Patents by Inventor Kouichiro Tani

Kouichiro Tani has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 11174879
    Abstract: An industrial ejector includes: a Laval nozzle in which a first channel which has a throat and along which a fluid flows in a first direction is formed; and a main body which is formed in a tubular shape, in which the Laval nozzle disposed therein is fixed to a part of an inner surface thereof, and in which a second channel is formed between the rest of the inner surface and the Laval nozzle. The second channel is disposed at a first side with respect to the first channel in a second direction perpendicular to the first direction. An opening is obliquely cut and formed in an end of the first channel at a downstream side and inclined toward the first side in the downstream direction and then toward the second channel.
    Type: Grant
    Filed: September 6, 2019
    Date of Patent: November 16, 2021
    Inventors: Susumu Hasegawa, Kouichiro Tani
  • Publication number: 20200080572
    Abstract: An ejector includes: a Laval nozzle in which a first channel which has a throat and along which a fluid flows in a first direction is formed; and a main body which is formed in a tubular shape, in which the Laval nozzle disposed therein is fixed to a part of an inner surface thereof, and in which a second channel is formed between the rest of the inner surface and the Laval nozzle. The second channel is disposed at a first side with respect to the first channel in a second direction perpendicular to the first direction, and an opening formed in an end of the first channel at a downstream side is inclined to be approaching to the first side toward the downstream side.
    Type: Application
    Filed: September 6, 2019
    Publication date: March 12, 2020
    Inventors: Susumu HASEGAWA, Kouichiro TANI
  • Patent number: 6834493
    Abstract: Cavitation is reduced in a rotary pump while the pump performance is maintained by utilizing a low-temperature fluid source already present in the pump system. The fluid from the low-temperature fluid source receives heat from the fluid flowing to the pump, thereby lowering its temperature and the saturated vapor pressure, which increases the allowable margin for a decrease in fluid pressure and reduces the occurrence of cavitation. The pump system may be used for a liquid rocket engine. The fluid velocity of the fluid directed to the pump is low before releasing heat, so there is only a slight pressure loss at the pump. Accordingly, the temperature is lowered and the occurrence of cavitation is reduced within the pump.
    Type: Grant
    Filed: July 17, 2002
    Date of Patent: December 28, 2004
    Assignee: National Aerospace Laboratory of Japan
    Inventors: Tomoyuki Hashimoto, Mitsuo Watanabe, Takeshi Kanda, Satoshi Hasegawa, Kenji Kudo, Athuo Murakami, Kouichiro Tani
  • Publication number: 20030014965
    Abstract: The occurrence of cavitation is reduced in a rotary pump while the pump performance is maintained. A low-temperature source present in the pump system is utilized, and heat exchange with the fluid flowing to the pump is performed with this low-temperature source, thereby lowering the temperature of the fluid flowing into the pump and lowering the saturated vapor pressure of this fluid, which increases the allowable margin for a decrease in the pressure of the fluid and reduces the occurrence of cavitation. In the case of a liquid rocket engine, a coolant or another propellant B whose temperature is lower than that of the primary propellant A can be employed as this low-temperature source. The propellant B is passed through a heat exchanger 2 by a pump 4, which results in heat exchange with the propellant A from a tank 3, and lowers the fluid temperature. Since the fluid velocity of the propellant A is low at the time of this inflow, there is only slight pressure loss inside the heat exchanger 2.
    Type: Application
    Filed: July 17, 2002
    Publication date: January 23, 2003
    Applicant: National Aerospace Laboratory of Japan
    Inventors: Tomoyuki Hashimoto, Mitsuo Watanabe, Takeshi Kanda, Satoshi Hasegawa, Kenji Kudo, Athuo Murakami, Kouichiro Tani