Patents by Inventor Koshi Harada

Koshi Harada has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20250344960
    Abstract: The present invention is a method of adjusting a pulse wave measurement device attachable to a user's wrist. The pulse wave measurement device includes: a pulse wave sensor including a strain gauge and configured to acquire pulse wave by measuring radial artery pulse; pressing part for pressing the pulse wave sensor to the radial artery; and output part for outputting a measured value of the pulse wave sensor as digital signal. The adjusting method includes: acquiring pulse wave using pulse wave sensor when the pulse wave measurement device is attached to user's wrist, and outputting measured value thus acquired, as a digital signal; comparing voltage level of the digital signal with a range previously set with respect to maximum voltage level of output part; and adjusting or instructing pressing force on pulse wave sensor in a case where voltage level of the digital signal is outside the previously set range.
    Type: Application
    Filed: June 30, 2023
    Publication date: November 13, 2025
    Inventors: Koshi HARADA, Hiroyuki OKA
  • Publication number: 20040071889
    Abstract: On producing an antireflection-coated substrate which includes a transparent substrate (1) and an antireflection film formed on the transparent substrate, the antireflection film is made of a multilayer film having a medium refractive index layer (2), a high refractive index layer (3), and a low refractive index layer (4) successively formed on the transparent substrate in this order. The medium refractive index layer is made of a material containing silicon, tin, and oxygen. The high refractive index layer is made of a material containing oxygen and at least one element selected from a group consisting of titanium, niobium, tantalum, and hafnium. The low refractive index layer is made of a material containing silicon and oxygen. The antireflection film is formed by successively depositing these layers by an in-line sputtering apparatus.
    Type: Application
    Filed: August 6, 2003
    Publication date: April 15, 2004
    Applicant: HOYA CORPORATION
    Inventors: Tsutomu Asakawa, Kenji Matsumoto, Koshi Harada, Kyoji Nakayama