Abstract: Provided is a lithography apparatus capable of detecting the abnormal holding of an original in a shorter period of time. The lithography apparatus is configured to form a pattern on a substrate through use of the original, and includes: a holding unit configured to hold the original on which a first mark is formed; a measuring unit configured to pick up an image of the first mark; and a control unit configured to: cause the measuring unit to obtain the image of the first mark on the original held by the holding unit with a focus position of the measuring unit being adjusted to a reference position; and determine that the original is being abnormally held by the holding unit when a change in a first contrast, which is a contrast of the image of the first mark with respect to a reference contrast, falls out of an allowable range.

Abstract: The present invention provides a calculation method of calculating optical characteristics of a projection optical system that change due to heat during exposure of a substrate, the method comprising measuring image point positions at different measurement times for a plurality of measurement points on an object plane of the projection optical system; and calculating the optical characteristics based on the image point position measured in the measuring for each of the plurality of measurement points and measurement time for each of the plurality of measurement points.

Abstract: Provided is a lithography apparatus capable of detecting the abnormal holding of an original in a shorter period of time. The lithography apparatus is configured to form a pattern on a substrate through use of the original, and includes: a holding unit configured to hold the original on which a first mark is formed; a measuring unit configured to pick up an image of the first mark; and a control unit configured to: cause the measuring unit to obtain the image of the first mark on the original held by the holding unit with a focus position of the measuring unit being adjusted to a reference position; and determine that the original is being abnormally held by the holding unit when a change in a first contrast, which is a contrast of the image of the first mark with respect to a reference contrast, falls out of an allowable range.

Abstract: The present invention provides a calculation method of calculating optical characteristics of a projection optical system that change due to heat during exposure of a substrate, the method comprising measuring image point positions at different measurement times for a plurality of measurement points on an object plane of the projection optical system; and calculating the optical characteristics based on the image point position measured in the measuring for each of the plurality of measurement points and measurement time for each of the plurality of measurement points.

Abstract: The present invention provides a determination method of determining a first prediction formula for predicting a fluctuation in optical characteristics of a projection optical system while a substrate is exposed on a first exposure condition, the method comprising obtaining a correlation coefficient between the first exposure condition and a second exposure condition corresponding to a second prediction formula for predicting the fluctuation in the optical characteristics, determining, when the correlation coefficient falls within an allowable range, the first prediction formula based on the second prediction formula without actually measuring the fluctuation in the optical characteristics, and determining, when the correlation coefficient falls outside the allowable range, the first prediction formula based on a result of actually measuring the fluctuation in the optical characteristics.

Abstract: The present invention provides a determination method of determining a first prediction formula for predicting a fluctuation in optical characteristics of a projection optical system while a substrate is exposed on a first exposure condition, the method comprising obtaining a correlation coefficient between the first exposure condition and a second exposure condition corresponding to a second prediction formula for predicting the fluctuation in the optical characteristics, determining, when the correlation coefficient falls within an allowable range, the first prediction formula based on the second prediction formula without actually measuring the fluctuation in the optical characteristics, and determining, when the correlation coefficient falls outside the allowable range, the first prediction formula based on a result of actually measuring the fluctuation in the optical characteristics.