Abstract: A catadioptric lens includes at least two optical elements arranged along an optical axis. Both optical elements are configured as a mirror having a substrate and a highly reflective coating applied to an interface of the substrate. The highly reflective coating extends from the interface of the substrate along a surface normal. At least one of the highly reflective coatings has one or a plurality of layers. The optical total layer thickness of the one layer of the plurality of layers increases radially from the inner area outward.

Abstract: Reflective optical element with extended service life for VUV wavelengths includes a substrate (41) and a metal layer (49) thereon. At least one metal fluoride layer (43) on the metal layer faces away from the substrate and at least one oxide layer (45) on the metal fluoride layer faces away from the substrate. The thicknesses of the layers on the metal layer facing away from the substrate are selected so that the electrical field of a standing wave, formed when a relevant wavelength is reflected, has a minimum in the region of the oxide layer. In addition, the relevant wavelength is selected so that, from a minimum VUV wavelength range to the relevant wavelengths, the integral over the extinction coefficients of the material of the at least one oxide layer is between 15% and 47% of the corresponding integral from the minimum wavelengths to a maximum wavelength.

Abstract: A catadioptric lens includes at least two optical elements arranged along an optical axis. Both optical elements are configured as a mirror having a substrate and a highly reflective coating applied to an interface of the substrate. The highly reflective coating extends from the interface of the substrate along a surface normal. At least one of the highly reflective coatings has one or a plurality of layers. The optical total layer thickness of the one layer of the plurality of layers increases radially from the inner area outward.

Abstract: An optical element includes: a substrate, a reflective coating, applied to the substrate, for reflecting radiation in a first wavelength range (??1) between 100 nm and 700 nm, preferably between 100 nm and 300 nm, more preferably between 100 nm and 200 nm, and a protective coating applied to the reflective coating. The substrate is formed from a material which is transparent to the radiation in the first wavelength range (??1). The reflective coating is applied to a rear face of the substrate and is structured to reflect radiation that passes through the substrate to the reflective coating. Also disclosed are an optical arrangement with at least one such optical element and a method of producing such an optical element.

Abstract: Proposed for cleaning optical elements for the ultraviolet wavelength range having at least one metal-containing layer on a surface is a process that includes: —supplying activated hydrogen to the surface having the metal-containing layer; subsequently supplying inert gas having an H2O volume fraction of below 5 ppm, preferably below 1 ppm, particularly preferably below 0.2 ppm. To this end, an optical system (1) includes a housing (122), a supply line (161) of activated hydrogen, a supply line (162) of inert gas having an H2O volume fraction of below 5 ppm and a discharge line (163) for pumping gas out of the housing.

Abstract: The disclosure relates to an optical system, in particular for microscopy, which includes a beam splitter having a light entrance surface and a light exit surface, wherein the beam splitter absorbs. For a specified operating wavelength range of the optical system, less than 20% of electromagnetic radiation is incident on the light entrance surface. The beam splitter is arranged in the optical system such that the angles of incidence which occur during operation of the optical system at the light entrance surface and/or at the light exit surface, with reference to the respective surface normal, are at least 70°.

Abstract: A reflective optical element, in particular for a DUV or VUV operating wavelength range, includes a substrate, a dielectric layer system and a metallic coating between the substrate and the dielectric layer system. The dielectric layer system (26) includes a layer (L) of material having a lower refractive index n1 at the operating wavelength, a layer (H) of material having a higher refractive index n2 at the operating wavelength and a layer (M) of material having a refractive index n3 at the operating wavelength, where n1<n3<n2. The layer (M) is arranged at at least one transition from a layer (L) to a layer (H) and/or from a layer (H) to a layer (L). The dielectric layer system has a four-layer sequence of (LMHM)m or (HMLM)m, where m is equal to the number of four-layer sequences in the dielectric layer system.

Abstract: Reflective optical element with extended service life for VUV wavelengths includes a substrate (41) and a metal layer (49) thereon. At least one metal fluoride layer (43) on the metal layer faces away from the substrate and at least one oxide layer (45) on the metal fluoride layer faces away from the substrate. The thicknesses of the layers on the metal layer facing away from the substrate are selected so that the electrical field of a standing wave, formed when a relevant wavelength is reflected, has a minimum in the region of the oxide layer. In addition, the relevant wavelength is selected so that, from a minimum VUV wavelength range to the relevant wavelengths, the integral over the extinction coefficients of the material of the at least one oxide layer is between 15% and 47% of the corresponding integral from the minimum wavelengths to a maximum wavelength.

Abstract: In order to make possible both good laser resistance and good antireflection properties, an optical element, in particular for UV lithography, comprising a substrate and a coating on the substrate having at least four layers, is proposed, wherein a first layer comprising a low refractive index inorganic fluoride compound is arranged on the substrate, a layer comprising an inorganic oxide-containing compound is arranged as a layer the most distant from the substrate, and at least two further layers each comprising an inorganic fluoride compound or an inorganic oxide-containing compound are arranged alternately between the first and the most distant layers.

Abstract: Proposed for cleaning optical elements for the ultraviolet wavelength range having at least one metal-containing layer on a surface is a process that includes: —supplying activated hydrogen to the surface having the metal-containing layer; subsequently supplying inert gas having an H2O volume fraction of below 5 ppm, preferably below 1 ppm, particularly preferably below 0.2 ppm. To this end, an optical system (1) includes a housing (122), a supply line (161) of activated hydrogen, a supply line (162) of inert gas having an H2O volume fraction of below 5 ppm and a discharge line (163) for pumping gas out of the housing.

Abstract: A catadioptric lens includes at least two optical elements arranged along an optical axis. Both optical elements are configured as a mirror having a substrate and a highly reflective coating applied to an interface of the substrate. The highly reflective coating extends from the interface of the substrate along a surface normal. At least one of the highly reflective coatings has one or a plurality of layers. The optical total layer thickness of the one layer of the plurality of layers increases radially from the inner area outward.

Abstract: The disclosure relates to an optical system, in particular for microscopy, which includes a beam splitter having a light entrance surface and a light exit surface, wherein the beam splitter absorbs. For a specified operating wavelength range of the optical system, less than 20% of electromagnetic radiation is incident on the light entrance surface. The beam splitter is arranged in the optical system such that the angles of incidence which occur during operation of the optical system at the light entrance surface and/or at the light exit surface, with reference to the respective surface normal, are at least 70°.

Abstract: A reflective optical element, in particular for a DUV or VUV operating wavelength range, includes a substrate, a dielectric layer system and a metallic coating between the substrate and the dielectric layer system. The dielectric layer system (26) includes a layer (L) of material having a lower refractive index n1 at the operating wavelength, a layer (H) of material having a higher refractive index n2 at the operating wavelength and a layer (M) of material having a refractive index n3 at the operating wavelength, where n1<n3<n2. The layer (M) is arranged at at least one transition from a layer (L) to a layer (H) and/or from a layer (H) to a layer (L). The dielectric layer system has a four-layer sequence of (LMHM)m or (HMLM)m, where m is equal to the number of four-layer sequences in the dielectric layer system.

Abstract: In order to make possible both good laser resistance and good antireflection properties, an optical element, in particular for UV lithography, comprising a substrate and a coating on the substrate having at least four layers, is proposed, wherein a first layer comprising a low refractive index inorganic fluoride compound is arranged on the substrate, a layer comprising an inorganic oxide-containing compound is arranged as a layer the most distant from the substrate, and at least two further layers each comprising an inorganic fluoride compound or an inorganic oxide-containing compound are arranged alternately between the first and the most distant layers.

Abstract: In order to make possible both good laser resistance and good antireflection properties, an optical element, in particular for UV lithography, comprising a substrate and a coating on the substrate having at least four layers, is proposed, wherein a first layer comprising a low refractive index inorganic fluoride compound is arranged on the substrate, a layer comprising an inorganic oxide-containing compound is arranged as a layer the most distant from the substrate, and at least two further layers each comprising an inorganic fluoride compound or an inorganic oxide-containing compound are arranged alternately between the first and the most distant layers.

Abstract: In order to make possible both good laser resistance and good antireflection properties, an optical element, in particular for UV lithography, comprising a substrate and a coating on the substrate having at least four layers, is proposed, wherein a first layer comprising a low refractive index inorganic fluoride compound is arranged on the substrate, a layer comprising an inorganic oxide-containing compound is arranged as a layer the most distant from the substrate, and at least two further layers each comprising an inorganic fluoride compound or an inorganic oxide-containing compound are arranged alternately between the first and the most distant layers.