Patents by Inventor Kouhei Anju

Kouhei Anju has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 8315130
    Abstract: An objective lens is made of a resin material and focuses incident rays, which have a wavelength of 410 nm or less and are emitted from a light source, on an optical disc at a numerical aperture of 0.8 or more, wherein when a lens tilt sensitivity is defined as an amount of a 3rd-order coma aberration caused per a lens tilt of 1 degree which is an angle formed between an optical axis of the objective lens and a system optical axis of an optical system including the objective lens at 0° C., the lens tilt sensitivity is 130 m?rms/degree or less.
    Type: Grant
    Filed: November 2, 2010
    Date of Patent: November 20, 2012
    Assignee: Sony Corporation
    Inventors: Motoo Aiba, Kouhei Anju
  • Patent number: 8228777
    Abstract: An objective lens has a numerical aperture of 0.8 or more and focusing a light beam of a wavelength ? of at least 450 nm or less on an optical information recording medium. In this objective lens, a wavefront-aberration deterioration level TOR, accumulative value of aberration deterioration, satisfies the equation (1): TOR=?{square root over (2.52(DCm32+DCm52)+(TSA32+TSA52))}{square root over (2.52(DCm32+DCm52)+(TSA32+TSA52))}?0.07[?rms]??(1) In the equation (1), TSA3 [?rms/?m] and TSA5 [?rms/?m] refer to a third-order thickness sensitivity level and a fifth-order thickness sensitivity level, which are generated when a thickness error from a predetermined thickness is +1 ?m, respectively. DCm3 and DCm5 refer to a third-order decentering sensitivity level and a fifth-order decentering sensitivity level, which are generated when a decentering error of each of lens surfaces is 1 ?m, respectively.
    Type: Grant
    Filed: September 13, 2010
    Date of Patent: July 24, 2012
    Assignee: Sony Corporation
    Inventors: Kouhei Anju, Motoo Aiba
  • Patent number: 8125876
    Abstract: Provided is an objective lens for which expressions 0.83<(pM/pL)<1.17 and 0.83<(pM/pT)<1.17 or expressions 0.80<(pM/pL)<1.20 and 0.86<(pM/pT)<1.14 are satisfied, where pL is the ratio of fifth-order spherical aberration to third-order spherical aberration, the spherical aberrations being caused by a difference in the thickness of a cover layer of an optical recording medium, pT is the ratio of fifth-order spherical aberration to third-order spherical aberration, the spherical aberrations being caused by a change in the temperature of an environment of the objective lens, and pM is the ratio of fifth-order spherical aberration to third-order spherical aberration, the spherical aberrations being caused by a change in incident magnification.
    Type: Grant
    Filed: October 26, 2009
    Date of Patent: February 28, 2012
    Assignee: Sony Corporation
    Inventors: Motoo Aiba, Kiyoshi Toyota, Hiroyuki Sakakibara, Toyokazu Takahashi, Kouhei Anju, Kenichi Ogawa
  • Publication number: 20110110217
    Abstract: An objective lens is made of a resin material and focuses incident rays, which have a wavelength of 410 nm or less and are emitted from a light source, on an optical disc at a numerical aperture of 0.8 or more, wherein when a lens tilt sensitivity is defined as an amount of a 3rd-order coma aberration caused per a lens tilt of 1 degree which is an angle formed between an optical axis of the objective lens and a system optical axis of an optical system including the objective lens at 0° C., the lens tilt sensitivity is 130 m?rms/degree or less.
    Type: Application
    Filed: November 2, 2010
    Publication date: May 12, 2011
    Applicant: Sony Corporation
    Inventors: Motoo Aiba, Kouhei Anju
  • Publication number: 20110069598
    Abstract: An objective lens has a numerical aperture of 8.0 or more and focusing a light beam of a wavelength ? of at least 450 nm or less on an optical information recording medium. In this objective lens, a wavefront-aberration deterioration level TOR, accumulative value of aberration deterioration, satisfies the equation (1): TOR=?{square root over (2.52(DCm32+DCm52)+(TSA32+TSA52))}{square root over (2.52(DCm32+DCm52)+(TSA32+TSA52))}?0.07[?rms]??(1) In the equation (1), TSA3 [?rm/?m] and TSA5 [?rm/?m] refer to a third-order thickness sensitivity level and a fifth-order thickness sensitivity level, which are generated when a thickness error from a predetermined thickness is +1 ?m, respectively. DCm3 and DCm5 refer to a third-order decentering sensitivity level and a fifth-order decentering sensitivity level, which are generated when a decentering error of each of lens surfaces is 1 ?m, respectively.
    Type: Application
    Filed: September 13, 2010
    Publication date: March 24, 2011
    Applicant: Sony Corporation
    Inventors: Kouhei Anju, Motoo Aiba
  • Publication number: 20100103801
    Abstract: Provided is an objective lens for which expressions 0.83<(pM/pL)<1.17 and 0.83<(pM/pT)<1.17 or expressions 0.80<(pM/pL)<1.20 and 0.86<(pM/pT)<1.14 are satisfied, where pL is the ratio of fifth-order spherical aberration to third-order spherical aberration, the spherical aberrations being caused by a difference in the thickness of a cover layer of an optical recording medium, pT is the ratio of fifth-order spherical aberration to third-order spherical aberration, the spherical aberrations being caused by a change in the temperature of an environment of the objective lens, and pM is the ratio of fifth-order spherical aberration to third-order spherical aberration, the spherical aberrations being caused by a change in incident magnification.
    Type: Application
    Filed: October 26, 2009
    Publication date: April 29, 2010
    Applicant: Sony Corporation
    Inventors: Motoo Aiba, Kiyoshi Toyota, Hiroyuki Sakakibara, Toyokazu Takahashi, Kouhei Anju, Kenichi Ogawa