Patents by Inventor Kotaro Sasano
Kotaro Sasano has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Publication number: 20140369373Abstract: The invention relates to a two-stage laser system well fit for semiconductor aligners, which is reduced in terms of spatial coherence while taking advantage of the high stability, high output efficiency and fine line width of the MOPO mode. The two-stage laser system for aligners comprises an oscillation-stage laser (50) and an amplification-stage laser (60). Oscillation laser light having divergence is used as the oscillation-stage laser (50), and the amplification-stage laser (60) comprises a Fabry-Perot etalon resonator made up of an input side mirror (1) and an output side mirror (2). The resonator is configured as a stable resonator.Type: ApplicationFiled: April 4, 2014Publication date: December 18, 2014Applicants: GIGAPHOTON INC., KOMATSU LTD.Inventors: Osamu WAKABAYASHI, Tatsuya ARIGA, Takahito KUMAZAKI, Kotaro SASANO
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Patent number: 8817839Abstract: The invention relates to a two-stage laser system well fit for semiconductor aligners, which is reduced in terms of spatial coherence while taking advantage of the high stability, high output efficiency and fine line width of the MOPO mode. The two-stage laser system for aligners comprises an oscillation-stage laser (50) and an amplification-stage laser (60). Oscillation laser light having divergence is used as the oscillation-stage laser (50), and the amplification-stage laser (60) comprises a Fabry-Perot etalon resonator made up of an input side mirror (1) and an output side mirror (2). The resonator is configured as a stable resonator.Type: GrantFiled: May 10, 2012Date of Patent: August 26, 2014Assignees: Komatsu Ltd., Gigaphoton Inc.Inventors: Osamu Wakabayashi, Tatsuya Ariga, Takahito Kumazaki, Kotaro Sasano
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Publication number: 20120224600Abstract: The invention relates to a two-stage laser system well fit for semiconductor aligners, which is reduced in terms of spatial coherence while taking advantage of the high stability, high output efficiency and fine line width of the MOPO mode. The two-stage laser system for aligners comprises an oscillation-stage laser (50) and an amplification-stage laser (60). Oscillation laser light having divergence is used as the oscillation-stage laser (50), and the amplification-stage laser (60) comprises a Fabry-Perot etalon resonator made up of an input side mirror (1) and an output side mirror (2). The resonator is configured as a stable resonator.Type: ApplicationFiled: May 10, 2012Publication date: September 6, 2012Applicants: GIGAPHOTON INC., KOMATSU LTD.Inventors: Osamu WAKABAYASHI, Tatsuya ARIGA, Takahito KUMAZAKI, Kotaro SASANO
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Patent number: 8116347Abstract: The invention relates to a two-stage laser system well fit for semiconductor aligners, which is reduced in terms of spatial coherence while taking advantage of the high stability, high output efficiency and fine line width of the MOPO mode. The two-stage laser system for aligners comprises an oscillation-stage laser (50) and an amplification-stage laser (60). Oscillation laser light having divergence is used as the oscillation-stage laser (50), and the amplification-stage laser (60) comprises a Fabry-Perot etalon resonator made up of an input side mirror (1) and an output side mirror (2). The resonator is configured as a stable resonator.Type: GrantFiled: April 16, 2004Date of Patent: February 14, 2012Assignee: Komatsu Ltd.Inventors: Osamu Wakabayashi, Tatsuya Ariga, Takahito Kumazaki, Kotaro Sasano
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Publication number: 20110216800Abstract: The invention relates to a two-stage laser system well fit for semiconductor aligners, which is reduced in terms of spatial coherence while taking advantage of the high stability, high output efficiency and fine line width of the MOPO mode. The two-stage laser system for aligners comprises an oscillation-stage laser (50) and an amplification-stage laser (60). Oscillation laser light having divergence is used as the oscillation-stage laser (50), and the amplification-stage laser (60) comprises a Fabry-Perot etalon resonator made up of an input side mirror (1) and an output side mirror (2). The resonator is configured as a stable resonator.Type: ApplicationFiled: May 13, 2011Publication date: September 8, 2011Applicant: KOMATSU, LTD.Inventors: Osamu WAKABAYASHI, Tatsuya Ariga, Takahito Kumazaki, Kotaro Sasano
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Patent number: 7957449Abstract: The invention relates to a two-stage laser system well fit for semiconductor aligners, which is reduced in terms of spatial coherence while taking advantage of the high stability, high output efficiency and fine line width of the MOPO mode. The two-stage laser system for aligners comprises an oscillation-stage laser (50) and an amplification-stage laser (60). Oscillation laser light having divergence is used as the oscillation-stage laser (50), and the amplification-stage laser (60) comprises a Fabry-Perot etalon resonator made up of an input side mirror (1) and an output side mirror (2). The resonator is configured as a stable resonator.Type: GrantFiled: December 3, 2006Date of Patent: June 7, 2011Assignee: Komatsu Ltd.Inventors: Osamu Wakabayashi, Tatsuya Ariga, Takahito Kumazaki, Kotaro Sasano
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Publication number: 20070297483Abstract: The invention relates to a two-stage laser system well fit for semiconductor aligners, which is reduced in terms of spatial coherence while taking advantage of the high stability, high output efficiency and fine line width of the MOPO mode. The two-stage laser system for aligners comprises an oscillation-stage laser (50) and an amplification-stage laser (60). Oscillation laser light having divergence is used as the oscillation-stage laser (50), and the amplification-stage laser (60) comprises a Fabry-Perot etalon resonator made up of an input side mirror (1) and an output side mirror (2). The resonator is configured as a stable resonator.Type: ApplicationFiled: December 3, 2006Publication date: December 27, 2007Applicants: KOMATSU LTD., GIGAPHOTON INC.Inventors: Osamu WAKABAYASHI, Tatsuya ARIGA, Takahito KUMAZAKI, Kotaro SASANO
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Publication number: 20070091968Abstract: The invention relates to a two-stage laser system well fit for semiconductor aligners, which is reduced in terms of spatial coherence while taking advantage of the high stability, high output efficiency and fine line width of the MOPO mode. The two-stage laser system for aligners comprises an oscillation-stage laser (50) and an amplification-stage laser (60). Oscillation laser light having divergence is used as the oscillation-stage laser (50), and the amplification-stage laser (60) comprises a Fabry-Perot etalon resonator made up of an input side mirror (1) and an output side mirror (2). The resonator is configured as a stable resonator.Type: ApplicationFiled: April 16, 2004Publication date: April 26, 2007Applicant: KOMATSU LTD.Inventors: Osamu Wakabayashi, Tatsuya Ariga, Takahito Kumazaki, Kotaro Sasano