Patents by Inventor Kornelis Tijmen Hoekerd
Kornelis Tijmen Hoekerd has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 10613445Abstract: A diagnostic apparatus monitors a lithographic manufacturing system. First measurement data representing local deviations of some characteristic across a substrate is obtained using sensors within a lithographic apparatus, and/or a separate metrology tool. Other inspection tools perform substrate backside inspection to produce second measurement data. A high-resolution backside defect image is processed into a form in which it can be compared with lower resolution information from the first measurement data. Cross-correlation is performed to identify which of the observed defects are correlated spatially with the deviations represented in the first measurement data. A correlation map is used to identify potentially relevant clusters of defects in the more detailed original defect map. The responsible apparatus can be identified by pattern recognition as part of an automated root cause analysis. Alternatively, reticle inspection data may be used as second measurement data.Type: GrantFiled: March 25, 2019Date of Patent: April 7, 2020Assignee: ASML Netherlands B.V.Inventors: Marc Hauptmann, Dylan John David Davies, Paul Janssen, Naoko Tsugama, Richard Joseph Bruls, Kornelis Tijmen Hoekerd, Edwin Johannes Maria Janssen, Petrus Johannes Van Den Oever, Ronald Van Der Wilk, Antonius Hubertus Van Schijndel, Jorge Alberto Vieyra Salas
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Patent number: 10437156Abstract: An apparatus and method for cleaning a contaminated surface of a lithographic apparatus are provided. A liquid confinement structure comprises at least two openings used to supply and extract liquid to a gap below the structure. The direction of flow between the openings can be switched. Liquid may be supplied to the gap radially outward of an opening adapted for dual flow. Supply and extraction lines to respectively supply liquid to and extract liquid from the liquid confinement structure have an inner surface that is resistant to corrosion by an organic liquid. A corrosive cleaning fluid can be used to clean photo resist contamination.Type: GrantFiled: November 29, 2018Date of Patent: October 8, 2019Assignee: ASML Netherlands B.V.Inventors: Takeshi Kaneko, Kornelis Tijmen Hoekerd
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Publication number: 20190219929Abstract: A diagnostic apparatus monitors a lithographic manufacturing system. First measurement data representing local deviations of some characteristic across a substrate is obtained using sensors within a lithographic apparatus, and/or a separate metrology tool. Other inspection tools perform substrate backside inspection to produce second measurement data. A high- resolution backside defect image is processed into a form in which it can be compared with lower resolution information from the first measurement data. Cross-correlation is performed to identify which of the observed defects are correlated spatially with the deviations represented in the first measurement data. A correlation map is used to identify potentially relevant clusters of defects in the more detailed original defect map. The responsible apparatus can be identified by pattern recognition as part of an automated root cause analysis. Alternatively, reticle inspection data may be used as second measurement data.Type: ApplicationFiled: March 25, 2019Publication date: July 18, 2019Applicant: ASML NETHERLANDS B.V.Inventors: Marc Hauptmann, Dylan John David Davies, Paul Janssen, Naoko Tsugama, Richard Joseph Bruls, Kornelis Tijmen Hoekerd, Edwin Johannes Maria Janssen, Petrus Johannes Van Den Oever, Ronald Van Der Wilk, Antonius Hubertus Van Schijndel, Jorge Alberto Vieyra Salas
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Publication number: 20190094707Abstract: An apparatus and method for cleaning a contaminated surface of a lithographic apparatus are provided. A liquid confinement structure comprises at least two openings used to supply and extract liquid to a gap below the structure. The direction of flow between the openings can be switched. Liquid may be supplied to the gap radially outward of an opening adapted for dual flow. Supply and extraction lines to respectively supply liquid to and extract liquid from the liquid confinement structure have an inner surface that is resistant to corrosion by an organic liquid. A corrosive cleaning fluid can be used to clean photo resist contamination.Type: ApplicationFiled: November 29, 2018Publication date: March 28, 2019Applicant: ASML NETHERLANDS B.V.Inventors: Takeshi KANEKO, Kornelis Tijmen Hoekerd
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Patent number: 10241418Abstract: A diagnostic apparatus monitors a lithographic manufacturing system. First measurement data representing local deviations of some characteristic across a substrate is obtained using sensors within a lithographic apparatus, and/or a separate metrology tool. Other inspection tools perform substrate backside inspection to produce second measurement data. A high-resolution backside defect image is processed into a form in which it can be compared with lower resolution information from the first measurement data. Cross-correlation is performed to identify which of the observed defects are correlated spatially with the deviations represented in the first measurement data. A correlation map is used to identify potentially relevant clusters of defects in the more detailed original defect map. The responsible apparatus can be identified by pattern recognition as part of an automated root cause analysis. Alternatively, reticle inspection data may be used as second measurement data.Type: GrantFiled: September 21, 2015Date of Patent: March 26, 2019Assignee: ASML Netherlands B.V.Inventors: Marc Hauptmann, Dylan John David Davies, Paul Janssen, Naoko Tsugama, Richard Joseph Bruls, Kornelis Tijmen Hoekerd, Edwin Johannes Maria Janssen, Petrus Johannes Van Den Oever, Ronald Van Der Wilk, Antonius Hubertus Van Schijndel, Jorge Alberto Vieyra Salas
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Patent number: 10185223Abstract: An apparatus and method for cleaning a contaminated surface of a lithographic apparatus are provided. A liquid confinement structure comprises at least two openings used to supply and extract liquid to a gap below the structure. The direction of flow between the openings can be switched. Liquid may be supplied to the gap radially outward of an opening adapted for dual flow. Supply and extraction lines to respectively supply liquid to and extract liquid from the liquid confinement structure have an inner surface that is resistant to corrosion by an organic liquid. A corrosive cleaning fluid can be used to clean photo resist contamination.Type: GrantFiled: March 26, 2018Date of Patent: January 22, 2019Assignee: ASML Netherlands B.V.Inventors: Takeshi Kaneko, Kornelis Tijmen Hoekerd
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Publication number: 20180210348Abstract: An apparatus and method for cleaning a contaminated surface of a lithographic apparatus are provided. A liquid confinement structure comprises at least two openings used to supply and extract liquid to a gap below the structure. The direction of flow between the openings can be switched. Liquid may be supplied to the gap radially outward of an opening adapted for dual flow. Supply and extraction lines to respectively supply liquid to and extract liquid from the liquid confinement structure have an inner surface that is resistant to corrosion by an organic liquid. A corrosive cleaning fluid can be used to clean photo resist contamination.Type: ApplicationFiled: March 26, 2018Publication date: July 26, 2018Applicant: ASML NETHERLANDS B. V.Inventors: Takeshi KANEKO, Kornelis Tijmen Hoekerd
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Patent number: 9927716Abstract: An apparatus and method for cleaning a contaminated surface of a lithographic apparatus are provided. A liquid confinement structure comprises at least two openings used to supply and extract liquid to a gap below the structure. The direction of flow between the openings can be switched. Liquid may be supplied to the gap radially outward of an opening adapted for dual flow. Supply and extraction lines to respectively supply liquid to and extract liquid from the liquid confinement structure have an inner surface that is resistant to corrosion by an organic liquid. A corrosive cleaning fluid can be used to clean photo resist contamination.Type: GrantFiled: May 8, 2017Date of Patent: March 27, 2018Assignee: ASML NETHERLANDS B.V.Inventors: Takeshi Kaneko, Kornelis Tijmen Hoekerd
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Publication number: 20170363969Abstract: A diagnostic apparatus monitors a lithographic manufacturing system. First measurement data representing local deviations of some characteristic across a substrate is obtained using sensors within a lithographic apparatus, and/or a separate metrology tool. Other inspection tools perform substrate backside inspection to produce second measurement data. A high-resolution backside defect image is processed into a form in which it can be compared with lower resolution information from the first measurement data. Cross-correlation is performed to identify which of the observed defects are correlated spatially with the deviations represented in the first measurement data. A correlation map is used to identify potentially relevant clusters of defects in the more detailed original defect map. The responsible apparatus can be identified by pattern recognition as part of an automated root cause analysis. Alternatively, reticle inspection data may be used as second measurement data.Type: ApplicationFiled: September 21, 2015Publication date: December 21, 2017Applicant: ASML NETHERLANDS B.V.Inventors: Marc HAUPTMANN, Dylan John David DAVIES, Paul JANSSEN, Naoko TSUGAMA, Richard Joseph BRULS, Kornelis Tijmen HOEKERD, Edwin Johannes Maria JANSSEN, Petrus Johannes VAN DEN OEVER, Ronald VAN DER WILK, Antonius Hubertus VAN SCHIJNDEL, Jorge Alberto VIEYRA SALAS
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Publication number: 20170255107Abstract: An apparatus and method for cleaning a contaminated surface of a lithographic apparatus are provided. A liquid confinement structure comprises at least two openings used to supply and extract liquid to a gap below the structure. The direction of flow between the openings can be switched. Liquid may be supplied to the gap radially outward of an opening adapted for dual flow. Supply and extraction lines to respectively supply liquid to and extract liquid from the liquid confinement structure have an inner surface that is resistant to corrosion by an organic liquid. A corrosive cleaning fluid can be used to clean photo resist contamination.Type: ApplicationFiled: May 8, 2017Publication date: September 7, 2017Applicant: ASML NETHERLANDS B.V.Inventors: Takeshi KANEKO, Kornelis Tijmen HOEKERD
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Patent number: 9645508Abstract: An apparatus and method for cleaning a contaminated surface of a lithographic apparatus are provided. A liquid confinement structure comprises at least two openings used to supply and extract liquid to a gap below the structure. The direction of flow between the openings can be switched. Liquid may be supplied to the gap radially outward of an opening adapted for dual flow. Supply and extraction lines to respectively supply liquid to and extract liquid from the liquid confinement structure have an inner surface that is resistant to corrosion by an organic liquid. A corrosive cleaning fluid can be used to clean photo resist contamination.Type: GrantFiled: February 8, 2016Date of Patent: May 9, 2017Assignee: ASML NETHERLANDS B.V.Inventors: Takeshi Kaneko, Kornelis Tijmen Hoekerd
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Publication number: 20160209760Abstract: An apparatus and method for cleaning a contaminated surface of a lithographic apparatus are provided. A liquid confinement structure comprises at least two openings used to supply and extract liquid to a gap below the structure. The direction of flow between the openings can be switched. Liquid may be supplied to the gap radially outward of an opening adapted for dual flow. Supply and extraction lines to respectively supply liquid to and extract liquid from the liquid confinement structure have an inner surface that is resistant to corrosion by an organic liquid. A corrosive cleaning fluid can be used to clean photo resist contamination.Type: ApplicationFiled: February 8, 2016Publication date: July 21, 2016Applicant: ASML NETHERLANDS B.V.Inventors: Takeshi KANEKO, Kornelis Tijmen HOEKERD
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Patent number: 9261796Abstract: An apparatus and method for cleaning a contaminated surface of a lithographic apparatus are provided. A liquid confinement structure comprises at least two openings used to supply and extract liquid to a gap below the structure. The direction of flow between the openings can be switched. Liquid may be supplied to the gap radially outward of an opening adapted for dual flow. Supply and extraction lines to respectively supply liquid to and extract liquid from the liquid confinement structure have an inner surface that is resistant to corrosion by an organic liquid. A corrosive cleaning fluid can be used to clean photo resist contamination.Type: GrantFiled: June 20, 2014Date of Patent: February 16, 2016Assignee: ASML NETHERLANDS B.V.Inventors: Takeshi Kaneko, Kornelis Tijmen Hoekerd
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Patent number: 9013672Abstract: An immersion lithographic projection apparatus having a megasonic transducer configured to clean a surface and a method of using megasonic waves through a liquid to clean a surface of an immersion lithographic projection apparatus are disclosed. A flow, desirably a radial flow, is induced in the liquid.Type: GrantFiled: June 29, 2007Date of Patent: April 21, 2015Assignee: ASML Netherlands B.V.Inventors: Anthonius Martinus Cornelis Petrus De Jong, Hans Jansen, Marco Koert Stavenga, Peter Franciscus Wanten, Bauke Jansen, Johannes Wilhelmus Jacobus Leonardus Cuijpers, Raymond Gerardus Marius Beeren, Kornelis Tijmen Hoekerd
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Patent number: 8947629Abstract: An immersion lithographic projection apparatus having a megasonic transducer configured to clean a surface and a method of using megasonic waves through a liquid to clean a surface of an immersion lithographic projection apparatus are disclosed. A flow, desirably a radial flow, is induced in the liquid.Type: GrantFiled: April 11, 2008Date of Patent: February 3, 2015Assignee: ASML Netherlands B.V.Inventors: Anthonius Martinus Cornelis Petrus De Jong, Hans Jansen, Marco Koert Stavenga, Peter Franciscus Wanten, Bauke Jansen, Johannes Wilhelmus Jacobus Leonardus Cuijpers, Raymond Gerardus Marius Beeren, Kornelis Tijmen Hoekerd
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Publication number: 20140362355Abstract: An apparatus and method for cleaning a contaminated surface of a lithographic apparatus are provided. A liquid confinement structure comprises at least two openings used to supply and extract liquid to a gap below the structure. The direction of flow between the openings can be switched. Liquid may be supplied to the gap radially outward of an opening adapted for dual flow. Supply and extraction lines to respectively supply liquid to and extract liquid from the liquid confinement structure have an inner surface that is resistant to corrosion by an organic liquid. A corrosive cleaning fluid can be used to clean photo resist contamination.Type: ApplicationFiled: June 20, 2014Publication date: December 11, 2014Applicant: ASML NETHERLANDS B.V.Inventors: Takeshi Kaneko, Kornelis Tijmen Hoekerd
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Patent number: 8760616Abstract: An apparatus and method for cleaning a contaminated surface of a lithographic apparatus are provided. A liquid confinement structure comprises at least two openings used to supply and extract liquid to a gap below the structure. The direction of flow between the openings can be switched. Liquid may be supplied to the gap radially outward of an opening adapted for dual flow. Supply and extraction lines to respectively supply liquid to and extract liquid from the liquid confinement structure have an inner surface that is resistant to corrosion by an organic liquid. A corrosive cleaning fluid can be used to clean photo resist contamination.Type: GrantFiled: November 30, 2010Date of Patent: June 24, 2014Assignee: ASML Netherlands B.V.Inventors: Takeshi Kaneko, Kornelis Tijmen Hoekerd
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Patent number: 8432531Abstract: A cleaning liquid supply system is disclosed. The cleaning liquid supply system may supply an emulsified cleaning liquid to clean an immersion lithographic apparatus. A lithographic apparatus is also disclosed.Type: GrantFiled: September 29, 2010Date of Patent: April 30, 2013Assignee: ASML Netherlands B.V.Inventors: Kornelis Tijmen Hoekerd, Roelof Frederik De Graaf, Hans Jansen, Martinus Hendrikus Antonius Leenders, Antonius Johannus Van Der Net, Pieter Jacob Kramer, Anthonie Kuijper, Arjan Hubrecht Josef Anna Martens, Sandra Van Der Graaf, Alexandre Viktorovych Padiy
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Publication number: 20130077065Abstract: A method and apparatus to clean a cover to seal a gap between an object located in a recess of a table and the upper surface of the table outside of the recess. In-line and off-line arrangements are disclosed. Cleaning can be carried out using abrasion, UV radiation or flushing with a cleaning fluid for example.Type: ApplicationFiled: September 20, 2012Publication date: March 28, 2013Inventors: Raymond Wilhelmus Louis LAFARRE, Roelof Frederik De Graaf, Niek Jacobus Johannes Roset, Arjan Hubrecht Josef Anna Martens, Alexander Nikolov Zdravkov, Kornelis Tijmen Hoekerd, Nina Vladimirovna Dziomkina
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Publication number: 20110292359Abstract: A cleaning tool to clean a surface of a component of a lithographic apparatus is disclosed. The cleaning tool includes a sonic transducer, a liquid supply device configured to provide liquid to a reservoir between the surface to be cleaned and the sonic transducer, and a liquid outlet configured to remove liquid provided by the liquid supply device, the cleaning tool constructed and arranged such that, in use, liquid flows into the outlet under the influence of gravity.Type: ApplicationFiled: August 4, 2011Publication date: December 1, 2011Applicant: ASML NETHERLANDS B.V.Inventors: Anthonius Martinus Cornelis Petrus De Jong, Hans Jansen, Marco Koert Stavenga, Peter Franciscus Wanten, Bauke Jansen, Johannes Wilhelmus Jacobus Leonardus Cuijpers, Raymond Gerardus Marius Beeren, Kornelis Tijmen Hoekerd