Abstract: A substrate processing method includes: (a) providing a substrate including a first region containing a first material including silicon and a second region containing a second material different from the first material; (b) etching the second region while forming a metal-containing layer on the first region, by a plasma generated from a processing gas including halogen and metal; (c) removing the metal-containing layer with a base.

Abstract: Disclosed is a glass with low solar transmittance, which is characterized by that it has a basic composition of soda-lime-silica glass, that it contains as coloring components 0.70-1.70 mass % of Fe2O3 (total iron in terms of ferric iron), 0.15-0.45 mass % of FeO (ferrous iron), 0-0.8 mass % of TiO2, 100-350 ppm of CoO, 0-60 ppm of Se, 100-700 ppm of Cr2O3, and 3-150 ppm of MnO, that it has a ratio (Fe2+/Fe3+) of ferrous iron to ferric iron of 0.20-0.80. This glass has superior ultraviolet absorbing performance and infrared absorbing performance (heat insulation performance) and an appropriate transparency.

Abstract: Disclosed is a glass with low solar transmittance, which is characterized by that it has a basic composition of soda-lime-silica glass, that it contains as coloring components 0.70-1.70 mass % of Fe2O3 (total iron in terms of ferric iron), 0.15-0.45 mass % of FeO (ferrous iron), 0-0.8 mass % of TiO2, 100-350 ppm of CoO, 0-60 ppm of Se, 100-700 ppm of Cr2O3, and 3-150 ppm of MnO, that it has a ratio (Fe2+/Fe3+) of ferrous iron to ferric iron of 0.20-0.80. This glass has superior ultraviolet absorbing performance and infrared absorbing performance (heat insulation performance) and an appropriate transparency.