Patents by Inventor Kouichi Kodoi
Kouichi Kodoi has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 7470824Abstract: Provided is an adamantane derivative represented by Formula (I) or (II): wherein X represents a halogen atom; Y represents an alkyl group having 1 to 10 carbon atoms, a halogenated alkyl group having 1 to 10 carbon atoms, a halogen atom or a hetero atom-containing group; R1 to R4 represent independently hydrogen, a halogen atom, an alkyl group having 1 to 10 carbon atoms or a halogenated alkyl group having 1 to 10 carbon atoms; m represents an integer of 0 to 15, and n represents an integer of 0 to 10; and excluded is a case where in Formula (I), m and n are 0 at the same time and R3 and R4 are a hydrogen atom at the same time. Capable of being provided is a novel adamantane derivative which is useful as a modifying agent for a resin for a photoresist and a dry etching resistance-improving agent in the photolithography field, agricultural and medical intermediates and other various industrial products.Type: GrantFiled: December 18, 2003Date of Patent: December 30, 2008Assignee: Idemitsu Kosan Co., Ltd.Inventors: Shinji Tanaka, Hidetoshi Ono, Kouichi Kodoi, Naoyoshi Hatakeyama
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Patent number: 7423180Abstract: The invention provides compounds which are excellent in terms of heat resistance, mechanical characteristics, electric characteristics, physical properties, etc. and which provide a novel material useful for, for example, interlayer insulating film or protective film for use in semiconductor devices, interlayer insulating film for use in multilayer wiring boards, cover coating in flexible printed circuits, or a liquid crystal alignment layer. The compounds are bis(3-amino-4-hydroxyphenyl)adamantane derivatives having a structure represented by formula (I) or (II): (each of R1 to R4 represents a halogen atom, a hydroxyl group, an alkyl group, an alkoxyl group, a carboxyl group, or an alkoxycarbonyl group, each of m and a is an integer of 0 to 3, and each of n and b is an integer of 0 to 14, with the proviso that the case where the following three conditions in formula (I) are met is excluded: R2 is methyl and present at a bridgehead; m is 0; and n is 2).Type: GrantFiled: February 26, 2004Date of Patent: September 9, 2008Assignee: Idemitsu Kosan Co., Ltd.Inventors: Shinji Tanaka, Hidetoshi Ono, Kouichi Kodoi, Naoyoshi Hatakeyama
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Patent number: 7402712Abstract: Provided by the present invention are an adamantyl vinyl ether compound which is useful as a monomer for functional resins in the photolithography field or a raw material therefor and medical and agricultural intermediates and a production process for the same. The present invention relates to a production process for an adamantyl vinyl ether compound, characterized by subjecting an adamantyl vinyl ether compound having a specific structure and alcohol having an eliminating group in a ? position to chloroalkyl-etherification, then subjecting it to etherification to form an adamantyl group-containing ether and then subjecting it to vinyl-etherification.Type: GrantFiled: June 8, 2004Date of Patent: July 22, 2008Assignee: Idemitsu Petrochemical Co., Ltd.Inventors: Naoyoshi Hatakeyama, Shinji Tanaka, Hidetoshi Ono, Kouichi Kodoi
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Patent number: 7193106Abstract: Provided are a novel halogenoacetoxyadamantane derivative which is useful as a modifying agent for a resin for a photoresist and a dry etching resistance-improving agent in the photolithography field, agricultural and medical intermediates and a compound for other various industrial products and a process for producing the same. To be specific, provided are a halogenoacetoxyadamantane derivative having a halogenoacetoxy group in an adamantane skeleton and a process for producing a halogenoacetoxyadamantane derivative, comprising the step of reacting a hydroxyl group of an adamantane skeleton with halogenoacetic halide or reacting the above hydroxyl group with a lithiation agent to derive it into a lithiumoxy group and then reacting halogenoacetic halide to introduce a halogenoacetoxy group.Type: GrantFiled: April 28, 2003Date of Patent: March 20, 2007Assignee: Idemitsu Kosan Co., Ltd.Inventors: Kouichi Kodoi, Shinji Tanaka, Toshihide Yoshitome
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Patent number: 7084295Abstract: A perfluoroadamantyl acrylate compound which is highly useful as a raw material for functional resins,etc.;and an intermediate therefore. The perfluoroadamantyl acrylate compound comprises perfluoroadamantane having a CH2?C(R)COO group(wherein R is a hydrogen atom, a methyl group or a trifluoromethyl group) at the 1-position, at each of the 1- and 3-positions, at each of the 1-, 3- and 5-positions, at each of the 1-, 3-, 5- and 7-positions, or at the 2-position.Type: GrantFiled: December 20, 2002Date of Patent: August 1, 2006Assignee: Idemitsu Kosan Co., Ltd.Inventors: Shinji Tanaka, Toshihide Yoshitome, Kouichi Kodoi, Hidetoshi Ono, Naoyoshi Hatakeyama
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Publication number: 20060161016Abstract: The invention provides compounds which are excellent in terms of heat resistance, mechanical characteristics, electric characteristics, physical properties, etc. and which provide a novel material useful for, for example, interlayer insulating film or protective film for use in semiconductor devices, interlayer insulating film for use in multilayer wiring boards, cover coating in flexible printed circuits, or a liquid crystal alignment layer. The compounds are bis(3-amino-4-hydroxyphenyl)adamantane derivatives having a structure represented by formula (I) or (II): (each of R1 to R4 represents a halogen atom, a hydroxyl group, an alkyl group, an alkoxyl group, a carboxyl group, or an alkoxycarbonyl group, each of m and a is an integer of 0 to 3, and each of n and b is an integer of 0 to 14, with the proviso that the case where the following three conditions in formula (I) are met is excluded: R2 is methyl and present at a bridgehead; m is 0; and n is 2).Type: ApplicationFiled: February 26, 2004Publication date: July 20, 2006Inventors: Shinji Tanaka, Hidetoshi Ono, Kouichi Kodoi, Naoyoshi Hatakeyama
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Publication number: 20060149073Abstract: Provided is an adamantane derivative represented by Formula (I) or (II): wherein X represents a halogen atom; Y represents an alkyl group having 1 to 10 carbon atoms, a halogenated alkyl group having 1 to 10 carbon atoms, a halogen atom or a hetero atom-containing group; R1 to R4 represent independently hydrogen, a halogen atom, an alkyl group having 1 to 10 carbon atoms or a halogenated alkyl group having 1 to 10 carbon atoms; m represents an integer of 0 to 15, and n represents an integer of 0 to 10; and excluded is a case where in Formula (I), m and n are 0 at the same time and R3 and R4 are a hydrogen atom at the same time. Capable of being provided is a novel adamantane derivative which is useful as a modifying agent for a resin for a photoresist and a dry etching resistance-improving agent in the photolithography field, agricultural and medical intermediates and other various industrial products.Type: ApplicationFiled: December 18, 2003Publication date: July 6, 2006Applicant: Idemitsu Kosan Co.Inventors: Shinji Tanaka, Hidetoshi Ono, Kouichi Kodoi, Naoyoshi Hatakeyama
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Patent number: 7019183Abstract: It is made possible to efficiently produce adamantane and analogues thereof, namely a hydrocarbon having an adamantane structure by a process which comprises isomerizing a tricyclic saturated hydrocarbon having ten or more carbon atoms in the presence of a solid-acid catalyst containing one or two or more metals selected from among the metals belonging to group VIII in the Periodic Table (group 8 to 12 in the new Periodic Table), wherein one or two or more monocyclic saturated hydrocarbons are added to the tricyclic saturated hydrocarbon having ten or more carbon atoms.Type: GrantFiled: November 26, 2001Date of Patent: March 28, 2006Assignee: Idemitsu Kosan Co., Ltd.Inventors: Akio Kojima, Kouichi Kodoi
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Publication number: 20050258395Abstract: Provided are a novel halogenoacetoxyadamantane derivative which is useful as a modifying agent for a resin for a photoresist and a dry etching resistance-improving agent in the photolithography field, agricultural and medical intermediates and a compound for other various industrial products and a process for producing the same. To be specific, provided are a halogenoacetoxyadamantane derivative having a halogenoacetoxy group in an adamantane skeleton and a process for producing a halogenoacetoxyadamantane derivative, comprising the step of reacting a hydroxyl group of an adamantane skeleton with halogenoacetic halide or reacting the above hydroxyl group with a lithiation agent to derive it into a lithiumoxy group and then reacting halogenoacetic halide to introduce a halogenoacetoxy group.Type: ApplicationFiled: April 28, 2003Publication date: November 24, 2005Applicant: Idemitsu Kosan Co., Ltd.Inventors: Kouichi Kodoi, Shinji Tanaka, Toshihide Yoshitome
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Publication number: 20050131247Abstract: A perfluoroadamantyl acrylate compound which is highly useful as a raw material for functional resins,etc.;and an intermediate therefore. The perfluoroadamantyl acrylate compound comprises perfluoroadamantane having a CH2?C(R)COO group(wherein R is a hydrogen atom, a methyl group or a trifluoromethyl group) at the 1-position, at each of the 1- and 3-positions, at each of the 1-,3- and 5-positions, at each of the 1-,3-,5- and 7-positions, or at the 2-position.Type: ApplicationFiled: December 20, 2002Publication date: June 16, 2005Applicant: IDEMITDU PETROCHEMICAL CO., LTDInventors: Shinji Tanaka, Toshihide Yoshitome, Kouichi Kodoi, Hidetoshi Ono, Naoyoshi Hatakeyama
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Publication number: 20050004391Abstract: Provided by the present invention are an adamantyl vinyl ether compound which is useful as a monomer for functional resins in the photolithography field or a raw material therefor and medical and agricultural intermediates and a production process for the same. The present invention relates to a production process for an adamantyl vinyl ether compound, characterized by subjecting an adamantyl vinyl ether compound having a specific structure and alcohol having an eliminating group in a ? position to chloroalkyl-etherification, then subjecting it to etherification to form an adamantyl group-containing ether and then subjecting it to vinyl-etherification.Type: ApplicationFiled: June 8, 2004Publication date: January 6, 2005Applicant: IDEMITSU PETROCHEMICAL CO., LTD.Inventors: Naoyoshi Hatakeyama, Shinji Tanaka, Hidetoshi Ono, Kouichi Kodoi
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Patent number: 6833388Abstract: There is provided a trisadamantane based compound which is useful not only as a photoresist additive but also as pharmaceuticals, an agrochemical intermediate, a resin additive (heat resistance improver) and the like, and which is represented by the general formula (I): wherein R1 and R2 are each an alkyl group having 1 to 8 carbon atoms; X1 and X2 are each hydrogen atom, a halogen atom, an alkyl group having 1 to 8 carbon atoms, hydroxyl group, an alkoxy group having 1 to 8 carbon atoms, carboxyl group or COOR3 in which R3 is an alkyl group having 1 to 8 carbon atoms.Type: GrantFiled: December 17, 2003Date of Patent: December 21, 2004Assignee: Idemitsu Petrochemical Co., Ltd.Inventors: Shinji Tanaka, Toshihide Yoshitome, Takashi Nakagawa, Kouichi Kodoi
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Publication number: 20040157923Abstract: There is provided a trisadamantane based compound which is useful not only as a photoresist additive but also as pharmaceuticals, an agrochemical intermediate, a resin additive (heat resistance improver) and the like, and which is represented by the general formula (I) 1Type: ApplicationFiled: December 17, 2003Publication date: August 12, 2004Inventors: Shinji Tanaka, Toshihide Yoshitome, Takashi Nakagawa, Kouichi Kodoi
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Publication number: 20030023122Abstract: It is made possible to efficiently produce adamantane and analogues thereof, namely a hydrocarbon having an adamantane structure by a process which comprises isomerizing a tricyclic saturated hydrocarbon having ten or more carbon atoms in the presence of a solid-acid catalyst containing one or two or more metals selected from among the metals belonging to group VIII in the Periodic Table (group 8 to 12 in the new Periodic Table), wherein one or two or more monocyclic saturated hydrocarbons are added to the tricyclic saturated hydrocarbon having ten or more carbon atoms.Type: ApplicationFiled: August 7, 2002Publication date: January 30, 2003Inventors: Akio Kojima, Kouichi Kodoi
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Publication number: 20030018226Abstract: There is provided a process for producing adamantane and analogues thereof, namely a hydrocarbon having an adamantane structure which process comprises isomerizing a tricyclic saturated hydrocarbon having ten or more carbon atoms in the presence of a catalyst in which one or two or more metals selected from among the metals belonging to group VIII in the Periodic Table (group 8 to 10 in the new Periodic Table) are supported on zeolite by means of an ion exchange method. It is made possible by the above process to efficiently produce adamantane and analogues thereof in the presence of a solid catalyst without the use of hydrogen chloride.Type: ApplicationFiled: August 6, 2002Publication date: January 23, 2003Inventors: Akio Kojima, Kouichi Kodoi, Shunji Tsuruta, Masamitsu Ogata