Patents by Inventor Kouichi Kamiyama

Kouichi Kamiyama has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 10385076
    Abstract: A surface treatment agent including a compound (?) is provided. The compound (?) has one or more M-OH groups and/or groups capable of forming M-OH (wherein M represents a metal atom), an amino group and a triazine ring; wherein said amino group is bonded to a terminal; one or more said amino groups bonded to the terminal are present; and one or more said triazine rings are present.
    Type: Grant
    Filed: August 8, 2017
    Date of Patent: August 20, 2019
    Assignees: Sulfur Chemical Laboratory, Inc., Meiko Electronics Co., Ltd.
    Inventors: Kunio Mori, Yusuke Matsuno, Katsuhito Mori, Takahiro Kudo, Shuukichi Takii, Shigeru Michiwaki, Manabu Miyawaki, Masanori Yanai, Kouichi Kamiyama, Hitomi Chiba, Yasuyuki Masuda
  • Publication number: 20170334933
    Abstract: A surface treatment agent including a compound (?) is provided. The compound (?) has one or more M-OH groups and/or groups capable of forming M-OH (wherein M represents a metal atom), an amino group and a triazine ring; wherein said amino group is bonded to a terminal; one or more said amino groups bonded to the terminal are present; and one or more said triazine rings are present.
    Type: Application
    Filed: August 8, 2017
    Publication date: November 23, 2017
    Applicants: Sulfur Chemical Laboratory, Inc., Meiko Electronics Co., Ltd.
    Inventors: Kunio MORI, Yusuke MATSUNO, Katsuhito MORI, Takahiro KUDO, Shuukichi TAKII, Shigeru MICHIWAKI, Manabu MIYAWAKI, Masanori YANAI, Kouichi KAMIYAMA, Hitomi CHIBA, Yasuyuki MASUDA
  • Patent number: 9790242
    Abstract: A surface treatment technique having excellent adhering function, excellent reacting function and rich diversity is provided. The surface treatment includes applying a solution containing compound (?) to a substrate and thus providing compound (?) thereon, wherein: the compound (?) is at least one of Formula [IV] and Formula [V]: wherein A is —N(Ra)Rb—Si(Rc)n(ORd)3?n, or —N{Rb—Si(Rc)n(ORd)3?n}2, B is ——N(Re)Rf(NH2)m, or —N{Rf(NH2(m}2, C is A, B, or —N(Rg)Rh, D is Ri and wherein each of Ra, Re, and Rg is independently H or a hydrocarbon group, Rb, Rc, Rd, Rf, Rh, and Ri are hydrocarbon groups, n is 0, 1, or 2, and m is 1 or 2.
    Type: Grant
    Filed: August 31, 2012
    Date of Patent: October 17, 2017
    Assignees: Sulfur Chemical Laboratory, Inc.
    Inventors: Kunio Mori, Yusuke Matsuno, Katsuhito Mori, Takahiro Kudo, Shuukichi Takii, Shigeru Michiwaki, Manabu Miyawaki, Masanori Yanai, Kouichi Kamiyama, Hitomi Chiba, Yasuyuki Masuda
  • Publication number: 20150152124
    Abstract: Provided is a surface treatment technique whereby excellent adhering function, excellent reacting function and rich diversity can be established. A surface treatment method that comprises applying a solution containing compound (?) to a substrate and thus providing compound (?) thereon, wherein: said compound (?) has at least an M-OH group and/or a group capable of forming M-OH (wherein M represents a metal atom), an amino group and a triazine ring; one or more said M-OH groups and/or groups capable of forming M-OH (wherein M represents a metal atom) are present; said amino group is bonded to a terminal; one or more said amino groups bonded to the terminal are present; and one or more said triazine rings are present.
    Type: Application
    Filed: August 31, 2012
    Publication date: June 4, 2015
    Applicants: Sulfur Chemical Laboratory, Inc., Meiko Electronics Co., Ltd.
    Inventors: Kunio Mori, Yusuke Matsuno, Katsuhito Mori, Takahiro Kudo, Shuukichi Takii, Shigeru Michiwaki, Manabu Miyawaki, Masanori Yanai, Kouichi Kamiyama, Hitomi Chiba, Yasuyuki Masuda