present invention discloses a chemically amplified resist composition that is able to form a resist pattern that can be exposed in short wavelength regions, has good transparency, sensitivity, dry-etch resistance and resolution, while also exhibiting excellent adhesion to the substrate. This chemically amplified resist composition comprises: the combination of a base resin comprised of a polymer that is itself insoluble in a basic aqueous solution and contains at least (A) a monomer unit I having carboxylic acid or phenol protected with a specific protective group, and (B) a monomer unit II having an ester group or ether group that contains a cyclic carbonate structure, and can become soluble in a basic aqueous solution when the protective group of the monomer unit I is deprotected by the effect of the acid; and, a photo acid generator capable of generating an acid that can provoke deprotection of the protective group of monomer unit I when decomposed by absorption of imaging radiation.

Abstract: The negative-working resist composition which comprises a (meth)acrylate copolymer comprising (a) a vinyl monomer unit which contains in a side chain thereof at least one carbon--carbon double bond which does not concern itself with any polymerization reaction, but is able to be crosslinked with a crosslinking agent, (b) an acrylamide or methacrylamide monomer unit, (c) an acrylic acid or methacrylic acid monomer unit and (d) an acrylic acid or methacrylic acid adamantyl monomer unit as well as a crosslinking agent capable of being decomposed upon exposure to a patterning radiation and then causing crosslinking of said copolymer upon heating. The resist composition is particularly suitable for excimer laser lithography using an aqueous basic solution as a developer, and the formed resist patterns can exhibit a high sensitivity and excellent dry etch resistance without swelling.

Abstract: A semiconductor device producing method includes the steps of (a) subjecting a substrate which is transported by first transport means to at least a first process within a first unit, and (b) subjecting the substrate which is subjected to the step (a) and is transported by second transport means other than the first transport means to at least a second process within a second unit.

Abstract: A resist composition and a process for forming a resist pattern using a resist composition are disclosed. The present composition includes 100 parts by weight of a copolymer of a 2-norbornene-2-substituent unit and an acrylic acid ester unit of the formula I; ##STR1## wherein, X is a cyano or chloro group, R is tert-butyl, dimethylbenzyl, or tetrahydropyranyl, m is an integer of 9 to 2390, and n is an integer of 21 to 5180, and 1 to 20 parts by weight of a photo acid generator. A finely-resolved resist pattern with high sensitivity and good dry etch resistance is obtained by the present composition and present process for forming the resist pattern.

Abstract: A resist composition and a process for forming a resist pattern using a resist composition are disclosed. The present composition includes 100 parts by weight of a copolymer of a 2-norbornene-2-substituent unit and an acrylic acid ester unit of the formula I; ##STR1## wherein, X is a cyano or chloro group, R is tert-butyl, dimethylbenzyl, or tetrahydropyranyl, m is an integer of 9 to 2390, and n is an integer of 21 to 5180, and 1 to 20 parts by weight of a photo acid generator. A finely-resolved resist pattern with high sensitivity and good dry etch resistance is obtained by the present composition and present process for forming the resist pattern.

Abstract: Improved chemically amplified resist is provided that comprises 100 parts by weight of a copolymer produced from a first monomer unit having a recurrent acid labile pendant group that changes the polarity of the polymer and a second monomer unit having an alkali-soluble group and 1 to 20 parts by weight of a photo acid generator.

Abstract: New copolymers are disclosed which are copolymers of 1-(1'-cyanoethenyl)adamantane or 2-norbornene-2-carbonitrile monomer with an acrylate or methacrylate monomer. Resist compositions are also disclosed which comprise one of the disclosed new copolymers and an acid generator. The resist compositions advantageously form thinner resist films on substrates and, on the exposure to light having a short wavelength, such as KrF and ArF excimer laser light, provide finer resist pattern required in the production of advanced, highly integrated semiconductor devices. Novel 1-(1'-cyanoethenyl)adamantane is also disclosed.

Abstract: Metal containing compounds having a graphite-like layer structure are derived from poly(amino-s-triazine), [A], which has a layer structure and is represented by (C.sub.3 N.sub.3).sub.2 N.sub.x H.sub.y, where 2.ltoreq.x.ltoreq.4, and 0.ltoreq.y.ltoreq.8. Reaction of [A] with a transition metal M at 400.degree.-1000.degree. C. gives a compound represented by C.sub.a NH.sub.b M.sub.c, where 0.6.ltoreq.a.ltoreq.20.0, 0.ltoreq.b.ltoreq.1.0, and 0.001.ltoreq.c.ltoreq.0.5. This compound exhibits magnetism. Reaction of [A] with a halide of a transition metal or aluminum at 200.degree.-500.degree. C. gives C.sub.6 N.sub.p H.sub.q M.sub.r X.sub.s, where M is a transition metal or Al, X is a halogen, 8.ltoreq.p.ltoreq.10, 0.ltoreq.q.ltoreq.10, 0.6.ltoreq.r.ltoreq.1.5, and 0.ltoreq.s.ltoreq.1. When M is a transition metal the compound exhibits paramagnetism. When X is Al, heating of a powder of the compound at 800.degree.-950.degree. C.

Abstract: The invention provides a lithium secondary battery using hydric boron carbonitride which is a layered compound represented by BC.sub.x N.sub.y H.sub.z, where 0.5.ltoreq.x.ltoreq.12, 0.7.ltoreq.y.ltoreq.1.5, and 0.01.ltoreq.z.ltoreq.3, as the active material of the negative electrode. This compound is obtained by a CVD process. The electrolyte is a solution of a lithium salt in an organic solvent. The material of the positive electrode is an oxide such as MnO.sub.2 or V.sub.2 O.sub.5, a sulfide such as MoS.sub.2 or TiS.sub.2 or a conductive organic polymer such as polyaniline. In this secondary battery Li is smoothly intercalated in and released from the hydric boron carbonitride of the negative electrode, and the energy density with respect to the active material of the negative electrode is sufficiently high. This battery bears a fairly large number of charge-discharge cycles.

Abstract: A variable displacement hydraulic pump and a hydraulic motor are connected in a closed circuit. A pressure oil supply means includes the variable displacement hydraulic pump and a tilting controlling means for controlling a tilt angle of the hydraulic pump and supplies an amount of pressure oil corresponding to the tilt angle of the hydraulic pump to the hydraulic motor. When rotation of a prime mover is detected by a rotation detecting means, an opening and closing valve is changed over to a first position in which the pressure oil supply means is permitted to supply pressure oil. When stopping of the prime mover is detected by the rotation detecting means, the opening and closing valve is changed to a second position in which the pressure oil supply means is inhibited from supplying pressure oil.

Abstract: A polymeric compound, named poly(amino-s-triazine), which has a layer structure with a structural unit represented by (C.sub.3 N.sub.3).sub.2 N.sub.x H.sub.y, where 2.ltoreq.x.ltoreq.4 and 0.ltoreq.y.ltoreq.8, is obtained by reaction of cyanuric trichloride with ammonia or melamine. This compound is stable in the air up to about 400.degree. C. and exhibits fluorescence by excitation at wavelength of 365 nm. When the above reaction is carried out at a temperature ranging from room tempertaure to about 400.degree. C. the product is an oligomeric compound (C.sub.3 N.sub.3).sub.a (NH).sub.b (NH.sub.2).sub.c Cl.sub.d, where 2.ltoreq.a.ltoreq.10, 1.ltoreq.b.ltoreq.10, 0.ltoreq.c.ltoreq.11 and 1.ltoreq.d.ltoreq.12, and poly(amino-s-triazine) is obtained by heating the oligomeric compound at 400.degree.-600.degree. C. in an inactive gas. The oligomeric compound too exhibits fluorescence and is higher in fluorescence intensity.

Abstract: A hydraulic drive circuit system is equipped with an accelerator pedal and an accelerator lever for respectively instructing target revolution numbers for an engine, a link plate for selecting greater one of the instruction values, and a linkage and a switch for controlling valves respectively so as to close the flow passage of a line interposed between a charge pump and a low pressure line irrespective of the instruction value of the accelerator pedal when the accelerator lever has not been controlled but for controlling the valves so as to restrict the flow passage of the line in accordance with the instruction value of the accelerator pedal when the accelerator lever has been controlled.