Patents by Inventor Konstantin LIVANOV

Konstantin LIVANOV has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 11746421
    Abstract: A method for forming a crystalline metal layer on a three-dimensional (3D) substrate is provided. The method includes applying crystal growth ink to a surface of the 3D substrate, wherein the crystal growth ink includes a metal ionic precursor and a structuring liquid; and exposing the 3D substrate to plasma irradiation from plasma in a vacuum chamber to cause the growing of a crystalline metal layer on the 3D substrate, wherein the exposure is based on a set of predefined exposure parameters.
    Type: Grant
    Filed: July 23, 2019
    Date of Patent: September 5, 2023
    Assignee: ORELTECH LTD.
    Inventors: Natalia Zamoshchik, Konstantin Livanov, Yana Sheynin
  • Publication number: 20210309868
    Abstract: A method for growing a transparent conductive metal layer on a substrate is disclosed. The method includes the steps of applying crystal growth ink to a surface of the substrate, wherein the crystal growth ink includes a metal ionic precursor; and exposing the substrate to plasma irradiation to cause the growing of a crystalline metal framework on the substrate, wherein the exposure is based on a set of predefined exposure parameters.
    Type: Application
    Filed: June 7, 2021
    Publication date: October 7, 2021
    Applicant: OrelTech Ltd.
    Inventors: Natalia ZAMOSHCHIK, Konstantin LIVANOV
  • Publication number: 20200017974
    Abstract: A method for forming a crystalline metal layer on a three-dimensional (3D) substrate is provided. The method includes applying crystal growth ink to a surface of the 3D substrate, wherein the crystal growth ink includes a metal ionic precursor and a structuring liquid; and exposing the 3D substrate to plasma irradiation from plasma in a vacuum chamber to cause the growing of a crystalline metal layer on the 3D substrate, wherein the exposure is based on a set of predefined exposure parameters.
    Type: Application
    Filed: July 23, 2019
    Publication date: January 16, 2020
    Applicant: OrelTech Ltd.
    Inventors: Natalia ZAMOSHCHIK, Konstantin LIVANOV, Yana SHEYNIN
  • Publication number: 20190211455
    Abstract: A method for forming a metal active component in a hybrid material is provided. The method includes applying a metal precursor formulation on a substrate; and exposing the metal precursor formulation applied on the substrate to a low-energy plasma, wherein the low-energy plasma is operated according to a set of exposure parameters.
    Type: Application
    Filed: March 11, 2019
    Publication date: July 11, 2019
    Applicant: OrelTech Ltd.
    Inventors: Natalia ZAMOSHCHIK, Konstantin LIVANOV, Leonid KOZLOV, Yana SHEYNIN