Abstract: Provided is a method for producing metal nanoparticles, which enables metal nanoparticles to be more conveniently produced. The method for producing metal nanoparticles includes spraying and drying a mixture to form metal nanoparticles, the mixture containing a metal salt and at least one solvent selected from alcohols having 1 or more and 5 or less carbon atoms.

Abstract: A photoelectric-surface electron source includes: a glass substrate that receives laser light from a substrate light-receiving surface including microlenses and that focuses the laser light toward a substrate main surface located on the opposite side from the substrate light-receiving surface; a photoelectric surface that is provided to the substrate main surface, and that receives the focused laser light and emits photoelectrons; and an extraction electrode that is fixed to the substrate main surface and that extracts the photoelectrons from the photoelectric surface. The extraction electrode is disposed away from the photoelectric surface along the normal direction of the substrate main surface and has: an electrode part in which electrode holes for allowing the photoelectrons to pass therethrough are provided; and a frame part that is fixed to a region surrounding the photoelectric surface in the substrate main surface.

Abstract: A photoelectric surface electron source includes a glass substrate configured to receive laser light incident from a substrate back surface to emit the laser light from a substrate main surface, a photoelectric surface provided on the substrate main surface and configured to receive the laser light and emit a photoelectron, a lens array disposed on the substrate back surface and including a plurality of microlenses for condensing the laser light toward the photoelectric surface, and a light shielding portion provided on the glass substrate. The light shielding portion has a back surface-side light shielding layer provided on a back surface-side light shielding surface interposed between the plurality of microlenses on the substrate back surface, and a main surface-side light shielding layer provided on a main surface-side light shielding surface.

Abstract: A multi-electron beam writing apparatus includes a light source array to include plural light sources and generate plural first lights, a multi-lens array to include plural first lenses, and to divide the plural first lights into plural second lights by that each of the plural first lights illuminates a corresponding lens set of plural lens sets each composed of plural second lenses being a portion of the plural first lenses and by that each of lenses, being at least a part of the plural second lenses, is irradiated with two or more first lights of the plural first lights, a photoemissive surface to receive the plural second lights through its upper surface, and emit multiple photoelectron beams from its back surface, and a blanking aperture array mechanism to perform an individual blanking control by individually switching between ON and OFF of each of the multiple photoelectron beams.

Abstract: According to one aspect of the present invention, an electron beam irradiation apparatus includes a photoelectric surface configured to receive irradiation of excitation light on a side of a front surface, and generate electron beams from a side of a back surface; a blanking aperture array mechanism provided with passage holes corresponding to the electron beams and configured to perform deflection control on each of the plurality of electron beams passing through the passage holes; and an adjustment mechanism configured to adjust at least one of an orbit of transmitted light that passes through at least one of arrangement objects including the photoelectric surface, the blanking aperture array mechanism, and the limit aperture substrate up to the stage and reaches the stage, among an irradiated excitation light, and an orbit of the electron beams, wherein the arrangement objects shield at least a part of the transmitted light.

Abstract: A multiple electron beam writing apparatus includes an excitation light source to emit an excitation light, a multi-lens array to divide the excitation light into a plurality of lights, a photoemissive surface to receive the plurality of lights incident through its upper side, and emit multiple photoelectron beams from its back side, a blanking aperture array mechanism to provide, by deflecting each beam of the multiple photoelectron beams, an individual blanking control which individually switches each beam between ON and OFF, an electron optical system to include an electron lens, and to irradiate, using the electron lens, a target object with the multiple photoelectron beams having been controlled to be beam ON, and a control circuit to interconnect, for each shot of the multiple photoelectron beams, a timing of switching the excitation light between emission and non-emission with a timing of switching the each beam between ON and OFF.

Abstract: A method for producing an alloy fine particle-supported catalyst that supports alloy fine particles containing a noble metal includes: a step of mixing a noble metal salt, a base metal salt, an alcohol having 1 to 5 carbon atoms, and a support to form a mixture; and a heating step of heating the mixture at a temperature of 150° C. or higher and 800° C. or lower to produce an alloy fine particle-supported catalyst.

Abstract: According to one aspect of the present invention, an electron beam irradiation apparatus includes a photoelectric surface configured to receive irradiation of excitation light on a side of a front surface, and generate electron beams from a side of a back surface; a blanking aperture array mechanism provided with passage holes corresponding to the electron beams and configured to perform deflection control on each of the plurality of electron beams passing through the passage holes; and an adjustment mechanism configured to adjust at least one of an orbit of transmitted light that passes through at least one of arrangement objects including the photoelectric surface, the blanking aperture array mechanism, and the limit aperture substrate up to the stage and reaches the stage, among an irradiated excitation light, and an orbit of the electron beams, wherein the arrangement objects shield at least a part of the transmitted light.

Abstract: A multiple electron beam writing apparatus includes an excitation light source to emit an excitation light, a multi-lens array to divide the excitation light into a plurality of lights, a photoemissive surface to receive the plurality of lights incident through its upper side, and emit multiple photoelectron beams from its back side, a blanking aperture array mechanism to provide, by deflecting each beam of the multiple photoelectron beams, an individual blanking control which individually switches each beam between ON and OFF, an electron optical system to include an electron lens, and to irradiate, using the electron lens, a target object with the multiple photoelectron beams having been controlled to be beam ON, and a control circuit to interconnect, for each shot of the multiple photoelectron beams, a timing of switching the excitation light between emission and non-emission with a timing of switching the each beam between ON and OFF.

Abstract: Provided is a method for producing metal nanoparticles, which enables metal nanoparticles to be more conveniently produced. The method for producing metal nanoparticles includes spraying and drying a mixture to form metal nanoparticles, the mixture containing a metal salt and at least one solvent selected from alcohols having 1 or more and 5 or less carbon atoms.

Abstract: A charged particle beam irradiation apparatus according to an embodiment includes: an optical column; a stage; a mount supporting the stage; a chamber provided on the mount and supporting the optical column; a detector configured to detect movement of the stage; actuator units each including a curved plate, a piezoelectric element, and a connector connected configured to transmit a first force generated by a change of the curvature of the curved plate to the mount; and an actuator control circuit configured to control the voltage applied to the piezoelectric element of each of the actuator units based on movement information, so that the first force is transmitted from the actuator units to the mount against a second force acting on the mount due to the movement of the stage.

Abstract: A method for producing a noble metal fine particle-supported catalyst includes: a step of mixing a noble metal salt, an alcohol having 1 to 5 carbon atoms, and a support to form a mixture; and a heating step of the mixture at a temperature of 150° C. or higher and 800° C. or lower to produce a noble metal fine particle-supported catalyst.

Abstract: A charged particle beam irradiation apparatus according to an embodiment includes: an optical column; a stage; a mount supporting the stage; a chamber provided on the mount and supporting the optical column; a detector configured to detect movement of the stage; actuator units each including a curved plate, a piezoelectric element, and a connector connected configured to transmit a first force generated by a change of the curvature of the curved plate to the mount; and an actuator control circuit configured to control the voltage applied to the piezoelectric element of each of the actuator units based on movement information, so that the first force is transmitted from the actuator units to the mount against a second force acting on the mount due to the movement of the stage.

Abstract: An information processing device configured to process spectral information includes: a data obtaining unit configured to obtain three-dimensional distribution data of spectral information; a generating unit configured to generate two-dimensional image, data from the three-dimensional distribution data of spectral information; a display unit; a display control unit configured to display the two-dimensional image on the display unit; an information obtaining unit configured to obtain position information of a two-dimensional region which a user has selected from the two-dimensional image; and an extracting unit configured to extract, from a three-dimensional region corresponding to the two-dimensional region, in the three-dimensional distribution of spectral information, feature region information satisfying predetermined feature conditions.

Abstract: An information processing device configured to process spectral information includes: a data obtaining unit configured to obtain three-dimensional distribution data of spectral information; a generating unit configured to generate two-dimensional image, data from the three-dimensional distribution data of spectral information; a display unit; a display control unit configured to display the two-dimensional image on the display unit; an information obtaining unit configured to obtain position information of a two-dimensional region which a user has selected from the two-dimensional image; and an extracting unit configured to extract, from a three-dimensional region corresponding to the two-dimensional region, in the three-dimensional distribution of spectral information, feature region information satisfying predetermined feature conditions.

Abstract: A charged particle image measuring device includes a sample stage, a charged particle lens opposite the sample stage, a two-dimensional detector, a first diaphragm disposed between the sample stage and a position of a crossover that is formed by the charged particle lens and that is closest to a sample, and a second diaphragm disposed between the first diaphragm and the two-dimensional detector.

Abstract: A spectral data processing apparatus includes an analyzer configured to perform principal component analysis of spectral data acquired for each of a plurality of regions of a sample, wherein the analyzer obtains an eigenvector by performing the principal component analysis of first spectral data of a first region out of the plurality of regions, and performs the principal component analysis of second spectral data of a second region different from the first region out of the plurality of regions using the obtained eigenvector.

Abstract: Provided is a projection-type charged particle optical system in which a projection magnification can be changed while a decrease in the accuracy in measuring a mass-to-charge ratio is being suppressed. A projection-type charged particle optical system according to the present invention includes a first electrode disposed so as to face a sample and having an opening formed therein for allowing a charged particle to pass, a second electrode disposed on a side of the first electrode opposite to where the sample is disposed and having an opening formed therein for allowing the charged particle to pass, and a flight-tube electrode disposed such that the charged particle that has been emitted from the sample and has passed through the second electrode enters the flight-tube electrode and being configured to form a substantially equipotential space thereinside. A principal plane is formed at at least two positions in a travel path of the charged particle.

Abstract: Provided is a projection-type charged particle optical system in which a projection magnification can be changed while a decrease in the accuracy in measuring a mass-to-charge ratio is being suppressed. A projection-type charged particle optical system according to the present invention includes a first electrode disposed so as to face a sample and having an opening formed therein for allowing a charged particle to pass, a second electrode disposed on a side of the first electrode opposite to where the sample is disposed and having an opening formed therein for allowing the charged particle to pass, and a flight-tube electrode disposed such that the charged particle that has been emitted from the sample and has passed through the second electrode enters the flight-tube electrode and being configured to form a substantially equipotential space thereinside. A principal plane is formed at at least two positions in a travel path of the charged particle.

Abstract: To provide a mass spectrometer capable of performing high-sensitivity measurement using water molecules. The mass spectrometer has a chamber in which a sample is disposed, an irradiation unit for emitting particles to the sample, and an extraction electrode which leads secondary ions emitted from the sample to a mass spectrometry unit, in which the irradiation unit switches a first mode of emitting primary ions for causing the secondary ions to be emitted from the sample and a second mode of emitting particles containing water molecules to be made to adhere to the sample and emits the particles to the sample.