Abstract: A resist composition that generates acid upon exposure and exhibits changed solubility in a developing solution under action of acid, which contains a resin component (A1) exhibiting changed solubility in a developing solution under action of acid, the resin component (A1) has a constitutional unit (a01) derived from a compound represented by General Formula (a0-1), W01 represents a polymerizable group-containing group, Ya01 represents a single bond or a divalent linking group, Ra01 represents a cyclic acid dissociable group, q represents an integer in a range of 0 to 3, and n represents an integer of 1 or more, provided that n?q×2+4 is satisfied

Abstract: A resist composition including a compound represented by formula (bd1), a total amount of the acid-generator component and the basic component being 20 to 70 parts by weight, relative to 100 parts by weight of the base material component. In the formula, Rx1 to Rx4 represents a hydrogen atom or a hydrocarbon group, or two or more of Rx1 to Rx4 may be mutually bonded to form a ring structure; Ry1 and Ry2 represents a hydrogen atom or a hydrocarbon group, or Ry1 and Ry2 may be mutually bonded to form a ring structure; Rz1 to Rz4 represents a hydrogen atom or a hydrocarbon group, or two or more of Rz1 to Rz4 may be mutually bonded to form a ring structure; provided that at least one of Rx1 to Rx4, Ry1, Ry2 and Rz1 to Rz4 has an anionic group; and Mm+ represents an m-valent organic cation).

Abstract: A resist composition including a base component and an acid generator component, the base component including a resin component having a structural unit (a0) represented by general formula (a0) shown below, and the acid generator component containing at least one of a compound (b-1), a compound (b-2) and a compound (b-3) represented by general formula (b-3) shown below in which Wa represents a divalent aromatic hydrocarbon group; Ra00 represents an acid dissociable group; R101, R104 and R106 each independently represents a hydrocarbon group containing an aromatic ring; R105, R107 and R108 each independently represents a cyclic group, a chain alkyl group which may have a substituent or a chain alkenyl group; R102 represents a fluorine atom or a fluorinated alkyl group of 1 to 5 carbon atoms and M?m+ represents an m-valent onium cation.

Abstract: A resist composition containing a resin component (A1) having a constitutional unit (a01) derived from a compound represented by General Formula (a0-1) and containing a compound (D0) represented by General Formula (d0), W01 represents a polymerizable group-containing group, Ya01 represents a single bond or the like, Rx01 represents an acid dissociable group, Mm+ represents an m-valent organic cation, and Rd0 represents a substituent

Abstract: A resist composition that generates acid upon exposure and exhibits changed solubility in a developing solution under action of acid, which contains a resin component (A1) exhibiting changed solubility in a developing solution under action of acid, the resin component (A1) has a constitutional unit (a01) derived from a compound represented by General Formula (a0-1), W01 represents a polymerizable group-containing group, Ya01 represents a single bond or a divalent linking group, Ra01 represents a cyclic acid dissociable group, q represents an integer in a range of 0 to 3, and n represents an integer of 1 or more, provided that n?q×2+4 is satisfied

Abstract: A resist composition containing a resin component (A1) having a constitutional unit (a01) derived from a compound represented by General Formulae (a0-1) and one or more compounds selected from the group consisting of a compound (B01) represented by General Formula (b0-1) and a compound (B02) represented by General Formula (b0-2), W01 represents a polymerizable group-containing group, Ya01 represents a single bond or the like, Rx01 represents an acid dissociable group, Rb1 and Rb4 represents an aryl group having a fluorine atom, Rb2, Rb3, and Rb5 represents an aryl group or the like which may have a substituent, and X01? and X02? represents a counter anion

Abstract: A resist composition including a resin component which exhibits changed solubility in a developing solution under action of acid, the resin component including a structural unit represented by general formula (a0) shown below in which Vax0 represents a single bond or a divalent linking group; Wa represents a divalent aromatic hydrocarbon group which may have a substituent; Ya0 represents a carbon atom; Xa0 represents a group which forms a cyclic hydrocarbon group together with Ya0; Ra00 represents a hydrocarbon group which may have a substituent; provided that at least one of Xa0 and Ra00 has a carbon atom constituting a carbon-carbon unsaturated bond at an ?-position of Ya0.

Abstract: A resist composition containing a resin component (A1) exhibiting changed solubility in a developing solution under action of acid, the resin component (A1) having a constitutional unit (a01) derived from a compound represented by General Formula (a01-1). In the formula, W01 represents a polymerizable group-containing group, Ct represents a tertiary carbon atom, and Xt represents a group that forms a monocyclic or polycyclic alicyclic group together with Ct, where the alicyclic group has an oxygen atom or a sulfur atom in the ring structure, Ra1 to Ra3 each independently represents a hydrocarbon group having 1 to 10 carbon atoms which may have a substituent.

Abstract: A resist composition including a compound represented by formula (bd1), a total amount of the acid-generator component and the basic component being 20 to 70 parts by weight, relative to 100 parts by weight of the base material component. In the formula, Rx1 to Rx4 represents a hydrogen atom or a hydrocarbon group, or two or more of Rx1 to Rx4 may be mutually bonded to form a ring structure; Ry1 and Ry2 represents a hydrogen atom or a hydrocarbon group, or Ry1 and Ry2 may be mutually bonded to form a ring structure; Rz1 to Rz4 represents a hydrogen atom or a hydrocarbon group, or two or more of Rz1 to Rz4 may be mutually bonded to form a ring structure; provided that at least one of Rx1 to Rx4, Ry1, Ry2 and Rz1 to Rz4 has an anionic group; and Mm+ represents an m-valent organic cation).

Abstract: A resist composition which generates acid upon exposure and exhibits changed solubility in a developing solution under action of acid, a total amount of a basic component including a compound represented by general formula (d0) and an acid-generator component is 25 to 60 parts by weight relative to 100 parts by weight of a base material component. In formula (d0), Rd0 represents a monovalent organic group; Xd0 represents —O—, —C(?O)—, —O—C(?O)—, —C(?O)—O—, —S— or —SO2—; Yd0 represents a single bond or a divalent hydrocarbon group which may have a substituent; Mm+ represents a m-valent organic cation; and m represents an integer of 1 or more Rd0-Xd0-Yd0-COO?(Mm?)1/m??(d0).

Abstract: A resist composition including a resin component having a structural unit (a0) represented by general formula (a0) in which Va0 represents a linear or branched alkylene group, a linear or branched fluorinated alkylene group, —Y01—O—C(?O)—Y02— or —Y01—C(?O)—O—Y02—; Y01 and Y02 each independently represents a linear or branched alkylene group; Ya0 represents a carbon atom; Xa0 represents a group which forms a monocyclic hydrocarbon group together with Ya0, provided that part or all of the hydrogen atoms of the cyclic hydrocarbon group may be substituted with a substituent; Ra00 represents a hydrocarbon group which may have a substituent; provided that at least one of Xa0 and Ra00 has a carbon-carbon unsaturated bond at an ?-position of Ya0.

Abstract: A resist composition including a resin component having a structural unit derived from a compound represented by formula (a0-1), in which W represents a polymerizable group-containing group; Ra01 represents an alkyl group or an aromatic heterocyclic group containing an oxygen atom or a sulfur atom; in the case where Ra01 is an aromatic heterocyclic group containing an oxygen atom or a sulfur atom, Ra02 is a group which forms an aliphatic cyclic group containing an electron-withdrawing group, together with the tertiary carbon atom (*C) to which Ra01 is bonded; and when Ra01 is an alkyl group, Ra02 is a group in which an aliphatic cyclic group containing an electron-withdrawing group forms a condensed ring together with an aromatic heterocyclic group containing an oxygen atom or a sulfur atom.

Abstract: A resist composition including a resin component which exhibits changed solubility in a developing solution under action of acid, the resin component including a structural unit represented by general formula (a0) shown below in which Vax0 represents a single bond or a divalent linking group; Wa represents a divalent aromatic hydrocarbon group which may have a substituent; Ya0 represents a carbon atom; Xa0 represents a group which forms a cyclic hydrocarbon group together with Ya0; Ra00 represents a hydrocarbon group which may have a substituent; provided that at least one of Xa0 and Ra00 has a carbon atom constituting a carbon-carbon unsaturated bond at an ?-position of Ya0.

Abstract: A resist composition including a base component and an acid generator component, the base component including a resin component having a structural unit (a0) represented by general formula (a0) shown below, and the acid generator component containing at least one of a compound (b-1), a compound (b-2) and a compound (b-3) represented by general formula (b-3) shown below in which Wa represents a divalent aromatic hydrocarbon group; Ra00 represents an acid dissociable group; R101, R104 and R106 each independently represents a hydrocarbon group containing an aromatic ring; R105, R107 and R108 each independently represents a cyclic group, a chain alkyl group which may have a substituent or a chain alkenyl group; R102 represents a fluorine atom or a fluorinated alkyl group of 1 to 5 carbon atoms and M?m+ represents an m-valent onium cation.

Abstract: A resist composition including a compound represented by formula (bd1), a total amount of the acid-generator component and the basic component being 20 to 70 parts by weight, relative to 100 parts by weight of the base material component. In the formula, Rx1 to Rx4 represents a hydrogen atom or a hydrocarbon group, or two or more of Rx1 to Rx4 may be mutually bonded to form a ring structure; Ry1 and Ry2 represents a hydrogen atom or a hydrocarbon group, or Ry1 and Ry2 may be mutually bonded to form a ring structure; Rz1 to Rz4 represents a hydrogen atom or a hydrocarbon group, or two or more of Rz1 to Rz4 may be mutually bonded to form a ring structure; provided that at least one of Rx1 to Rx4, Ry1, Ry2 and Rz1 to Rz4 has an anionic group; and Mm+ represents an m-valent organic cation).

Abstract: A method for preparing a polymer compound including copolymerizing a monomer (m0-1) and a monomer (m0-2) to obtain a first polymer compound and causing the first polymer compound and an acid component to react with each other to obtain a second polymer compound. In the formulae, R1 and R2 are each a hydrogen atom, an alkyl group having 1 to 5 carbon atoms and a halogenated alkyl group having 1 to 5 carbon atoms, Va01 is a divalent hydrocarbon group which may have an ether bond, na01 is an integer of 0 to 2, Ra10 is a tertiary alkyl ester-type acid dissociable group, Va02 is a divalent linking group containing a heteroatom, or a single bond, Ra07 is a monovalent organic group, na021 is an integer of 0 to 3, Ra20 is an acid dissociable group, and na022 is an integer of 1 to 3.

Abstract: A resist composition which generates an acid upon exposure and whose solubility on a developing solution changes under the action of the acid, including a polymer compound having units represented by formulas (a0-1), (a0-2), and (a0-3) in an amount of 0 to 10 mol %. In the formulas, R is a hydrogen atom, an alkyl group having 1 to 5 carbon atoms, or a halogenated alkyl group having 1 to 5 carbon atoms, Va01 and Va03 are a divalent hydrocarbon group, na01 and na03 each are an integer of 0 to 2, Ra0? is a specific acid dissociable group, Va02 is a divalent linking group containing a hetero atom or a single bond, Ra07 is a monovalent organic group, na021 is an integer of 0 to 3, and na022 is an integer of 1 to 3.

Abstract: A resist composition including a resin component having a structural unit derived from a compound represented by formula (a0-1), in which W represents a polymerizable group-containing group; Ra01 represents an alkyl group or an aromatic heterocyclic group containing an oxygen atom or a sulfur atom; in the case where Ra01 is an aromatic heterocyclic group containing an oxygen atom or a sulfur atom, Ra02 is a group which forms an aliphatic cyclic group containing an electron-withdrawing group, together with the tertiary carbon atom (*C) to which Ra01 is bonded; and when Ra01 is an alkyl group, Ra02 is a group in which an aliphatic cyclic group containing an electron-withdrawing group forms a condensed ring together with an aromatic heterocyclic group containing an oxygen atom or a sulfur atom.

Abstract: A method for preparing a polymer compound including copolymerizing a monomer (m0-1) and a monomer (m0-2) to obtain a first polymer compound and causing the first polymer compound and an acid component to react with each other to obtain a second polymer compound. In the formulae, R1 and R2 are each a hydrogen atom, an alkyl group having 1 to 5 carbon atoms and a halogenated alkyl group having 1 to 5 carbon atoms, Va01 is a divalent hydrocarbon group which may have an ether bond, na01 is an integer of 0 to 2, Ra10 is a tertiary alkyl ester-type acid dissociable group, Va02 is a divalent linking group containing a heteroatom, or a single bond, Ra07 is a monovalent organic group, na021 is an integer of 0 to 3, Ra20 is an acid dissociable group, and na022 is an integer of 1 to 3.

Abstract: A resist composition which generates an acid upon exposure and whose solubility on a developing solution changes under the action of the acid, including a polymer compound having units represented by formulas (a0-1), (a0-2), and (a0-3) in an amount of 0 to 10 mol %. In the formulas, R is a hydrogen atom, an alkyl group having 1 to 5 carbon atoms, or a halogenated alkyl group having 1 to 5 carbon atoms, Va01 and Va03 are a divalent hydrocarbon group, na01 and na03 each are an integer of 0 to 2, Ra0? is a specific acid dissociable group, Va02 is a divalent linking group containing a hetero atom or a single bond, Ra07 is a monovalent organic group, na021 is an integer of 0 to 3, and na022 is an integer of 1 to 3.