Patents by Inventor Komal Garde

Komal Garde has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Methods and apparatus for processing a substrate
    Patent number: 12581926
    Abstract: Methods and apparatus for processing a substrate are provided. For example, a method includes sputtering a material from a target in a PVD chamber to form a material layer on a layer comprising a feature of the substrate, the feature having an opening width defined by a first sidewall and a second sidewall, the material layer having a greater lateral thickness at the top surface of the layer than a thickness on the first sidewall or the second sidewall within the feature, depositing additional material on the layer by biasing the layer with an RF bias at a low power, etching the material layer from the layer by biasing the layer with an RF bias at a high-power, and repeatedly alternating between the low power and the high-power at a predetermined frequency.
    Type: Grant
    Filed: July 14, 2021
    Date of Patent: March 17, 2026
    Assignee: Applied Materials Inc.
    Inventors: Bencherki Mebarki, Joung Joo Lee, Komal Garde, Kishor Kumar Kalathiparambil, Xianmin Tang, Xiangjin Xie, Rui Li
  • METHODS AND APPARATUS FOR PROCESSING A SUBSTRATE
    Publication number: 20230017383
    Abstract: Methods and apparatus for processing a substrate are provided. For example, a method includes sputtering a material from a target in a PVD chamber to form a material layer on a layer comprising a feature of the substrate, the feature having an opening width defined by a first sidewall and a second sidewall, the material layer having a greater lateral thickness at the top surface of the layer than a thickness on the first sidewall or the second sidewall within the feature, depositing additional material on the layer by biasing the layer with an RF bias at a low power, etching the material layer from the layer by biasing the layer with an RF bias at a high-power, and repeatedly alternating between the low power and the high-power at a predetermined frequency.
    Type: Application
    Filed: July 14, 2021
    Publication date: January 19, 2023
    Inventors: Bencherki MEBARKI, Joung Joo LEE, Komal GARDE, Kishor Kumar KALATHIPARAMBIL, Xianmin TANG, Xiangjin XIE, Rui LI
  • Application of electrical stimulation via nanoelectrodes to modulate stem cells
    Patent number: 11208647
    Abstract: The presently disclosed subject matter relates generally to the delivery of electrical stimuli via cell-penetrating nanoelectrodes. Such electrical stimuli leads to differentiation of cells, including but not limited to adipose derived stem cells, to neural lineage, specifically to neural cells.
    Type: Grant
    Filed: May 28, 2019
    Date of Patent: December 28, 2021
    Assignee: North Carolina Agricultural and Technical State University
    Inventors: Shyam Aravamudhan, Komal Garde
  • APPLICATION OF ELECTRICAL STIMULATION VIA NANOELECTRODES TO MODULATE STEM CELLS
    Publication number: 20190359967
    Abstract: The presently disclosed subject matter relates generally to the delivery of electrical stimuli via cell-penetrating nanoelectrodes. Such electrical stimuli leads to differentiation of cells, including but not limited to adipose derived stem cells, to neural lineage, specifically to neural cells.
    Type: Application
    Filed: May 28, 2019
    Publication date: November 28, 2019
    Inventors: Shyam Aravamudhan, Komal Garde