Abstract: A method for efficiently and safely cleaning an apparatus for a tin compound and a highly purified apparatus for a tin compound are provided. A method of cleaning an apparatus that has been in contact with a tin compound having formula (1) includes at least steps (A) to (C) in this order: (A) a step of cleaning the apparatus with a non-protonic solvent, (B) a step of cleaning the apparatus with an acidic aqueous solution and/or alkaline aqueous solution, and (C) a step of cleaning the apparatus with ultrapure water having a resistivity of 17 M?·cm at 25° C. RpSnXm??(1) R is a hydrocarbon group, p is an integer of 0 to 3, X is a hydrolyzable substituent, and m=4-p.

Abstract: A method for efficiently and safely cleaning an apparatus for tin compound and a highly purified tin compound apparatus are provided. A cleaning method for an apparatus that has been in contact with a tin compound having formula (1) below includes at least steps (A) to (C), in which step (B) is performed after step (A), and step (C) is performed after step (B): (A) a step of cleaning the apparatus with a non-protic solvent, (B) a step of cleaning the apparatus with alcohol, and (C) a step of cleaning the apparatus with ultrapure water having a resistivity value of 17 M?·cm at 25° C. RpSnXm??(1) In formula (1), R is a hydrocarbon group, p is an integer from 1 to 3, X is a hydrolyzable substituent, and m=4?p.

Abstract: The sheet material according to the present invention has a polymer elastic body and a fibrous base material comprising ultrafine fibers, wherein the average single fiber diameter of the ultrafine fibers is 0.1 ?m to 10.0 ?m, the polymer elastic body has a hydrophilic group and an N-acylurea bond and/or an isourea bond, and the following conditions are satisfied: the longitudinal stiffness, in accordance with method A (45° cantilever method) in the text of “8.21 Stiffness” of JIS L 1096:2010 “Testing Methods for Woven and Knitted Fabrics”, is 40 mm to 140 mm; and after immersion for 24 hours in N,N-dimethylformamide, the following are obtained in wear testing using a pressing load of 12.0 kPa and 20,000 friction cycles in accordance with method E (Martindale method) in the text of “8.19 Wear Strength and Friction Discoloration” of JIS L 1096:2010 “Testing Methods for Woven and Knitted Fabrics”: a grade of at least 4 and a wear loss of not more than 25 mg.

Abstract: A method for producing a tin compound represented by formula (A1) with a purity of 95 mol % or higher, involves a step of distilling the tin compound, in which the number of plates of the distillation is 10 or more, and the reflux ratio is 30 or less. RSnX3??(A1) In formula (A1), R is an organic group with 1 to 30 carbon atoms, and may be substituted with halogen, oxygen atoms, or nitrogen atoms. X is selected from OR? and NR?2. R? is an organic group with 1 to 10 carbon atoms, and part may be substituted with halogen, oxygen atoms, or nitrogen atoms. When there are multiple R? groups in the molecule, they may have the same or different structures, and they may be bonded to each other to form a cyclic structure.

Abstract: Monoorgano tin compounds having chemical formula R?SnX3 and high purity are described. R? is an optionally substituted hydrocarbyl group, X is selected from NR2 and OR, and each R is independently a linear or branched alkyl group having about 1 to about 10 carbon atoms. Methods for synthesizing and purifying these compounds are also provided. The monoorgano tin compounds may be used for the formation of high-resolution EUV lithography patterning precursors and are attractive due to their high purity and minimal concentration of diorgano tin impurities.

Abstract: Aspects of the disclosure relate to methods for producing organotin compounds with high purity, which may involve the use of specific additives or reaction conditions. Methods for purifying organotin compounds and suppressing the formation of impurities in organotin compounds are also described.

Abstract: In an MRI apparatus, a dynamic range of an MR signal is extended without increasing the time for imaging nor manufacturing cost. The MRI apparatus is provided with a receiver 200 configured to perform the A/D conversion on two-system nuclear magnetic resonance signals according to a direct sampling method. The receiver 200 comprises a distributor 201 configured to divide each of the nuclear magnetic resonance signals into two-system signals, an attenuator 202 configured to attenuate an overflowed signal outputted from the distributor, and a switch 203 configured to switch between the signals having the same gain to output the switched signal. Also provided is a digital processing means having ADCs of the same number as that of the nuclear magnetic resonance signals to perform the AD conversion respectively for the two types of signals, restore the attenuated signals, and recombine the signals.

Abstract: The sheet material according to the present invention has a polymer elastic body and a fibrous base material comprising ultrafine fibers, wherein the average single fiber diameter of the ultrafine fibers is 0.1 µm to 10.0 µm, the polymer elastic body has a hydrophilic group and an N-acylurea bond and/or an isourea bond, and the following conditions are satisfied : the longitudinal stiffness, in accordance with method A (45° cantilever method) in the text of “8.21 Stiffness” of JIS L 1096:2010 “Testing Methods for Woven and Knitted Fabrics”, is 40 mm to 140 mm ; and after immersion for 24 hours in N,N-dimethylformamide, the following are obtained in wear testing using a pressing load of 12.0 kPa and 20,000 friction cycles in accordance with method E (Martindale method) in the text of “8.19 Wear Strength and Friction Discoloration” of JIS L 1096:2010 “Testing Methods for Woven and Knitted Fabrics”: a grade of at least 4 and a wear loss of not more than 25 mg.

Abstract: Provided is a semiconductor nanoparticle-containing composition capable of forming a wavelength conversion layer that efficiently converts the wavelength of excitation light and exhibits sufficient luminescence intensity. An aspect of the semiconductor nanoparticle-containing composition of the present invention contains semiconductor nanoparticles (A) and a coloring matter (B) and further contains a polymerizable compound (C), in which the semiconductor nanoparticles (A) have a maximum emission wavelength in the range of 500 to 670 nm over a wavelength range of 300 to 780 nm, and the coloring matter (B) contains at least one selected from coloring matters (B1) to (B5) having specific structures.

Abstract: The purpose of the present invention is to provide: a sheet-like article which has a good balance between soft texture and excellent light resistance; and a method for producing this sheet-like article. In order to achieve this purpose, a sheet-like article according to the present invention has the following configuration. Specifically, a sheet-like article which contains a polymer elastic body in a fibrous base material, wherein: the fibrous base material is composed of ultrafine fibers that have an average single fiber diameter of from 0.1 ?m to 10 ?m; the polymer elastic body has a hydrophilic group, while containing a polyether diol as a constituent; the polymer elastic body internally has an N-acylurea bond and/or an isourea bond; and the condition 1 and the condition 2 described below are satisfied. Condition 1: The bending resistance in the lengthwise direction as determined in accordance with specific standards is from 40 mm to 140 mm.

Abstract: A purpose of the present invention is to provide a sheet-shaped article and a manufacturing method therefor, said sheet-shaped article demonstrating both a supple texture and superior wear resistance. In order to achieve this purpose, a sheet-shaped article according to the present invention is a sheet-shaped article that includes, in a fibrous base material, a polymer elastic body with a hydrophilic group, said fibrous base material comprising extremely fine fibers with an average individual fiber fineness of 0.1 ?m to 10 ?m, wherein the sheet-shaped article has N-acylurea bonding or isourea bonding within the polymer elastic body, and a monovalent positive ion-including inorganic salt is present at a rate of 0.1 mass % to 5 mass % with regard to the mass of the polymer elastic body.