Abstract: A control parameter calculation apparatus calculates a control parameter of a fluid control apparatus that controls a fluid. The control parameter calculation apparatus stores correlation data indicating a correlation of a reference control parameter of the fluid control apparatus and a reference response signal output by using the reference control parameter, acquires a target response signal output by using a target control parameter of the fluid control apparatus different from the fluid control apparatus serving as a reference, acquires the correlation data and the target response signal and calculates a correlation control parameter corresponding to the target response signal in the fluid control apparatus serving as a reference by using the correlation data, and calculates an adjustment amount of the target control parameter based on the correlation control parameter and the reference control parameter.

Abstract: The present invention is a wafer temperature control device that includes a gas regulator that regulates a pressure or a flow rate of a gas, a temperature sensor that measures a temperature of either a measurement target area of a wafer or of an area adjacent thereto, an observer that, based on the measurement temperature from the temperature sensor and on a gas manipulated variable input into the gas regulator or the pressure or flow rate regulated by the gas regulator, estimates a temperature of a non-measurement target area that is different from the measurement target area of the wafer, and a gas control unit that, based on an estimation temperature for the non-measurement target area estimated by the observer and on a set temperature for the wafer, controls the gas manipulated variable input into the gas regulator using model predictive control.

Abstract: A concentration control device enables concentration control at high speed and with suppressed overshoot and is used in a raw material vaporization system that introduces a carrier gas into a liquid or solid raw material contained in a vaporization tank, vaporizes the carrier gas, and supplies a raw material gas generated by vaporization. The concentration control device includes flow rate control equipment that controls a flow rate of the carrier gas, a concentration measurement unit that measures a concentration of the raw material gas, and a flow rate control unit that controls a flow rate operation amount input to the flow rate control equipment by model predictive control based on a target concentration value of the raw material gas and a measured concentration value of the concentration measurement unit.

Abstract: A wafer temperature control device controls a temperature of a wafer by adjusting pressure of a gas, predicts future a temperature, and controls the temperature to a target temperature. The wafer is placed on a temperature adjusted plate and the gas is supplied between the plate and the wafer to control the wafer temperature. The control device comprises a pressure regulator that adjusts the pressure of the gas, a sensor that measures the vicinity temperature of the wafer, and a pressure control unit that controls a pressure operation amount input to the pressure regulator by model predictive control based on the vicinity temperature and target temperature of the wafer, and the pressure control unit uses a model, in which a heat transfer coefficient between the plate and the wafer is a variable obtained from the pressure of the gas, as a predictive model for the model predictive control.

Abstract: The present invention is a wafer temperature control device for controlling the temperature of a wafer by regulating the pressure of a heat transfer gas, the wafer temperature control device being capable of estimating the temperature of the wafer with sufficient accuracy and controlling the temperature of the wafer to a target temperature, and including: a pressure regulator configured to regulate the pressure of the heat transfer gas; a nearby temperature sensor configured to measure a nearby temperature of the wafer, a temperature estimation observer configured to estimate the temperature of the wafer based on the nearby temperature measured by the nearby temperature sensor and a manipulated pressure variable input to the pressure regulator or the pressure regulated by the pressure regulator, and a controller configured to control the manipulated pressure variable based on a temperature setting and an estimated wafer temperature estimated by the temperature estimation observer.

Abstract: The present invention is a wafer temperature control device for controlling the temperature of a wafer by regulating the pressure of a heat transfer gas, the wafer temperature control device being capable of estimating the temperature of the wafer with sufficient accuracy and controlling the temperature of the wafer to a target temperature, and including: a pressure regulator configured to regulate the pressure of the heat transfer gas; a nearby temperature sensor configured to measure a nearby temperature of the wafer, a temperature estimation observer configured to estimate the temperature of the wafer based on the nearby temperature measured by the nearby temperature sensor and a manipulated pressure variable input to the pressure regulator or the pressure regulated by the pressure regulator, and a controller configured to control the manipulated pressure variable based on a temperature setting and an estimated wafer temperature estimated by the temperature estimation observer.

Abstract: Provided is a concentration control system that has only a small time delay, obtains accurate estimated values, and also enables partial pressure control having improved responsiveness and accuracy. The system includes a flow rate control device provided on a supply flow path that supplies gas to a chamber, and controls a flow rate of a gas in the supply flow path to match a set flow rate, a partial pressure measurement device for a gas inside the chamber, an observer having a model which estimates a state of the gas inside the chamber, where a flow rate of the gas flowing into the chamber and measured partial pressures are input into the model, and an estimated partial pressure of the gas within the chamber is output, and a controller that, based on a set partial pressure and on the estimated partial pressure, sets the set flow rate.

Abstract: Provided is a flow rate control device capable of diagnosing whether an abnormality has occurred while continuing to supply a predetermined flow rate. The flow rate control device calculates an inflow/outflow rate of a fluid into a volume on the basis of a downstream pressure that is the pressure in the volume; estimates a valve flow rate that is a flow rate of the fluid that flows out of the volume through the downstream valve on the basis of the resistance flow rate and the inflow/outflow flow rate; controls the downstream valve so that the difference between the set flow rate and the valve flow rate decreases; calculates a diagnostic parameter on the basis of the resistance flow rate or the inflow/outflow flow rate in a pressure change state in which the upstream side pressure increases or decreases; and diagnoses an abnormality based on the diagnostic parameter.

Abstract: A system that controls the flow rates of a plurality of split channels provided parallel to each other to a certain flow split ratio includes: a flow split ratio calculation unit that, in order to be able to diagnose whether a system abnormality that affects the flow split ratio is occurring, calculates a ratio of output values of flow rate sensors obtained by allowing, while fluid control valves of different split channels are closed, fluids to flow in these split channels as an actual flow split ratio; a reference flow split ratio storage unit that stores a reference flow split ratio serving as a reference for the actual flow split ratio; and an abnormality diagnosis unit that compares the actual flow split ratio and the reference flow split ratio, and diagnoses a system abnormality.

Abstract: A flow rate control apparatus can obtain a flow rate of a fluid passing through a downstream-side valve in a form in which noise is significantly reduced with little time delay, and has improved responsiveness. The flow rate control apparatus includes: a downstream-side valve flow rate meter that measures a downstream-side valve flow rate that is a flow rate of a fluid passing through a downstream-side valve; and an observer including a downstream-side valve flow rate estimation model that estimates the downstream-side valve flow rate on the basis of an input parameter that changes an opening degree of the downstream-side valve. The observer is configured so as to be fed back a deviation between the measured value of the downstream-side valve flow rate and the estimated value of the downstream-side valve flow rate.

Abstract: Provided is a concentration control system that has only a small time delay, obtains accurate estimated values, and also enables partial pressure control having improved responsiveness and accuracy. The system includes a flow rate control device provided on a supply flow path that supplies gas to a chamber, and controls a flow rate of a gas in the supply flow path to match a set flow rate, a partial pressure measurement device for a gas inside the chamber, an observer having a model which estimates a state of the gas inside the chamber, where a flow rate of the gas flowing into the chamber and measured partial pressures are input into the model, and an estimated partial pressure of the gas within the chamber is output, and a controller that, based on a set partial pressure and on the estimated partial pressure, sets the set flow rate.

Abstract: A system that controls the flow rates of a plurality of split channels provided parallel to each other to a certain flow split ratio includes: a flow split ratio calculation unit that, in order to be able to diagnose whether a system abnormality that affects the flow split ratio is occurring, calculates a ratio of output values of flow rate sensors obtained by allowing, while fluid control valves of different split channels are closed, fluids to flow in these split channels as an actual flow split ratio; a reference flow split ratio storage unit that stores a reference flow split ratio serving as a reference for the actual flow split ratio; and an abnormality diagnosis unit that compares the actual flow split ratio and the reference flow split ratio, and diagnoses a system abnormality.

Abstract: Provided is a flow rate control device capable of diagnosing whether an abnormality has occurred while continuing to supply a predetermined flow rate. The flow rate control device calculates an inflow/outflow rate of a fluid into a volume on the basis of a downstream pressure that is the pressure in the volume; estimates a valve flow rate that is a flow rate of the fluid that flows out of the volume through the downstream valve on the basis of the resistance flow rate and the inflow/outflow flow rate; controls the downstream valve so that the difference between the set flow rate and the valve flow rate decreases; calculates a diagnostic parameter on the basis of the resistance flow rate or the inflow/outflow flow rate in a pressure change state in which the upstream side pressure increases or decreases; and diagnoses an abnormality based on the diagnostic parameter.

Abstract: In order to prevent leakage, a fluid control apparatus is adapted to include: a valve provided in the flow path through which the fluid flows; a pressure sensor provided upstream of the valve; a flow rate sensor provided downstream of the pressure sensor; a reference pressure determination part that is inputted with a measured flow rate from the flow rate sensor and on the basis of a flow rate-pressure map, determines a reference pressure corresponding to the measured flow rate; a reference flow rate calculation part that calculates a reference flow rate so that the deviation between the reference pressure and a measured pressure measured by the pressure sensor decreases; and a valve control part that controls the opening of the valve so that the deviation between the reference flow rate and the measured flow rate decreases.

Abstract: A fluid control device is adapted to include: a valve provided in a flow path through which a fluid flows; a pressure sensor provided upstream of the valve; a flow rate sensor provided on downstream of the pressure sensor; a set flow rate generator that outputs a set flow rate corresponding to the measured pressure on the basis of a pressure-flow rate map; a valve control part that controls the opening level of the valve so that the deviation between the set flow rate and a measured flow rate decreases; and the set flow rate generator that outputs the set flow rate corresponding to the measured pressure to the valve control part. In addition, the set flow rate generator is adapted to control the set flow rate so that the measured pressure has a value up to a limit pressure.

Abstract: In order to prevent leakage, a fluid control apparatus is adapted to include: a valve provided in the flow path through which the fluid flows; a pressure sensor provided upstream of the valve; a flow rate sensor provided downstream of the pressure sensor; a reference pressure determination part that is inputted with a measured flow rate from the flow rate sensor and on the basis of a flow rate-pressure map, determines a reference pressure corresponding to the measured flow rate; a reference flow rate calculation part that calculates a reference flow rate so that the deviation between the reference pressure and a measured pressure measured by the pressure sensor decreases; and a valve control part that controls the opening of the valve so that the deviation between the reference flow rate and the measured flow rate decreases.

Abstract: A fluid control device is adapted to include: a valve provided in a flow path through which a fluid flows; a pressure sensor provided upstream of the valve; a flow rate sensor provided on downstream of the pressure sensor; a set flow rate generator that outputs a set flow rate corresponding to the measured pressure on the basis of a pressure-flow rate map; a valve control part that controls the opening level of the valve so that the deviation between the set flow rate and a measured flow rate decreases; and the set flow rate generator that outputs the set flow rate corresponding to the measured pressure to the valve control part. In addition, the set flow rate generator is adapted to control the set flow rate so that the measured pressure has a value up to a limit pressure.

Abstract: An operator is able to easily perform down-tuning while still achieving superior responsiveness and, in some cases, obtain an equivalent responsiveness as that obtained from the flow rate control device currently being used. In a flow rate control device that performs feedback control of a fluid control valve such that a measured flow rate closely approximates a target flow rate, there are provided a response lag input section that inputs a response lag set value, which is a value showing a response lag that an operator wishes to set, and a response lag generating section that generates response lags used in the feedback control in accordance with the response lag set values.

Abstract: In order to prevent an increase in size of a power source device in a power supply apparatus adapted to manage multiple flow rate controllers, the power supply apparatus is connected via cables to the multiple flow rate controllers adapted to control fluid flow rates, and manages operations of the flow rate controllers via the cables as well as supplying power to the flow rate controllers, respectively. In addition, the power supply apparatus is configured to include a power supply control part that shifts power supply start timings for at least some of the flow rate controllers.

Abstract: In order to make it possible to diagnose an operation state of a fluidic device despite reducing the size of the fluidic device, a relay is configured to include a first port connected with the fluidic device and a second port connected with a user information processor, and receive fluid-related data from the fluidic device via the first port and transmit the data to the user information processor via the second port, or receive the data from the user information processor via the second port and transmit the data to the fluidic device via the first port. In addition, the relay includes a third port that is connected with a diagnostic apparatus adapted to diagnose the operation state of the fluidic device, receive diagnostic data from the fluidic device via the first port, and transmit the diagnostic data to the diagnostic apparatus via the third port.