Abstract: The present invention is a wafer temperature control device for controlling the temperature of a wafer by regulating the pressure of a heat transfer gas, the wafer temperature control device being capable of estimating the temperature of the wafer with sufficient accuracy and controlling the temperature of the wafer to a target temperature, and including: a pressure regulator configured to regulate the pressure of the heat transfer gas; a nearby temperature sensor configured to measure a nearby temperature of the wafer, a temperature estimation observer configured to estimate the temperature of the wafer based on the nearby temperature measured by the nearby temperature sensor and a manipulated pressure variable input to the pressure regulator or the pressure regulated by the pressure regulator, and a controller configured to control the manipulated pressure variable based on a temperature setting and an estimated wafer temperature estimated by the temperature estimation observer.

Abstract: Provided is a concentration control system that has only a small time delay, obtains accurate estimated values, and also enables partial pressure control having improved responsiveness and accuracy. The system includes a flow rate control device provided on a supply flow path that supplies gas to a chamber, and controls a flow rate of a gas in the supply flow path to match a set flow rate, a partial pressure measurement device for a gas inside the chamber, an observer having a model which estimates a state of the gas inside the chamber, where a flow rate of the gas flowing into the chamber and measured partial pressures are input into the model, and an estimated partial pressure of the gas within the chamber is output, and a controller that, based on a set partial pressure and on the estimated partial pressure, sets the set flow rate.

Abstract: Provided is a flow rate control device capable of diagnosing whether an abnormality has occurred while continuing to supply a predetermined flow rate. The flow rate control device calculates an inflow/outflow rate of a fluid into a volume on the basis of a downstream pressure that is the pressure in the volume; estimates a valve flow rate that is a flow rate of the fluid that flows out of the volume through the downstream valve on the basis of the resistance flow rate and the inflow/outflow flow rate; controls the downstream valve so that the difference between the set flow rate and the valve flow rate decreases; calculates a diagnostic parameter on the basis of the resistance flow rate or the inflow/outflow flow rate in a pressure change state in which the upstream side pressure increases or decreases; and diagnoses an abnormality based on the diagnostic parameter.

Abstract: A system that controls the flow rates of a plurality of split channels provided parallel to each other to a certain flow split ratio includes: a flow split ratio calculation unit that, in order to be able to diagnose whether a system abnormality that affects the flow split ratio is occurring, calculates a ratio of output values of flow rate sensors obtained by allowing, while fluid control valves of different split channels are closed, fluids to flow in these split channels as an actual flow split ratio; a reference flow split ratio storage unit that stores a reference flow split ratio serving as a reference for the actual flow split ratio; and an abnormality diagnosis unit that compares the actual flow split ratio and the reference flow split ratio, and diagnoses a system abnormality.

Abstract: A flow rate control apparatus can obtain a flow rate of a fluid passing through a downstream-side valve in a form in which noise is significantly reduced with little time delay, and has improved responsiveness. The flow rate control apparatus includes: a downstream-side valve flow rate meter that measures a downstream-side valve flow rate that is a flow rate of a fluid passing through a downstream-side valve; and an observer including a downstream-side valve flow rate estimation model that estimates the downstream-side valve flow rate on the basis of an input parameter that changes an opening degree of the downstream-side valve. The observer is configured so as to be fed back a deviation between the measured value of the downstream-side valve flow rate and the estimated value of the downstream-side valve flow rate.

Abstract: Provided is a concentration control system that has only a small time delay, obtains accurate estimated values, and also enables partial pressure control having improved responsiveness and accuracy. The system includes a flow rate control device provided on a supply flow path that supplies gas to a chamber, and controls a flow rate of a gas in the supply flow path to match a set flow rate, a partial pressure measurement device for a gas inside the chamber, an observer having a model which estimates a state of the gas inside the chamber, where a flow rate of the gas flowing into the chamber and measured partial pressures are input into the model, and an estimated partial pressure of the gas within the chamber is output, and a controller that, based on a set partial pressure and on the estimated partial pressure, sets the set flow rate.

Abstract: A system that controls the flow rates of a plurality of split channels provided parallel to each other to a certain flow split ratio includes: a flow split ratio calculation unit that, in order to be able to diagnose whether a system abnormality that affects the flow split ratio is occurring, calculates a ratio of output values of flow rate sensors obtained by allowing, while fluid control valves of different split channels are closed, fluids to flow in these split channels as an actual flow split ratio; a reference flow split ratio storage unit that stores a reference flow split ratio serving as a reference for the actual flow split ratio; and an abnormality diagnosis unit that compares the actual flow split ratio and the reference flow split ratio, and diagnoses a system abnormality.

Abstract: Provided is a flow rate control device capable of diagnosing whether an abnormality has occurred while continuing to supply a predetermined flow rate. The flow rate control device calculates an inflow/outflow rate of a fluid into a volume on the basis of a downstream pressure that is the pressure in the volume; estimates a valve flow rate that is a flow rate of the fluid that flows out of the volume through the downstream valve on the basis of the resistance flow rate and the inflow/outflow flow rate; controls the downstream valve so that the difference between the set flow rate and the valve flow rate decreases; calculates a diagnostic parameter on the basis of the resistance flow rate or the inflow/outflow flow rate in a pressure change state in which the upstream side pressure increases or decreases; and diagnoses an abnormality based on the diagnostic parameter.

Abstract: In order to prevent leakage, a fluid control apparatus is adapted to include: a valve provided in the flow path through which the fluid flows; a pressure sensor provided upstream of the valve; a flow rate sensor provided downstream of the pressure sensor; a reference pressure determination part that is inputted with a measured flow rate from the flow rate sensor and on the basis of a flow rate-pressure map, determines a reference pressure corresponding to the measured flow rate; a reference flow rate calculation part that calculates a reference flow rate so that the deviation between the reference pressure and a measured pressure measured by the pressure sensor decreases; and a valve control part that controls the opening of the valve so that the deviation between the reference flow rate and the measured flow rate decreases.

Abstract: A fluid control device is adapted to include: a valve provided in a flow path through which a fluid flows; a pressure sensor provided upstream of the valve; a flow rate sensor provided on downstream of the pressure sensor; a set flow rate generator that outputs a set flow rate corresponding to the measured pressure on the basis of a pressure-flow rate map; a valve control part that controls the opening level of the valve so that the deviation between the set flow rate and a measured flow rate decreases; and the set flow rate generator that outputs the set flow rate corresponding to the measured pressure to the valve control part. In addition, the set flow rate generator is adapted to control the set flow rate so that the measured pressure has a value up to a limit pressure.

Abstract: In order to prevent leakage, a fluid control apparatus is adapted to include: a valve provided in the flow path through which the fluid flows; a pressure sensor provided upstream of the valve; a flow rate sensor provided downstream of the pressure sensor; a reference pressure determination part that is inputted with a measured flow rate from the flow rate sensor and on the basis of a flow rate-pressure map, determines a reference pressure corresponding to the measured flow rate; a reference flow rate calculation part that calculates a reference flow rate so that the deviation between the reference pressure and a measured pressure measured by the pressure sensor decreases; and a valve control part that controls the opening of the valve so that the deviation between the reference flow rate and the measured flow rate decreases.

Abstract: A fluid control device is adapted to include: a valve provided in a flow path through which a fluid flows; a pressure sensor provided upstream of the valve; a flow rate sensor provided on downstream of the pressure sensor; a set flow rate generator that outputs a set flow rate corresponding to the measured pressure on the basis of a pressure-flow rate map; a valve control part that controls the opening level of the valve so that the deviation between the set flow rate and a measured flow rate decreases; and the set flow rate generator that outputs the set flow rate corresponding to the measured pressure to the valve control part. In addition, the set flow rate generator is adapted to control the set flow rate so that the measured pressure has a value up to a limit pressure.

Abstract: An operator is able to easily perform down-tuning while still achieving superior responsiveness and, in some cases, obtain an equivalent responsiveness as that obtained from the flow rate control device currently being used. In a flow rate control device that performs feedback control of a fluid control valve such that a measured flow rate closely approximates a target flow rate, there are provided a response lag input section that inputs a response lag set value, which is a value showing a response lag that an operator wishes to set, and a response lag generating section that generates response lags used in the feedback control in accordance with the response lag set values.

Abstract: In order to prevent an increase in size of a power source device in a power supply apparatus adapted to manage multiple flow rate controllers, the power supply apparatus is connected via cables to the multiple flow rate controllers adapted to control fluid flow rates, and manages operations of the flow rate controllers via the cables as well as supplying power to the flow rate controllers, respectively. In addition, the power supply apparatus is configured to include a power supply control part that shifts power supply start timings for at least some of the flow rate controllers.

Abstract: In order to make it possible to diagnose an operation state of a fluidic device despite reducing the size of the fluidic device, a relay is configured to include a first port connected with the fluidic device and a second port connected with a user information processor, and receive fluid-related data from the fluidic device via the first port and transmit the data to the user information processor via the second port, or receive the data from the user information processor via the second port and transmit the data to the fluidic device via the first port. In addition, the relay includes a third port that is connected with a diagnostic apparatus adapted to diagnose the operation state of the fluidic device, receive diagnostic data from the fluidic device via the first port, and transmit the diagnostic data to the diagnostic apparatus via the third port.

Abstract: A gas control system includes: a first valve that is provided in a carrier gas line or in a gas supply line; a flow rate control mechanism that is provided in a diluent gas line and includes a flow rate sensor and a second valve; a contactless type first concentration sensor; a first valve control part; a diluent gas setting flow rate calculation part adapted to, on the basis of a preset setting total flow rate of a post-dilution mixed gas and a post-dilution measured concentration, calculate a diluent gas setting flow rate that is a flow rate of a diluent gas to be flowed through the diluent gas line; and a second valve control part adapted to control the opening level of the second valve so as to decrease the deviation between the diluent gas setting flow rate and a measured flow rate measured by the flow rate sensor.

Abstract: A flow-rate control unit is constituted by a sensor model storage unit, a flow-rate simulation value output unit that outputs a flow-rate simulation value which is a flow-rate value that the sensor model outputs when a flow-rate setting value is input, a feedback control unit that outputs a flow-rate feedback value based on a deviation between a flow-rate measurement value and the flow-rate simulation value, and a valve control unit that controls a valve application voltage that is applied to a valve based on the flow-rate feedback value and a flow-rate feedforward value that is calculated from the flow-rate setting value, and the flow-rate simulation value output unit is configured to output the flow-rate simulation value in a state where a predetermined time delay exists with respect to the flow-rate setting value.

Abstract: An operator is able to easily perform down-tuning while still achieving superior responsiveness and, in some cases, obtain an equivalent responsiveness as that obtained from the flow rate control device currently being used. In a flow rate control device that performs feedback control of a fluid control valve such that a measured flow rate closely approximates a target flow rate, there are provided a response lag input section that inputs a response lag set value, which is a value showing a response lag that an operator wishes to set, and a response lag generating section that generates response lags used in the feedback control in accordance with the response lag set values.

Abstract: In order to keep a stable flow rate at a set flow rate value when a pressure fluctuation occurs in an upstream side of a valve, without providing an additional sensor for detecting a pressure fluctuation, a flow rate control apparatus is provided with: the valve; a flow rate sensor; a valve control part configured to control the valve so that a deviation between a set flow rate value and a measurement flow rate value is reduced, on the basis of the deviation and a set control coefficient; and a control coefficient setting part configured to set the control coefficient so that when a pressure rise occurs in the upstream side of the valve, a decreased amount in flow due to a decreased opening of the valve and an increased amount in flow due to an increased amount of a differential pressure before and after the valve, are balanced.

Abstract: A gas control system includes: a first valve that is provided in a carrier gas line or in a gas supply line; a flow rate control mechanism that is provided in a diluent gas line and includes a flow rate sensor and a second valve; a contactless type first concentration sensor; a first valve control part; a diluent gas setting flow rate calculation part adapted to, on the basis of a preset setting total flow rate of a post-dilution mixed gas and a post-dilution measured concentration, calculate a diluent gas setting flow rate that is a flow rate of a diluent gas to be flowed through the diluent gas line; and a second valve control part adapted to control the opening level of the second valve so as to decrease the deviation between the diluent gas setting flow rate and a measured flow rate measured by the flow rate sensor.