Patents by Inventor Kotaro Kubo

Kotaro Kubo has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20230329544
    Abstract: There is obtained a cheek retractor that a right outer flange and a left outer flange are provided with a right personal authentication identification code plate portion and a left personal authentication identification code plate portion, respectively, on which two-dimensional barcodes are printed. Since the cheek retractor is mounted on an oral cavity of a patient by holding an arm, which is close to the right personal authentication identification code plate portion and the left personal authentication identification code plate portion, by hand and by pushing the arm inward against a spring force, and an image including a right personal authentication identification code and a left personal authentication identification code is captured, even without experience, an image can be captured to encompass the entirety of a mouth, and since identification information of the patient can be acquired, who the patient is can be grasped.
    Type: Application
    Filed: June 26, 2023
    Publication date: October 19, 2023
    Inventor: Kotaro KUBO
  • Patent number: 8944888
    Abstract: A chemical mechanical polishing pad includes a polishing layer, a recess being formed in a polishing surface of the polishing layer, the polishing layer including a surface layer that forms at least an inner side of the recess, and a ratio (D1/D2) of an average opening ratio D1(%) to an average opening ratio D2(%) being 0.01 to 0.5, the average opening ratio D1 being an average opening ratio of the inner side of the recess when the polishing layer has been immersed in water at 23° C. for 1 hour, and the average opening ratio D2 being an average opening ratio of a cross section of the polishing layer that does not intersect the surface layer when the cross section has been immersed in water at 23° C. for 1 hour.
    Type: Grant
    Filed: June 13, 2011
    Date of Patent: February 3, 2015
    Assignee: JSR Corporation
    Inventors: Kotaro Kubo, Yukio Hosaka, Takahiro Okamoto
  • Publication number: 20130316621
    Abstract: A chemical mechanical polishing pad includes a polishing layer that is formed of a composition that includes a polyurethane, the polishing layer having a specific gravity of 1.1 to 1.3 and a thermal conductivity of 0.2 W/m·K or more.
    Type: Application
    Filed: December 2, 2011
    Publication date: November 28, 2013
    Applicant: JSR CORPORATION
    Inventors: Ayako Maekawa, Satoshi Kamo, Naoki Nishiguchi, Hirotaka Shida, Takahiro Okamoto, Kotaro Kubo
  • Publication number: 20130189907
    Abstract: A chemical mechanical polishing pad includes a polishing layer, a recess being formed in a polishing surface of the polishing layer, the polishing layer including a surface layer that forms at least an inner side of the recess, and a ratio (D1/D2) of an average opening ratio D1(%) to an average opening ratio D2(%) being 0.01 to 0.5, the average opening ratio D1 being an average opening ratio of the inner side of the recess when the polishing layer has been immersed in water at 23° C. for 1 hour, and the average opening ratio D2 being an average opening ratio of a cross section of the polishing layer that does not intersect the surface layer when the cross section has been immersed in water at 23° C. for 1 hour.
    Type: Application
    Filed: June 13, 2011
    Publication date: July 25, 2013
    Applicant: JSR CORPORATION
    Inventors: Kotaro Kubo, Yukio Hosaka, Takahiro Okamoto