Patents by Inventor Kok Wei TAN

Kok Wei TAN has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Automated lidar target simulation scanning systems and methods
    Patent number: 12174296
    Abstract: An apparatus automatically positions an optical test module relative to a Lidar sensor during a target simulation test of the Lidar sensor. The apparatus includes a sensor platform configured to support a Lidar sensor, and a test module platform configured to support an optical test module such that an optical window of the optical test module faces in a direction towards the Lidar sensor supported by the sensor platform.
    Type: Grant
    Filed: February 16, 2021
    Date of Patent: December 24, 2024
    Assignee: KEYSIGHT TECHNOLOGIES, INC.
    Inventors: Chan Fong Tan, Kok Eng Looi, Yenn Chang Tan, Chee Wei Liu
  • Methods and apparatus for reducing defects in preclean chambers
    Patent number: 11881385
    Abstract: Apparatus and methods use a unique process kit to protect a processing volume of a process chamber. The process kit includes a shield with a frame configured to be insertable into a shield and a foil liner composed of a metallic material that is attachable to the frame at specific points. The specific attachment points are spaced apart to produce an amount of flexibility based on a malleability of the metallic material. The amount of flexibility ranges from approximately 2.5 to approximately 4.5.
    Type: Grant
    Filed: April 24, 2020
    Date of Patent: January 23, 2024
    Assignee: APPLIED MATERIALS, INC.
    Inventors: Yueh Sheng Ow, Yuichi Wada, Junqi Wei, Kang Zhang, Ananthkrishna Jupudi, Sarath Babu, Kok Seong Teo, Kok Wei Tan
  • Methods and apparatus for prevention of component cracking using stress relief layer
    Patent number: 11557499
    Abstract: Methods and apparatus for protecting parts of a process chamber from thermal cycling effects of deposited materials. In some embodiments, a method of protecting the part of the process chamber includes wet etching the part with a weak alkali or acid, cleaning the part by bead blasting, coating at least a portion of a surface of the part with a stress relief layer. The stress relief layer forms a continuous layer that is approximately 50 microns to approximately 250 microns thick and is configured to preserve a structural integrity of the part from the thermal cycling of aluminum deposited on the part. The method may also include wet cleaning of the part with a heated deionized water rinse after formation of the stress relief layer.
    Type: Grant
    Filed: October 16, 2020
    Date of Patent: January 17, 2023
    Assignee: APPLIED MATERIALS, INC.
    Inventors: Yuichi Wada, Kok Wei Tan, Chul Nyoung Lee, Siew Kit Hoi, Xinxin Wang, Zheng Min Clarence Chong, Yaoying Zhong, Kok Seong Teo
  • METHODS AND APPARATUS FOR PREVENTION OF COMPONENT CRACKING USING STRESS RELIEF LAYER
    Publication number: 20220122871
    Abstract: Methods and apparatus for protecting parts of a process chamber from thermal cycling effects of deposited materials. In some embodiments, a method of protecting the part of the process chamber includes wet etching the part with a weak alkali or acid, cleaning the part by bead blasting, coating at least a portion of a surface of the part with a stress relief layer. The stress relief layer forms a continuous layer that is approximately 50 microns to approximately 250 microns thick and is configured to preserve a structural integrity of the part from the thermal cycling of aluminum deposited on the part. The method may also include wet cleaning of the part with a heated deionized water rinse after formation of the stress relief layer.
    Type: Application
    Filed: October 16, 2020
    Publication date: April 21, 2022
    Inventors: Yuichi WADA, Kok Wei TAN, Chul Nyoung LEE, Siew Kit HOI, Xinxin WANG, Zheng Min Clarence CHONG, Yaoying ZHONG, Kok Seong TEO
  • METHODS AND APPARATUS FOR REDUCING DEFECTS IN PRECLEAN CHAMBERS
    Publication number: 20210335582
    Abstract: Apparatus and methods use a unique process kit to protect a processing volume of a process chamber. The process kit includes a shield with a frame configured to be insertable into a shield and a foil liner composed of a metallic material that is attachable to the frame at specific points. The specific attachment points are spaced apart to produce an amount of flexibility based on a malleability of the metallic material. The amount of flexibility ranges from approximately 2.5 to approximately 4.5.
    Type: Application
    Filed: April 24, 2020
    Publication date: October 28, 2021
    Inventors: Yueh Sheng OW, Yuichi WADA, Junqi WEI, Kang ZHANG, Ananthkrishna JUPUDI, Sarath BABU, Kok Seong TEO, Kok Wei TAN