Patents by Inventor Koki Yoshimura
Koki Yoshimura has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Publication number: 20240047244Abstract: A liquid processing apparatus provided with a plurality of processors, wherein each of the processors includes a stage on which a substrate is placed, a cup surrounding the stage and the substrate placed thereon, a first processing nozzle and a second processing nozzle configured to supply a first and second processing liquid to the substrate, respectively, a first standby portion where the first processing nozzle stands by, a second standby portion where the second processing nozzle stands by, a first mover configured to move the first processing nozzle between the first standby portion and a first processing position, a second mover configured to move the second processing nozzle between the second standby portion and a second processing position, and a guide shared by the first mover and the second mover such that each of the first mover and the second mover moves in the left-right direction.Type: ApplicationFiled: August 8, 2023Publication date: February 8, 2024Inventors: Koki YOSHIMURA, Hayato HOSAKA
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Publication number: 20240047237Abstract: A liquid processing apparatus includes: a stage; a cup that surrounds a substrate placed on the stage; a processing liquid supplier that supplies a processing liquid to the substrate; an exhaust port provided in the cup to exhaust the cup; an annular body provided inside the cup to surround the substrate and form a flow path for a gas flowing into the cup; a lifting mechanism that raises or lowers the annular body relative to the cup to perform a switching between a first state in which the annular body is located at a first relative height to perform a first exhaust and a second state in which the annular body is located at a second relative height to perform a second exhaust; and a drainage port that opens to an upstream side of the exhaust port in each of the first and second flow paths.Type: ApplicationFiled: August 1, 2023Publication date: February 8, 2024Inventors: Koki YOSHIMURA, Satoshi NAKAKIDO
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Patent number: 11031261Abstract: A liquid processing apparatus for performing liquid processing with respect to a substrate using processing fluid, includes: a plurality of substrate holding units arranged side by side in a left-right direction; a nozzle configured to supply the processing fluid to the substrate held in each of the substrate holding units; and a nozzle moving mechanism configured to move the nozzle forward and backward in a front-rear direction intersecting an arrangement direction of the substrate holding units between a supplying position in which the processing fluid is supplied to a region including a central portion of the substrate and a waiting position which is defined at a rear side of a row of the substrate holding units opposite to a front side of the row of the substrate holding units at which the substrate is loaded and unloaded.Type: GrantFiled: June 21, 2018Date of Patent: June 8, 2021Assignee: TOKYO ELECTRON LIMITEDInventors: Yasushi Takiguchi, Koki Yoshimura, Taro Yamamoto, Hideharu Kyouda, Koshi Muta
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Patent number: 10649334Abstract: Disclosed is a liquid processing apparatus for performing a liquid processing by supplying a processing liquid from a nozzle to a substrate. The apparatus includes: a cup body provided to surround a substrate holding unit; a nozzle arm provided with a nozzle and supported by a support unit; a moving mechanism configured to move the nozzle arm via the support unit between a stand-by position and a processing position; an elevating mechanism configured to move up and down the support unit; a cover member including a top plate portion provided above a driving region and configured to partition the driving region from a region where the substrate is held within the cup body; an opening formed in a portion corresponding to a moving path of the support unit in the top plate portion; and an exhaust mechanism configured to evacuate the driving region.Type: GrantFiled: August 10, 2018Date of Patent: May 12, 2020Assignee: Tokyo Electron LimitedInventors: Koki Yoshimura, Shogo Takahasi, Yasushi Takiguchi, Taro Yamamoto
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Publication number: 20190049845Abstract: Disclosed is a liquid processing apparatus for performing a liquid processing by supplying a processing liquid from a nozzle to a substrate. The apparatus includes: a cup body provided to surround a substrate holding unit; a nozzle arm provided with a nozzle and supported by a support unit; a moving mechanism configured to move the nozzle arm via the support unit between a stand-by position and a processing position; an elevating mechanism configured to move up and down the support unit; a cover member including a top plate portion provided above a driving region and configured to partition the driving region from a region where the substrate is held within the cup body; an opening formed in a portion corresponding to a moving path of the support unit in the top plate portion; and an exhaust mechanism configured to evacuate the driving region.Type: ApplicationFiled: August 10, 2018Publication date: February 14, 2019Inventors: Koki Yoshimura, Shogo Takahasi, Yasushi Takiguchi, Taro Yamamoto
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Publication number: 20180308719Abstract: A liquid processing apparatus for performing liquid processing with respect to a substrate using processing fluid, includes: a plurality of substrate holding units arranged side by side in a left-right direction; a nozzle configured to supply the processing fluid to the substrate held in each of the substrate holding units; and a nozzle moving mechanism configured to move the nozzle forward and backward in a front-rear direction intersecting an arrangement direction of the substrate holding units between a supplying position in which the processing fluid is supplied to a region including a central portion of the substrate and a waiting position which is defined at a rear side of a row of the substrate holding units opposite to a front side of the row of the substrate holding units at which the substrate is loaded and unloaded.Type: ApplicationFiled: June 21, 2018Publication date: October 25, 2018Inventors: Yasushi TAKIGUCHI, Koki YOSHIMURA, Taro YAMAMOTO, Hideharu KYOUDA, Koshi MUTA
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Patent number: 10014190Abstract: A liquid processing apparatus for performing liquid processing with respect to a substrate using processing fluid, includes: a plurality of substrate holding units arranged side by side in a left-right direction; a nozzle configured to supply the processing fluid to the substrate held in each of the substrate holding units; and a nozzle moving mechanism configured to move the nozzle forward and backward in a front-rear direction intersecting an arrangement direction of the substrate holding units between a supplying position in which the processing fluid is supplied to a region including a central portion of the substrate and a waiting position which is defined at a rear side of a row of the substrate holding units opposite to a front side of the row of the substrate holding units at which the substrate is loaded and unloaded.Type: GrantFiled: July 24, 2014Date of Patent: July 3, 2018Assignee: TOKYO ELECTRON LIMITEDInventors: Yasushi Takiguchi, Koki Yoshimura, Taro Yamamoto, Hideharu Kyouda, Koshi Muta
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Patent number: 9470979Abstract: The present invention is a developing treatment apparatus for performing development by supplying a developing solution to a substrate having a front surface coated with a positive resist or a negative resist and then subjected to exposure wherein a movable cup is raised to introduce one of scattering developing solutions for the positive and negative resists into an inner peripheral flow path of a cup and the movable cup is lowered to introduce the other of scattering developing solutions for the positive and negative resists into an outer peripheral flow path of the cup, and the developing solution introduced into the inner peripheral flow path and the developing solution introduced into the outer peripheral flow path are separately drained.Type: GrantFiled: February 24, 2016Date of Patent: October 18, 2016Assignee: Tokyo Electron LimitedInventors: Yasushi Takiguchi, Taro Yamamoto, Yoshinori Ikeda, Koki Yoshimura, Yoshiki Okamoto, Masahiro Fukuda
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Publication number: 20160202609Abstract: The present invention is a developing treatment apparatus for performing development by supplying a developing solution to a substrate having a front surface coated with a positive resist or a negative resist and then subjected to exposure wherein a movable cup is raised to introduce one of scattering developing solutions for the positive and negative resists into an inner peripheral flow path of a cup and the movable cup is lowered to introduce the other of scattering developing solutions for the positive and negative resists into an outer peripheral flow path of the cup, and the developing solution introduced into the inner peripheral flow path and the developing solution introduced into the outer peripheral flow path are separately drained.Type: ApplicationFiled: February 24, 2016Publication date: July 14, 2016Inventors: Yasushi TAKIGUCHI, Taro YAMAMOTO, Yoshinori IKEDA, Koki YOSHIMURA, Yoshiki OKAMOTO, Masahiro FUKUDA
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Patent number: 9304398Abstract: The present invention is a developing treatment apparatus for performing development by supplying a developing solution to a substrate having a front surface coated with a positive resist or a negative resist and then subjected to exposure wherein a movable cup is raised to introduce one of scattering developing solutions for the positive and negative resists into an inner peripheral flow path of a cup and the movable cup is lowered to introduce the other of scattering developing solutions for the positive and negative resists into an outer peripheral flow path of the cup, and the developing solution introduced into the inner peripheral flow path and the developing solution introduced into the outer peripheral flow path are separately drained.Type: GrantFiled: September 10, 2013Date of Patent: April 5, 2016Assignee: Tokyo Electron LimitedInventors: Yasushi Takiguchi, Taro Yamamoto, Yoshinori Ikeda, Koki Yoshimura, Yoshiki Okamoto, Masahiro Fukuda
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Publication number: 20150027503Abstract: A liquid processing apparatus for performing liquid processing with respect to a substrate using processing fluid, includes: a plurality of substrate holding units arranged side by side in a left-right direction; a nozzle configured to supply the processing fluid to the substrate held in each of the substrate holding units; and a nozzle moving mechanism configured to move the nozzle forward and backward in a front-rear direction intersecting an arrangement direction of the substrate holding units between a supplying position in which the processing fluid is supplied to a region including a central portion of the substrate and a waiting position which is defined at a rear side of a row of the substrate holding units opposite to a front side of the row of the substrate holding units at which the substrate is loaded and unloaded.Type: ApplicationFiled: July 24, 2014Publication date: January 29, 2015Inventors: Yasushi TAKIGUCHI, Koki YOSHIMURA, Taro YAMAMOTO, Hideharu KYOUDA, Koshi MUTA
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Publication number: 20140071411Abstract: The present invention is a developing treatment apparatus for performing development by supplying a developing solution to a substrate having a front surface coated with a positive resist or a negative resist and then subjected to exposure wherein a movable cup is raised to introduce one of scattering developing solutions for the positive and negative resists into an inner peripheral flow path of a cup and the movable cup is lowered to introduce the other of scattering developing solutions for the positive and negative resists into an outer peripheral flow path of the cup, and the developing solution introduced into the inner peripheral flow path and the developing solution introduced into the outer peripheral flow path are separately drained.Type: ApplicationFiled: September 10, 2013Publication date: March 13, 2014Applicant: Tokyo Electron LimitedInventors: Yasushi TAKIGUCHI, Taro YAMAMOTO, Yoshinori IKEDA, Koki YOSHIMURA, Yoshiki OKAMOTO, Masahiro FUKUDA
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Publication number: 20060005710Abstract: The present invention relates to a deodorization technique for an operation involving malodor, and aims to provide a deodorization apparatus and a deodorization method enhanced in deodorization efficiency and reduced in initial investment and running cost. The deodorization apparatus includes an intake port 13 for taking in air with malodor generated in a coating booth 1, an injection nozzle 12a for supplying deodorant into the air with deodorant taken in through the intake port 13, an exhaust port 17a for discharging the air taken in through the intake port 13, an exhaust fan 17 for forming an airflow from the intake port 13 to the exhaust port 17a, and a second filter 15 which, prior to exhaust through the exhaust port 17a, removes a malodorous substance from the air with deodorant together with the deodorant.Type: ApplicationFiled: July 23, 2003Publication date: January 12, 2006Inventors: Tateo Uegaki, Koki Yoshimura