Patents by Inventor Konrad DYBEK

Konrad DYBEK has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Hollow cathode system, device and method for the plasma-assisted treatment of substrates
    Patent number: 9190249
    Abstract: A hollow cathode system, a device and a method for the plasma-assisted treatment of substrates includes at least one hollow cathode, which can be connected to a power supply. The hollow cathode includes an electrically conducting main body with an opening which is bounded by ribs, follows a spiral or meandering path and allows a gas to pass through in a direction perpendicular to a surface of the main body. Connecting bridge elements are provided on the ribs. The bridge elements serve ensure mechanical stability of the hollow cathode and optimize potential distribution of the hollow cathode. With the hollow cathode system, high treatment rates are achieved for homogeneous treatment of substrates of a large surface area with high plasma stability.
    Type: Grant
    Filed: October 15, 2014
    Date of Patent: November 17, 2015
    Assignee: VON ARDENNE GmbH
    Inventors: Konrad Dybek, Frank Stahr, Klaus Schade
  • HOLLOW CATHODE SYSTEM, DEVICE AND METHOD FOR THE PLASMA-ASSISTED TREATMENT OF SUBSTRATES
    Publication number: 20150104896
    Abstract: A hollow cathode system, a device and a method for the plasma-assisted treatment of substrates includes at least one hollow cathode, which can be connected to a power supply. The hollow cathode includes an electrically conducting main body with an opening which is bounded by ribs, follows a spiral or meandering path and allows a gas to pass through in a direction perpendicular to a surface of the main body. Connecting bridge elements are provided on the ribs. The bridge elements serve ensure mechanical stability of the hollow cathode and optimize potential distribution of the hollow cathode. With the hollow cathode system, high treatment rates are achieved for homogeneous treatment of substrates of a large surface area with high plasma stability.
    Type: Application
    Filed: October 15, 2014
    Publication date: April 16, 2015
    Applicant: VON ARDENNE GMBH
    Inventors: Konrad DYBEK, Frank STAHR, Klaus SCHADE