Patents by Inventor Kota Omori

Kota Omori has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20140339096
    Abstract: In this method, RH2ORH1SO2F is added to hydrofluoric acid so as to form a thick solution (hydrogen bonded complex), and the solution is directly supplied to a liquid phase reaction system, in which an F2 gas is used. Alternatively, RH2ORH1SO2Cl is added to hydrofluoric acid so as no be converted into RH1ORH2SO2F by disc barging HCl, and the RH1ORH2SO2F is directly supplied to a liquid phase reaction system in which an F2 gas is used. Consequently, fluorination can be carried out safely and a compound having an objective structure can be produced at low cost without causing isomerization or the like.
    Type: Application
    Filed: August 4, 2014
    Publication date: November 20, 2014
    Inventors: Mitsuo Kurumaya, Tsunetoshi Honda, Kota Omori
  • Patent number: 8350082
    Abstract: This process for producing fluorine-containing compounds includes liquid-phase fluorination by introducing a raw material compound and fluorine gas into a solvent to replace hydrogen atoms in the raw material compound with fluorine atoms. More specifically, the process for producing fluorine-containing compounds includes (1) promoting fluorination by dissolving the raw material compound in anhydrous hydrofluoric acid and introducing into a liquid-phase fluorination solvent, or (2) promoting fluorination by dissolving the raw material compound in a perfluoro compound having a plurality of polar groups in a molecule thereof and introducing into a liquid-phase fluorination solvent. According to these processes, a fluorination reaction can be carried out at high yield and without containing hardly any isomers while using a hydrocarbon compound as is for the raw material.
    Type: Grant
    Filed: November 28, 2008
    Date of Patent: January 8, 2013
    Assignees: Mitsubishi Materials Corporation, Mitsubishi Materials Electronic Chemicals Co., Ltd.
    Inventors: Mitsuo Kurumaya, Tsunetoshi Honda, Kota Omori
  • Publication number: 20120184763
    Abstract: In this method, RH2ORH1SO2F is added to hydrofluoric acid so as to form a thick solution (hydrogen bonded complex), and the solution is directly supplied to a liquid phase reaction system in which an F2 gas is used. Alternatively, RH2ORH1SO2Cl is added to hydrofluoric acid so as to be converted into RH1ORH2SO2F by discharging HCl, and the RH1ORH2SO2F is directly supplied to a liquid phase reaction system in which an F2 gas is used. Consequently, fluorination can be carried out safely and a compound having an objective structure can be produced at low cost without causing isomerization or the like.
    Type: Application
    Filed: September 29, 2010
    Publication date: July 19, 2012
    Applicants: Mitsubishi Materials Electronic Chemicals Co., Ltd, MITSUBISHI MATERIALS CORPORATION
    Inventors: Mitsuo Kurumaya, Tsunetoshi Honda, Kota Omori
  • Publication number: 20100305345
    Abstract: This process for producing fluorine-containing compounds includes liquid-phase fluorination by introducing a raw material compound and fluorine gas into a solvent to replace hydrogen atoms in the raw material compound with fluorine atoms. More specifically, the process for producing fluorine-containing compounds includes (1) promoting fluorination by dissolving the raw material compound in anhydrous hydrofluoric acid and introducing into a liquid-phase fluorination solvent, or (2) promoting fluorination by dissolving the raw material compound in a perfluoro compound having a plurality of polar groups in a molecule thereof and introducing into a liquid-phase fluorination solvent. According to these processes, a fluorination reaction can be carried out at high yield and without containing hardly any isomers while using a hydrocarbon compound as is for the raw material.
    Type: Application
    Filed: November 28, 2008
    Publication date: December 2, 2010
    Applicants: MITSUBISHI MATERIALS CORPORATION, MITSUBISHI MATERIALS ELECTRONIC CHEMICALS CO., LTD
    Inventors: Mitsuo Kurumaya, Tsunetoshi Honda, Kota Omori
  • Patent number: 7135430
    Abstract: Divalent and trivalent metal salts are added to the solution containing the fluorine compound to precipitate the layered double hydroxide containing the fluorine compound between layers. By these processes, the fluorine compound can be fixed with high rate. Moreover, if necessary, the precipitated layered double hydroxide can be recovered to separate the fluorine compound or its salt between layers. Therefore, the burden to environment or the ecosystem by the fluorine compound can be reduced.
    Type: Grant
    Filed: March 26, 2004
    Date of Patent: November 14, 2006
    Assignee: JEMCO Inc.
    Inventors: Kiyoshi Fuda, Toshiaki Matsunaga, Takeshi Kamiya, Kota Omori
  • Patent number: 6897344
    Abstract: Divalent and trivalent metal salts are added to the solution containing the fluorine compound to precipitate the layered double hydroxide containing the fluorine compound between layers. By these processes, the fluorine compound can be fixed with high rate. Moreover, if necessary, the precipitated layered double hydroxide can be recovered to separate the fluorine compound or its salt between layers. Therefore, the burden to environment or the ecosystem by the fluorine compound can be reduced.
    Type: Grant
    Filed: July 26, 2001
    Date of Patent: May 24, 2005
    Assignee: Jemco Inc.
    Inventors: Kiyoshi Fuda, Toshiaki Matsunaga, Takeshi Kamiya, Kota Omori
  • Publication number: 20050004410
    Abstract: Divalent and trivalent metal salts are added to the solution containing the fluorine compound to precipitate the layered double hydroxide containing the fluorine compound between layers. By these processes, the fluorine compound can be fixed with high rate. Moreover, if necessary, the precipitated layered double hydroxide can be recovered to separate the fluorine compound or its salt between layers. Therefore, the burden to environment or the ecosystem by the fluorine compound can be reduced.
    Type: Application
    Filed: March 26, 2004
    Publication date: January 6, 2005
    Applicant: JEMCO INC.
    Inventors: Kiyoshi Fuda, Toshiaki Matsunaga, Takeshi Kamiya, Kota Omori
  • Patent number: 6743957
    Abstract: Divalent and trivalent metal salts are added to the solution containing the fluorine compound and the polymer containing fluorine to precipitate the layered double hydroxide containing the fluorine compound between layers. At this time, the polymer containing fluorine suspended in the solution is also coagulated to precipitate. By these processes, the fluorine compound is fixed with high rate to separate from the solution with the polymer containing fluorine, and recovered if necessary. By this treatment process, the fluorine compound and the polymer containing fluorine, contained in the wastewater etc. can be separated easily, and the burden to environment or ecosystem can be reduced.
    Type: Grant
    Filed: June 26, 2002
    Date of Patent: June 1, 2004
    Assignee: JEMCO, Inc.
    Inventors: Kiyoshi Fuda, Toshiaki Matsunaga, Takeshi Na Kamiya, Kota Omori
  • Publication number: 20030006195
    Abstract: Divalent and trivalent metal salts are added to the solution containing the fluorine compound and the polymer containing fluorine to precipitate the layered double hydroxide containing the fluorine compound between layers. At this time, the polymer containing fluorine suspended in the solution is also coagulated to precipitate. By these processes, the fluorine compound is fixed with high rate to separate from the solution with the polymer containing fluorine, and recovered if necessary. By this treatment process, the fluorine compound and the polymer containing fluorine, contained in the wastewater etc. can be separated easily, and the burden to environment or ecosystem can be reduced.
    Type: Application
    Filed: June 26, 2002
    Publication date: January 9, 2003
    Inventors: Kiyoshi Fuda, Toshiaki Matsunaga, Takeshi Na Kamiya, Kota Omori
  • Publication number: 20020183570
    Abstract: Divalent and trivalent metal salts are added to the solution containing the fluorine compound to precipitate the layered double hydroxide containing the fluorine compound between layers. By these processes, the fluorine compound can be fixed with high rate. Moreover, if necessary, the precipitated layered double hydroxide can be recovered to separate the fluorine compound or its salt between layers. Therefore, the burden to environment or the ecosystem by the fluorine compound can be reduced.
    Type: Application
    Filed: June 12, 2002
    Publication date: December 5, 2002
    Inventors: Kiyoshi Fuda, Toshiaki Matsunaga, Takeshi Kamiya, Kota Omori