Patents by Inventor Kotha Sai Madhukar Reddy

Kotha Sai Madhukar Reddy has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Semiconductor structures including molybdenum nitride, molybdenum oxynitride or molybdenum-based alloy material, and method of making such structures
    Patent number: 9466660
    Abstract: A semiconductor structure may include a first electrode over a substrate, a high-K dielectric material over the first electrode, and a second electrode over the high-K dielectric material, wherein at least one of the first electrode and the second electrode may include a material selected from the group consisting of a molybdenum nitride (MoaNb) material, a molybdenum oxynitride (MoOxNy) material, a molybdenum oxide (MoOx) material, and a molybdenum-based alloy material comprising molybdenum and nitrogen.
    Type: Grant
    Filed: October 16, 2013
    Date of Patent: October 11, 2016
    Assignee: Micron Technology, Inc.
    Inventors: Matthew N. Rocklein, Kotha Sai Madhukar Reddy, Vassil Antonov, Vishwanath Bhat
  • SEMICONDUCTOR STRUCTURES INCLUDING MOLYBDENUM NITRIDE, MOLYBDENUM OXYNITRIDE OR MOLYBDENUM-BASED ALLOY MATERIAL, AND METHOD OF MAKING SUCH STRUCTURES
    Publication number: 20150102460
    Abstract: A semiconductor structure may include a first electrode over a substrate, a high-K dielectric material over the first electrode, and a second electrode over the high-K dielectric material, wherein at least one of the first electrode and the second electrode may include a material selected from the group consisting of a molybdenum nitride (MoxNy) material, a molybdenum oxynitride (MoOxNy) material, a molybdenum oxide (MoOx) material, and a molybdenum-based alloy material comprising molybdenum and nitrogen.
    Type: Application
    Filed: October 16, 2013
    Publication date: April 16, 2015
    Applicant: Micron Technology, Inc.
    Inventors: Matthew N. Rocklein, Kotha Sai Madhukar Reddy, Vassil Antonov, Vishwanath Bhat
  • ELECTRO-CHEMICAL-DEPOSITION OF GALFENOL AND THE USES THEROF
    Publication number: 20120143046
    Abstract: A method for the electro-chemical-deposition (ECD) of alloys of iron (Fe) and gallium (Ga) to electro-deposit magnetostrictive “Galfenol” thin films. Various uses and applications for said Galfenol thin films are also disclosed.
    Type: Application
    Filed: December 2, 2011
    Publication date: June 7, 2012
    Inventors: Bethanie J.H. Stadler, Kotha Sai Madhukar Reddy, Douglas A. Rekenthaler