Patents by Inventor Kong-Jung Sa

Kong-Jung Sa has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 8551791
    Abstract: Apparatus and method for manufacturing a semiconductor device through a layer material dimension analysis increase productivity. The method includes performing a semiconductor manufacturing process of at least one reference substrate and at least one target substrate in a semiconductor process device, detecting a reference spectrum and a reference profile for the reference substrate, determining a relation function between the detected reference spectrum and reference profile, detecting a real-time spectrum of the target substrate, and determining in real time a real-time profile of the target substrate processed in the semiconductor process device by using the detected real-time spectrum as a variable in the determined relation function.
    Type: Grant
    Filed: June 24, 2009
    Date of Patent: October 8, 2013
    Assignee: Samsung Electronics Co., Ltd.
    Inventors: Jang-Ik Park, Chung-Sam Jun, Hwan-Shik Park, Ji-Hye Kim, Kwan-Woo Ryu, Kong-Jung Sa, So-Yeon Yun
  • Publication number: 20090325326
    Abstract: Apparatus and method for manufacturing a semiconductor device through a layer material dimension analysis increase productivity. The method includes performing a semiconductor manufacturing process of at least one reference substrate and at least one target substrate in a semiconductor process device, detecting a reference spectrum and a reference profile for the reference substrate, determining a relation function between the detected reference spectrum and reference profile, detecting a real-time spectrum of the target substrate, and determining in real time a real-time profile of the target substrate processed in the semiconductor process device by using the detected real-time spectrum as a variable in the determined relation function.
    Type: Application
    Filed: June 24, 2009
    Publication date: December 31, 2009
    Inventors: Jang-Ik Park, Chung-Sam Jun, Hwan-Shik Park, Ji-Hye Kim, Kwan-Woo Ryu, Kong-Jung Sa, So-Yeon Yun
  • Publication number: 20080237461
    Abstract: In an autofocus method, an electron beam is scanned onto a subject through a condensing member. A setting condition of the condensing member is changed within a first range. An image evaluation value is measured using a secondary electron current from the subject according to the setting condition within the first range. A second range adjacent to the first range and including the setting condition corresponding to the first maximum is set when a first maximum of the image evaluation value is not a peak value. The setting condition is changed within the second range. An image evaluation value is measured using a secondary electron current according to the setting condition within the second range. The condensing member is set with the setting condition corresponding to a second maximum of the image evaluation value when the second maximum value is the peak value.
    Type: Application
    Filed: March 25, 2008
    Publication date: October 2, 2008
    Applicant: Samsung Electronics Co., Ltd.
    Inventors: Jong-Deok Kim, Byung-Am Lee, Kyung-Ho Kim, Byung-Seol Ahn, Young-Hun Park, Kong-Jung Sa