Patents by Inventor Kouichi Urano

Kouichi Urano has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 9608262
    Abstract: A silicon composite comprises silicon particles whose surface is at least partially coated with a silicon carbide layer. It is prepared by subjecting a silicon powder to thermal CVD with an organic hydrocarbon gas and/or vapor at 900-1,400° C., and heating the powder for removing an excess free carbon layer from the surface through oxidative decomposition.
    Type: Grant
    Filed: March 2, 2015
    Date of Patent: March 28, 2017
    Assignee: Shin-Etsu Chemical Co., Ltd.
    Inventors: Mikio Aramata, Satoru Miyawaki, Hirofumi Fukuoka, Kazuma Momii, Kouichi Urano
  • Publication number: 20150171425
    Abstract: A silicon composite comprises silicon particles whose surface is at least partially coated with a silicon carbide layer. It is prepared by subjecting a silicon powder to thermal CVD with an organic hydrocarbon gas and/or vapor at 900-1,400° C., and heating the powder for removing an excess free carbon layer from the surface through oxidative decomposition.
    Type: Application
    Filed: March 2, 2015
    Publication date: June 18, 2015
    Applicant: Shin-Etsu Chemical Co., Ltd.
    Inventors: Mikio ARAMATA, Satoru MIYAWAKI, Hirofumi FUKUOKA, Kazuma MOMII, Kouichi URANO
  • Publication number: 20110001097
    Abstract: A silicon composite comprises silicon particles whose surface is at least partially coated with a silicon carbide layer. It is prepared by subjecting a silicon powder to thermal CVD with an organic hydrocarbon gas and/or vapor at 900-1,400° C., and heating the powder for removing an excess free carbon layer from the surface through oxidative decomposition.
    Type: Application
    Filed: September 16, 2010
    Publication date: January 6, 2011
    Applicant: Shin-Etsu Chemical Co., Ltd.
    Inventors: Mikio ARAMATA, Satoru Miyawaki, Hirofumi Fukuoka, Kazuma Momii, Kouichi Urano
  • Patent number: 7790316
    Abstract: Silicon composite particles are prepared by sintering primary fine particles of silicon, silicon alloy or silicon oxide together with an organosilicon compound. Sintering of the organosilicon compound results in a silicon-base inorganic compound which serves as a binder. Each particle has the structure that silicon or silicon alloy fine particles are dispersed in the silicon-base inorganic compound binder, and voids are present within the particle.
    Type: Grant
    Filed: March 22, 2005
    Date of Patent: September 7, 2010
    Assignee: Shin-Etsu Chemical Co., Ltd.
    Inventors: Mikio Aramata, Satoru Miyawaki, Hirofumi Fukuoka, Kazuma Momii, Kouichi Urano
  • Patent number: 7664564
    Abstract: A setting area is stored in association with the external shape of a knitted fabric, and the setting area is altered as the external shape is altered. A unit pattern is vertically copied repeatedly in the setting area. When setting patterns exist on both sides of the boundary between front and rear knitted fabrics, the boundary being a start point of circumferential formation, the setting pattern on the start section side is shifted upward by one course. The range for providing the setting pattern therein can be altered automatically when the external shape of the knitted fabric is altered. Furthermore, the setting pattern does not become discontinuous in a course direction at the boundary between the front and rear knitted fabrics.
    Type: Grant
    Filed: February 6, 2006
    Date of Patent: February 16, 2010
    Assignee: Shima Seiki Manufacturing, Ltd.
    Inventors: Junko Kawasaki, Kouichi Urano
  • Publication number: 20090019895
    Abstract: A setting area is stored in association with the external shape of a knitted fabric, and the setting area is altered as the external shape is altered. A unit pattern is vertically copied repeatedly in the setting area. When setting patterns exist on both sides of the boundary between front and rear knitted fabrics, the boundary being a start point of circumferential formation, the setting pattern on the start section side is shifted upward by one course. The range for providing the setting pattern therein can be altered automatically when the external shape of the knitted fabric is altered. Furthermore, the setting pattern does not become discontinuous in a course direction at the boundary between the front and rear knitted fabrics.
    Type: Application
    Filed: February 6, 2006
    Publication date: January 22, 2009
    Applicant: Shima Seiki Manufacturing , Ltd.
    Inventors: Junko Kawasaki, Kouichi Urano
  • Publication number: 20060003227
    Abstract: A silicon composite comprises silicon particles whose surface is at least partially coated with a silicon carbide layer. It is prepared by subjecting a silicon powder to thermal CVD with an organic hydrocarbon gas and/or vapor at 900-1,400° C., and heating the powder for removing an excess free carbon layer from the surface through oxidative decomposition.
    Type: Application
    Filed: June 27, 2005
    Publication date: January 5, 2006
    Applicant: Shin-Etsu Chemical Co., Ltd.
    Inventors: Mikio Aramata, Satoru Miyawaki, Hirofumi Fukuoka, Kazuma Momii, Kouichi Urano
  • Publication number: 20050214644
    Abstract: Silicon composite particles are prepared by sintering primary fine particles of silicon, silicon alloy or silicon oxide together with an organosilicon compound. Sintering of the organosilicon compound results in a silicon-base inorganic compound which serves as a binder. Each particle has the structure that silicon or silicon alloy fine particles are dispersed in the silicon-base inorganic compound binder, and voids are present within the particle.
    Type: Application
    Filed: March 22, 2005
    Publication date: September 29, 2005
    Applicant: Shin-Etsu Chemical Co., Ltd.
    Inventors: Mikio Aramata, Satoru Miyawaki, Hirofumi Fukuoka, Kazuma Momii, Kouichi Urano
  • Patent number: 6936192
    Abstract: A resistive paste is made by a mixture of a conductive metal powder which is made by mixing 85 to 94 percent by weight of copper powder, 5 to 10 percent by weight of manganese powder, and 1 to 5 percent by weight of tin powder; a mixture of 3 to 7 percent by weight of glass powder and 3 to 7 percent by weight of copper-oxide powder relative to the entire amount of said conductive metal powder; and 7 to 15 percent by weight of vehicle relative to the entire amount of the conductive metal powder and the mixture. The resistive paste is then sintered, and the resistive composition having the low resistance value and low TCR may be obtained. In addition, a resistor is made by forming the resistive element upon a substrate.
    Type: Grant
    Filed: September 17, 2003
    Date of Patent: August 30, 2005
    Assignee: Koa Kabushiki Kaisha
    Inventor: Kouichi Urano
  • Patent number: 6889530
    Abstract: A method of forming gussets in armpits of knitwear in the process of joining together sleeves and a body of the knitwear to form a tubular body, while reducing the tubular body in diameter from the underarms toward the shoulders to form armholes.
    Type: Grant
    Filed: September 30, 2002
    Date of Patent: May 10, 2005
    Inventors: Kouichi Urano, Hiroko Ochiai
  • Publication number: 20050028562
    Abstract: A method of forming gussets in armpits of knitwear in the process of joining together sleeves and a body of the knitwear to form a tubular body, while reducing the tubular body in diameter from the underarms toward the shoulders to form armholes.
    Type: Application
    Filed: September 30, 2002
    Publication date: February 10, 2005
    Inventors: Kouichi Urano, Hiroko Ochiai
  • Publication number: 20040061096
    Abstract: A resistive paste is made by a mixture of a conductive metal powder which is made by mixing 85 to 94 percent by weight of copper powder, 5 to 10 percent by weight of manganese powder, and 1 to 5 percent by weight of tin powder; a mixture of 3 to 7 percent by weight of glass powder and 3 to 7 percent by weight of copper-oxide powder relative to the entire amount of said conductive metal powder; and 7 to 15 percent by weight of vehicle relative to the entire amount of the conductive metal powder and the mixture. The resistive paste is then sintered, and the resistive composition having the low resistance value and low TCR may be obtained. In addition, a resistor is made by forming the resistive element upon a substrate.
    Type: Application
    Filed: September 17, 2003
    Publication date: April 1, 2004
    Inventor: Kouichi Urano