Abstract: A bearing surface (50) opposing a movable guide (21) of a hydrostatic bearing has a gas supply hole (52) which has an orifice with a diameter smaller than that of the outer shape of the bearing. Each of hydrostatic bearings (14, 24) incorporates a poppet valve (53) which can seamlessly change the flow resistance in the gas supply hole (52), an actuator unit (55) for linearly driving the poppet valve (53), and a guide mechanism (58) which guides the poppet valve (53) so as to set the poppet valve (53) in linear motion. The actuator unit (55) has, for example, coils (56) arranged on the movable side (the base of the poppet valve (53)) and permanent magnets arranged on the fixed side (a portion opposing the base of the poppet valve (53)). With this arrangement, the poppet valve (53) can be driven at high speed and high precision. The poppet valve (53) is driven in accordance with a command from a controller (51). A pressure (Ps) is applied to the poppet valve (53) as the back pressure.

Abstract: A pattern is drawn on a substrate at high speed and high accuracy, and a substrate stage is stably controlled. An exposure apparatus includes a substrate stage, a transfer stage which moves in the X and Y directions with the substrate stage on board, an electromagnetic actuator which moves the substrate stage relative to the transfer stage, a laser interferometer which measures the position of the transfer stage, a displacement sensor which measures a relative displacement between the transfer stage and the substrate stage, a controller which controls the electromagnetic actuator on the basis of measurement results obtained by the laser interferometer and displacement sensor, a deflector which deflects electron beams, a laser interferometer which measures the position of the substrate stage, and a filter which performs filtering for a measurement value obtained by the laser interferometer to supply the filtered measurement value to the deflector.

Abstract: An electron beam exposure apparatus which exposes a substrate with a predetermined pattern using one or plurality of electron beams is provided with a &thgr;Z stage on which the substrate is mounted; an X-Y transfer stage which drives the &thgr;Z stage on an X-Y plane; and an electromagnetic actuator (a &thgr; linear motor movable element and &thgr; linear motor stator) which drives the &thgr;Z stage in a rotation direction about the Z-axis with respect to the X-Y transfer stage.

Abstract: Pure water (3) with a resistivity of 1 M&OHgr;·cm or more is externally supplied in an exposure apparatus in which a master and substrate are relatively moved and aligned by a stage driven by a linear motor (1) and a pattern on the master is transferred onto the substrate. While being adjusted to a predetermined temperature, the pure water (3) undergoes deoxidation processing and UV sterilization processing and is circulated to cool the linear motor (1).

Abstract: In order to perform a measurement operation of a pattern and a processing operation in parallel while the positions of two substrate stages are accurately measured and wire/hose units are prevented from becoming tangled, a substrate processing apparatus includes an alignment system for measuring the pattern arrangements of the substrates, a processing system disposed separately from the alignment system and used for processing the substrates, substrate stages which are able to support the substrates and move in an xy plane, and position measurement systems which measure the positions of the substrate stages. Four position measurement systems are arranged for the measurement in the x direction, and three position measurement systems are arranged for the measurement in the y direction. One of the position measurement systems for the measurement in the y direction is disposed at a side opposite to the remaining positioning measurement systems across the substrate stages.

Abstract: A positioning device includes a stage which is movable along a reference surface, a stage driving mechanism for driving the stage, and an inertia imparting mechanism for reducing a reaction force produced by driving the stage. The inertia imparting mechanism has a mass body, which is movable with respect to a stage base or a structure, and a mass body driving mechanism for driving the mass body, and the stage base or structure is given inertia by driving the mass body. The inertia imparting mechanism also includes a reaction force compensation, which, by moving the mass body, reduces reaction force caused by motion of the stage, and a positioning compensation control system, which compensates for the position of the mass body. Thus, it is possible to reduce a reaction force produced by motion of the stage, and to compensate for position offset of the mass body.

Abstract: A positioning system includes a movable member being movable along a reference plane containing first and second directions, and a position measuring device for measuring positional information related to the movable member, wherein the movable member includes an element having a reflection surface inclined with respect to the reference plane, and wherein the position measuring device includes a measuring system for causing a measurement beam to be reflected by the inclined reflection surface and for detecting positional information related to the movable member with respect to a direction intersecting the reference plane.

Abstract: A positioning apparatus includes a movable stage, a first linear motor for moving the stage in a predetermined direction, a platform for supporting the first linear motor, and an inertial force application mechanism for applying a force for canceling a force acting on the platform, which is generated when the stage is moved by the first linear motor. The inertial force application mechanism includes amass body, a guide for supporting and guiding the mass body, a second linear motor for moving the mass body, and a controller for controlling the second linear motor. Since the inertial force application mechanism of the positioning apparatus prevents transmission of vibration generated by an increase in an exciting force of the stage, rapid and precise positioning can be performed.

Abstract: A precision stage is provided so as to be movable along the Z axis, in the .theta. direction, which is the direction of rotation about the Z axis, and in two oblique directions inclined with respect to the Z axis. The stage has a sensor for measuring stage position along the Z axis. Reference-position return of this sensor is carried out. Reference-position return of two Y laser interferometers for measuring the .theta. position of the precision stage is carried out in a state in which the positions of the precision stage in the direction along the Z axis and in the oblique directions are held at predetermined reference positions. After this reference-position return is carried out, reference-position return is performed with regard to an X laser interferometer and the two Y laser interferometers in a state in which the positions of the precision stage in the direction along the Z axis, in the oblique directions and in the .theta. direction are held at predetermined reference positions.

Abstract: A stage feeding device has a movable guide which is guided on a reference surface of a platen to be movable in the Y-direction, a Y-linear motor for moving the movable guide in the Y-direction, a movable stage which is supported by the movable guide to be movable in the X-direction, and carries an object, and an X-linear motor for moving the movable stage in the X-direction. The stator of the X-linear motor is supported by a second stationary guide to be movable in only the Y-direction independently of the movable guide, and is moved in the Y-direction by a driving mechanism. The stator of the Y-linear motor and the second stationary guide are fixed to the base, and mount members for removing vibrations are arranged between the base and the platen.

Abstract: A stage apparatus is provided with a table having a reference surface, support means for supporting the table, a first movable body movable in a first direction on the reference surface, first driving means for driving the first movable body, a second movable body movable in a second direction differing from the first direction with the first movable body as the reference, and second driving means for driving the second movable body, and the driving reaction forces of the first driving means and the second driving means are received by a base discrete from the table. Also, provision is made of a supporting mechanism for supporting the second driving means for minute displacement in the second direction relative to the first movable body. By this construction, the influence of a reaction force resulting from the acceleration and deceleration of the stage is made small.

Abstract: A positioning system wherein a holding surface for holding a substrate is movable relative to a base in directions of X, Y and Z axes and in rotational directions about the X, Y and Z axes, wherein there are plural guiding devices associated respectively with motions in the directions of X, Y and Z axes and in the rotational directions about the X, Y and Z axes, respectively, and wherein each guiding device comprises a non-contact static bearing device.

Abstract: A movable stage apparatus and an exposure system including a moving stage apparatus, includes a movable member capable of being driven by a driving mechanism, and first and second sets of fluid bearings. The first set of fluid bearings supports the movable member. The second set of fluid bearings is connected to a plurality of driving elements. The plurality of driving elements are connected to the movable member and are displaceable in a direction in which the movable member is supported by the first set of fluid bearings. The second set of fluid bearings supports the movable member. Also provided is a controller for applying a voltage to the plurality of driving elements so as to compensate for the postutre of the movable member when the posture of the movable member changes in response to being driven by the driving mechanism. The system further includes an exposure apparatus for exposing an object to be exposed which is mounted on the movable member.

Abstract: A weight supporting apparatus supports the weight of a structure required to have very high surface precision, without affecting the surface precision of the structure. The weight support apparatus includes a driving unit for moving a driven body in the direction of gravity with respect to a base, and a supporting unit for supporting the weight of the driven body at a position after being driven, wherein the driving unit and supporting unit are so arranged that the drive force of the driving unit and the support force of the supporting unit are on the same axis.

Abstract: In an apparatus for scanning an original image by directing light from an original irradiated with a light source to a photoelectric conversion device or a photosensitive member, the natural frequencies of a plurality of mirrors for reflecting the light from the original are set to different values to prevent the plurality of mirrors from vibrating at the same frequency.

Abstract: An apparatus for preventing the self-excited vibration of a static pressure bearing device includes a movable bed and a porous pad. The movable bed is noncontactly supported by the static pressure of pressurized fluid spouted from the porous pad toward the surface of a fixed bed. The porous pad is designed such that the natural frequency of a vibration system including the movable bed is regulated so that among the fluctuation components of the static pressure when the dimension of a bearing gap varies periodically, a periodic fluctuation component having a phase delay of 90.degree. relative to a decrease in the dimension of the bearing gap may be positive and of a frequency equal to the aforementioned natural frequency.

Abstract: A device for positioning control includes a movable stage; an acceleration sensor disposed on the movable table; a feedback loop for controlling movement of the movable table; and an acceleration feedback loop provided in relation to an acceleration signal from the acceleration sensor, wherein the acceleration feedback loop is provided as an internal loop to the feedback loop.