Patents by Inventor Kouichi Miyazawa

Kouichi Miyazawa has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Method of developing a resist film and a resist development processor
    Patent number: 7179000
    Abstract: The present invention provides a resist development processor consisting of a development processing chamber for storing a resist substrate having an exposed resist on the substrate and for developing the exposed resist by means of a development solvent consisting of a supercritical fluid; and a supercritical fluid container for storing a supercritical fluid, where the supercritical fluid container is connected to the development processing chamber through a valve.
    Type: Grant
    Filed: February 23, 2006
    Date of Patent: February 20, 2007
    Assignee: Hitachi Science Systems, Ltd.
    Inventors: Hisayuki Takasu, Kouichi Miyazawa, Toru Iwaya
  • Method of developing a resist film and a resist development processor
    Publication number: 20060140624
    Abstract: The present invention provides a resist development processor consisting of a development processing chamber for storing a resist substrate having an exposed resist on the substrate and for developing the exposed resist by means of a development solvent consisting of a supercritical fluid; and a supercritical fluid container for storing a supercritical fluid, where the supercritical fluid container is connected to the development processing chamber through a valve.
    Type: Application
    Filed: February 23, 2006
    Publication date: June 29, 2006
    Inventors: Hisayuki Takasu, Kouichi Miyazawa, Toru Iwaya
  • Method of developing a resist film and a resist development processor
    Patent number: 7033089
    Abstract: The present invention provides a resist development processor consisting of a development processing chamber for storing a resist substrate having an exposed resist on the substrate and for developing the exposed resist by means of a development solvent consisting of a supercritical fluid; and a supercritical fluid container for storing a supercritical fluid, where the supercritical fluid container is connected to the development processing chamber through a valve.
    Type: Grant
    Filed: November 13, 2003
    Date of Patent: April 25, 2006
    Assignee: Hitachi Science Systems, Ltd.
    Inventors: Hisayuki Takasu, Kouichi Miyazawa, Toru Iwaya
  • Method of developing a resist film and a resist development processor
    Publication number: 20040096210
    Abstract: The present invention provides a resist development processor consisting of a development processing chamber for storing a resist substrate having an exposed resist on the substrate and for developing the exposed resist by means of a development solvent consisting of a supercritical fluid; and a supercritical fluid container for storing a supercritical fluid, where the supercritical fluid container is connected to the development processing chamber through a valve.
    Type: Application
    Filed: November 13, 2003
    Publication date: May 20, 2004
    Inventors: Hisayuki Takasu, Kouichi Miyazawa, Toru Iwaya