Patents by Inventor Kosei Ueno

Kosei Ueno has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 11567249
    Abstract: This light absorbing device includes: a light reflecting layer; a dielectric layer disposed on the light reflecting layer; and a plurality of metal nanostructures disposed on the dielectric layer. A portion of each of the plurality of metal nanostructures is buried in the dielectric layer and another portion thereof is exposed to the outside.
    Type: Grant
    Filed: December 25, 2018
    Date of Patent: January 31, 2023
    Assignee: National University Corporation Hokkaido University
    Inventors: Hiroaki Misawa, Xu Shi, Kosei Ueno, Tomoya Oshikiri, Quan Sun, Keiji Sasaki
  • Publication number: 20210294009
    Abstract: This light absorbing device includes: a light reflecting layer; a dielectric layer disposed on the light reflecting layer; and a plurality of metal nanostructures disposed on the dielectric layer. A portion of each of the plurality of metal nanostructures is buried in the dielectric layer and another portion thereof is exposed to the outside.
    Type: Application
    Filed: December 25, 2018
    Publication date: September 23, 2021
    Applicant: National University Corporation Hokkaido University
    Inventors: Hiroaki MISAWA, Xu SHI, Kosei UENO, Tomoya OSHIKIRI, Quan SUN, Keiji SASAKI
  • Patent number: 10983052
    Abstract: An electricity measuring type surface plasmon resonance sensor including: a plasmon polariton intensifying sensor chip in which a prism and a sensor chip including a transparent electrode, an n-type transparent semiconductor film, and a plasmon resonance film electrode arranged in this order are arranged in an order of the prism, the transparent electrode, the n-type transparent semiconductor film, and the plasmon resonance film electrode; and an electric measuring apparatus which directly measures a current or voltage from the transparent electrode and the plasmon resonance film electrode.
    Type: Grant
    Filed: August 9, 2018
    Date of Patent: April 20, 2021
    Assignees: IMRA JAPAN KABUSHIKIKAISHA, NATIONAL UNIVERSITY CORPORATION HOKKAIDO UNIVERSITY
    Inventors: Hironori Suzuki, Giles Allison, Masanori Sasaki, Koki Hayashi, Hiroaki Misawa, Kosei Ueno
  • Publication number: 20200182789
    Abstract: An electricity measuring type surface plasmon resonance sensor including: a plasmon polariton intensifying sensor chip in which a prism and a sensor chip including a transparent electrode, an n-type transparent semiconductor film, and a plasmon resonance film electrode arranged in this order are arranged in an order of the prism, the transparent electrode, the n-type transparent semiconductor film, and the plasmon resonance film electrode; and an electric measuring apparatus which directly measures a current or voltage from the transparent electrode and the plasmon resonance film electrode.
    Type: Application
    Filed: August 9, 2018
    Publication date: June 11, 2020
    Inventors: Hironori SUZUKI, Giles ALLISON, Masanori SASAKI, Koki HAYASHI, Hiroaki MISAWA, Kosei UENO
  • Patent number: 9240286
    Abstract: The present invention has an object to provide a photoelectric conversion device which can be manufactured through a simple manufacturing process, achieve photoelectric conversion over a wide range of wavelength regions, and attain high photoelectric conversion efficiency even in the infrared wavelength region, a photodetection device, and a photodetection method.
    Type: Grant
    Filed: September 2, 2010
    Date of Patent: January 19, 2016
    Assignee: NATIONAL UNIVERSITY CORPORATION HOKKAIDO UNIVERSITY
    Inventors: Hiroaki Misawa, Yoshiaki Nishijima, Kosei Ueno, Kei Murakoshi
  • Patent number: 8895235
    Abstract: Disclosed is a process for producing a photoresist pattern, comprising the steps of: preparing a photomask that comprises a metal nano structure having a metal film arranged thereon and can generate a plasmon resonance, on a mask substrate; preparing a photoresist film that is formed on the surface of the resist substrate and is sensible to light having a wavelength (X); bringing the photomask into contact with the photoresist film; and exposing the photoresist film to light having a wavelength (Y) that is longer than the wavelength (X) and is shorter than the peak wavelength of a plasmon resonance band of the metal nano structure, thereby transferring a pattern of the metal film in the photomask onto the photoresist film.
    Type: Grant
    Filed: March 1, 2011
    Date of Patent: November 25, 2014
    Assignee: National University Corporation Hokkaido University
    Inventors: Kosei Ueno, Hiroaki Misawa
  • Publication number: 20130017499
    Abstract: Disclosed is a process for producing a photoresist pattern, comprising the steps of: preparing a photomask that comprises a metal nano structure having a metal film arranged thereon and can generate a plasmon resonance, on a mask substrate; preparing a photoresist film that is formed on the surface of the resist substrate and is sensible to light having a wavelength (X); bringing the photomask into contact with the photoresist film; and exposing the photoresist film to light having a wavelength (Y) that is longer than the wavelength (X) and is shorter than the peak wavelength of a plasmon resonance band of the metal nano structure, thereby transferring a pattern of the metal film in the photomask onto the photoresist film.
    Type: Application
    Filed: March 1, 2011
    Publication date: January 17, 2013
    Applicant: NATIONAL UNIVERSITY CORPORATION HOKKAIDO UNIVERSITY
    Inventors: Kosei Ueno, Hiroaki Misawa
  • Publication number: 20120325301
    Abstract: The present invention has an object to provide a photoelectric conversion device which can be manufactured through a simple manufacturing process, achieve photoelectric conversion over a wide range of wavelength regions, and attain high photoelectric conversion efficiency even in the infrared wavelength region, a photodetection device, and a photodetection method.
    Type: Application
    Filed: September 2, 2010
    Publication date: December 27, 2012
    Inventors: Hiroaki Misawa, Yoshiaki Nishijima, Kosei Ueno, Kei Murakoshi
  • Publication number: 20120204783
    Abstract: A container for crystallization of a biopolymer of the invention is provided that includes a structure wherein two or more noble metals and/or noble metal-coated bodies are arranged at an interval of 1 to 1,000 nm. There are also provided a crystallization apparatus of a biopolymer, comprising the container for crystallization of a biopolymer, a method for producing a biopolymer crystal, comprising the steps of preparing the container for crystallization of a biopolymer, and making the structure contact with a biopolymer solution, and a substrate for crystallization of a biopolymer, having a structure wherein two or more noble metals and/or noble metal-coated bodies are arranged at an interval of 1 to 1,000 nm.
    Type: Application
    Filed: September 1, 2010
    Publication date: August 16, 2012
    Applicants: NATIONAL UNIVERSITY CORPORATION HOKKAIDO UNIVERSITY, NATIONAL UNIVERSITY CORPORATION GUNMA UNIVERSITY
    Inventors: Tetsuo Okutsu, Kosei Ueno, Hiroaki Misawa
  • Patent number: 8236421
    Abstract: In a metallic structure including a metallic nano-chain with plasmon resonance absorption, a metallic nanoparticle forming the metallic nano-chain is formed in a circular, triangle, or rhomboid shape. The wavelength selectivity can be increased also by forming a closed region by mutually linking all of metallic nanoparticles that are mutually linked with bottlenecks. In a photodetector, a photodetection unit including a current detection probe, a nano-chain unit, and a current detection probe is arranged on a substrate. The nano-chain unit is a metallic structure with plasmon resonance absorption, where metallic nanoparticles are mutually linked with bottlenecks. Each current detection probe has a corner whose tip is formed with a predetermined angle, and this corner is arranged to face the tip of the nano-chain unit, i.e., a corner of the metallic nanoparticle. Photodetection with high wavelength selectivity is performed based on a change in the initial voltage of the current-voltage characteristic.
    Type: Grant
    Filed: July 8, 2011
    Date of Patent: August 7, 2012
    Assignees: Rohm Co., Ltd., National University Corporation Hokkaido University
    Inventors: Kosei Ueno, Hiroaki Misawa, Dai Ohnishi, Takui Sakaguchi, Yoichi Mugino
  • Patent number: 8088484
    Abstract: In a metallic structure including a metallic nano-chain with plasmon resonance absorption, a metallic nanoparticle forming the metallic nano-chain is formed in a circular, triangle, or rhomboid shape. The wavelength selectivity can be increased also by forming a closed region by mutually linking all of metallic nanoparticles that are mutually linked with bottlenecks. In a photodetector, a photodetection unit including a current detection probe, a nano-chain unit, and a current detection probe is arranged on a substrate. The nano-chain unit is a metallic structure with plasmon resonance absorption, where metallic nanoparticles are mutually linked with bottlenecks. Each current detection probe has a corner whose tip is formed with a predetermined angle, and this corner is arranged to face the tip of the nano-chain unit, i.e., a corner of the metallic nanoparticle. Photodetection with high wavelength selectivity is performed based on a change in the initial voltage of the current-voltage characteristic.
    Type: Grant
    Filed: September 2, 2008
    Date of Patent: January 3, 2012
    Assignees: Rohm Co. Ltd., National University Corporation Hokkaido University
    Inventors: Kosei Ueno, Hiroaki Misawa, Dai Ohnishi, Takui Sakaguchi, Yoichi Mugino
  • Publication number: 20110266414
    Abstract: In a metallic structure including a metallic nano-chain with plasmon resonance absorption, a metallic nanoparticle forming the metallic nano-chain is formed in a circular, triangle, or rhomboid shape. The wavelength selectivity can be increased also by forming a closed region by mutually linking all of metallic nanoparticles that are mutually linked with bottlenecks. In a photodetector, a photodetection unit including a current detection probe, a nano-chain unit, and a current detection probe is arranged on a substrate. The nano-chain unit is a metallic structure with plasmon resonance absorption, where metallic nanoparticles are mutually linked with bottlenecks. Each current detection probe has a corner whose tip is formed with a predetermined angle, and this corner is arranged to face the tip of the nano-chain unit, i.e., a corner of the metallic nanoparticle. Photodetection with high wavelength selectivity is performed based on a change in the initial voltage of the current-voltage characteristic.
    Type: Application
    Filed: July 8, 2011
    Publication date: November 3, 2011
    Applicants: National University Corporation Hokkaido University, ROHM CO., LTD.
    Inventors: Kosei UENO, Hiroaki Misawa, Dai Ohnishi, Takui Sakaguchi, Yoichi Mugino
  • Patent number: 8047713
    Abstract: Provided is a plasmon resonance detector that can detect temperature change in optical devices, in which the metal structure having plasmon resonance absorption is used for the optical devices. A diode formed of a conductive substrate, an n-type semiconductor layer, an i-type semiconductor layer, a p-type semiconductor layer, an n electrode (negative electrode), a p electrode (positive electrode), an insulating film, or the like is used as a semiconductor device whose resistance value changes in accordance with temperature change. A nanochain formed by connecting a plurality of metal nanoparticles is disposed on this diode. When the nanochain is irradiated with light, the nanochain generates heat. The heat generated in the nanochain is conducted to the diode. The resistance value of the diode changes in accordance with temperature change, and thus this change is read, a temperature or an amount of heat generation of the nanochain is measured, and existence and strength of the plasmon resonance are detected.
    Type: Grant
    Filed: December 22, 2008
    Date of Patent: November 1, 2011
    Assignee: Rohm Co., Ltd.
    Inventors: Kosei Ueno, Hiroaki Misawa, Dai Ohnishi, Takui Sakaguchi, Yoichi Mugino
  • Patent number: 7824761
    Abstract: A metal structure capable of significantly increasing wavelength selectivity and polarization electivity for an incident light, and a production method thereof. First, a solid transparent substrate (glass substrate) (10) is cleaned and dried (S100). The surface of the substrate (10) is spin-coated with a positive electron lithography-use resist solution and then baked, and the resist solution is removed to form a resist thin film (20) on the substrate (10) (S200). A specified pattern is drawn on the resist thin film (20) with an electron beam, and the film is developed, rinsed and dried (S300). Then, metals such as chromium and then gold are formed sequentially on the substrate (10) by sputtering (S400). And, excessive resist materials are removed from the surface of the substrate (10) (S500), whereby metal nano-rod array (40) is completed.
    Type: Grant
    Filed: February 16, 2006
    Date of Patent: November 2, 2010
    Assignee: National University Corporation Hokkaido University
    Inventors: Hiroaki Misawa, Kosei Ueno, Yasuyuki Tsuboi, Keiji Sasaki
  • Patent number: 7709810
    Abstract: There are provided a sensing device, a sensing apparatus, and a sensing method capable of realizing effective multi-photon absorption and local plasmon enhancement function. The sensing device can realize a high multi-photon excitation efficiency and selectivity by accurately controlling the material, shape, size, interval, and direction of metal particles arranged on a substrate. By employing the sensing device in various sensing apparatuses such as a fluorescent sensing apparatus, it is possible to realize sensing of detection object material with a high sensibility.
    Type: Grant
    Filed: March 17, 2006
    Date of Patent: May 4, 2010
    Assignee: National University Corporation Hokkaido University
    Inventors: Hiroaki Misawa, Kosei Ueno, Yasuyuki Tsuboi, Keiji Sasaki
  • Publication number: 20100067016
    Abstract: Provided is a plasmon resonance detector that can detect temperature change in optical devices, in which the metal structure having plasmon resonance absorption is used for the optical devices. A diode formed of a conductive substrate, an n-type semiconductor layer, an i-type semiconductor layer, a p-type semiconductor layer, an n electrode (negative electrode), a p electrode (positive electrode), an insulating film, or the like is used as a semiconductor device whose resistance value changes in accordance with temperature change. A nanochain formed by connecting a plurality of metal nanoparticles is disposed on this diode. When the nanochain is irradiated with light, the nanochain generates heat. The heat generated in the nanochain is conducted to the diode. The resistance value of the diode changes in accordance with temperature change, and thus this change is read, a temperature or an amount of heat generation of the nanochain is measured, and existence and strength of the plasmon resonance are detected.
    Type: Application
    Filed: December 22, 2008
    Publication date: March 18, 2010
    Applicants: ROHM CO., LTD., National University Corporation Hokkaido University
    Inventors: Kosei UENO, Hiroaki MISAWA, Dai OHNISHI, Takui SAKAGUCHI, Yoichi MUGINO
  • Publication number: 20090091762
    Abstract: In a metallic structure including a metallic nano-chain with plasmon resonance absorption, a metallic nanoparticle forming the metallic nano-chain is formed in a circular, triangle, or rhomboid shape. The wavelength selectivity can be increased also by forming a closed region by mutually linking all of metallic nanoparticles that are mutually linked with bottlenecks. In a photodetector, a photodetection unit including a current detection probe, a nano-chain unit, and a current detection probe is arranged on a substrate. The nano-chain unit is a metallic structure with plasmon resonance absorption, where metallic nanoparticles are mutually linked with bottlenecks. Each current detection probe has a corner whose tip is formed with a predetermined angle, and this corner is arranged to face the tip of the nano-chain unit, i.e., a corner of the metallic nanoparticle. Photodetection with high wavelength selectivity is performed based on a change in the initial voltage of the current-voltage characteristic.
    Type: Application
    Filed: September 2, 2008
    Publication date: April 9, 2009
    Applicants: ROHM CO., LTD., National University Corporation Hokkaido University
    Inventors: Kosei Ueno, Hiroaki Misawa, Dai Ohnishi, Takui Sakaguchi, Yoichi Mugino
  • Publication number: 20090032735
    Abstract: There are provided a sensing device, a sensing apparatus, and a sensing method capable of realizing effective multi-photon absorption and local plasmon enhancement function. The sensing device can realize a high multi-photon excitation efficiency and selectivity by accurately controlling the material, shape, size, interval, and direction of metal particles arranged on a substrate. By employing the sensing device in various sensing apparatuses such as a fluorescent sensing apparatus, it is possible to realize sensing of detection object material with a high sensibility.
    Type: Application
    Filed: March 17, 2006
    Publication date: February 5, 2009
    Inventors: Hiroaki Misawa, Kosei Ueno, Yasuyuki Tsuboi, Keiji Sasaki
  • Publication number: 20080160287
    Abstract: A metal structure capable of significantly increasing wavelength selectivity and polarization electivity for an incident light, and a production method thereof. First, a solid transparent substrate (glass substrate) (10) is cleaned and dried (S100). The surface of the substrate (10) is spin-coated with a positive electron lithography-use resist solution and then baked, and the resist solution is removed to form a resist thin film (20) on the substrate (10) (S200). A specified pattern is drawn on the resist thin film (20) with an electron beam, and the film is developed, rinsed and dried (S300). Then, metals such as chromium and then gold are formed sequentially on the substrate (10) by sputtering (S400). And, excessive resist materials are removed from the surface of the substrate (10) (S500), whereby metal nano-rod array (40) is completed.
    Type: Application
    Filed: February 16, 2006
    Publication date: July 3, 2008
    Inventors: Hiroaki Misawa, Kosei Ueno, Yasuyuki Tsuboi, Keiji Sasaki