Patents by Inventor Kouji Kawada
Kouji Kawada has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Publication number: 20190360887Abstract: A fluid controller is provided having a flow path through which a fluid can flow, a closed space separated from the flow path by an isolation member, and a leak port capable of communicating the closed space with an external part. An anomaly detection device for detecting an anomalty has a pressure sensor detachably fixed to the leak port, a pressure sensor for detecting the pressure in the closed space, a processing module for executing a predetermined information processing, and an detachable mechanism for blocking the leak port from the external part in the state of being fixed. The processing module determines an anomaly of the fluid controller by comparing a detection value detected by the pressure sensor to a predetermined threshold, and transmits a discrimination result of the anomaly of the fluid controller to a server.Type: ApplicationFiled: February 6, 2018Publication date: November 28, 2019Applicant: Fujikin IncorporatedInventors: Akihiro Harada, Kouji Nishino, Ryousuke Doi, Kouji Kawada, Katsuyuki Sugita, Shinichi Ikeda, Michio Yamaji, Tsutomu Shinohara, Ryutaro Tanno, Yuto Kawauchi
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Patent number: 7815872Abstract: A reactor for generating moisture, with which hydrogen and oxygen fed into the reactor contact with a platinum coating catalyst layer to activate reactivity so that hydrogen and oxygen react under conditions of non-combustion, wherein the reactor includes a cooler comprising a heat dissipation body substrate in which a heater insertion hole is made in the center to fix to the outer surface of the reactor structural component on the outlet side and a cooler on the outlet side made up of a plural number of heat dissipation bodies installed vertically in parallel on the part excluding the area where the afore-mentioned heater insertion hole of the heat dissipation body substrate exists, and a part of the heater to heat the reactor is inserted in the heater insertion hole so as to fix to the outer surface of the reactor structural component on the outlet side.Type: GrantFiled: July 4, 2005Date of Patent: October 19, 2010Assignee: Fujikin IncorporatedInventors: Toshirou Nariai, Kouji Kawada, Keiji Hirao, Yukio Minami, Akihiro Morimoto, Nobukazu Ikeda
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Patent number: 7553459Abstract: A safe, reduced pressure apparatus for generating water vapor from hydrogen and oxygen and feeding high purity moisture to processes such as semiconductor production. The apparatus eliminates the possibility of the gas igniting by maintaining the internal pressure of the catalytic reactor for generating moisture at a high level while supplying moisture gas from the reactor under reduced pressure. A heat dissipation reactor improvement substantially increases moisture generation without being an enlargement in size by efficient cooling of the reactor alumite-treated fins.Type: GrantFiled: July 26, 2006Date of Patent: June 30, 2009Assignees: Fujikin IncorporatedInventors: Tadahiro Ohmi, Nobukazu Ikeda, Yukio Minami, Kouji Kawada, Katunori Komehana, Teruo Honiden, Touru Hirai, Akihiro Morimoto, Toshirou Nariai, Keiji Hirao, Masaharu Taguchi, Osamu Nakamura
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Publication number: 20080241022Abstract: A reactor for generating moisture, with which hydrogen and oxygen fed into the reactor contact with a platinum coating catalyst layer to activate reactivity so that hydrogen and oxygen react under conditions of non-combustion, wherein the reactor includes a cooler comprising a heat dissipation body substrate in which a heater insertion hole is made in the center to fix to the outer surface of the reactor structural component on the outlet side and a cooler on the outlet side made up of a plural number of heat dissipation bodies installed vertically in parallel on the part excluding the area where the afore-mentioned heater insertion hole of the heat dissipation body substrate exists, and a part of the heater to heat the reactor is inserted in the heater insertion hole so as to fix to the outer surface of the reactor structural component on the outlet side.Type: ApplicationFiled: July 4, 2005Publication date: October 2, 2008Applicant: FUJIKIN INCORPORATEDInventors: Toshirou Nariai, Kouji Kawada, Keiji Hirao, Yukio Minami, Akihiro Morimoto, Nobukazu Ikeda
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Patent number: 7368092Abstract: A safe, reduced pressure apparatus for generating water vapor from hydrogen and oxygen and feeding high purity moisture to processes such as semiconductor production. The apparatus eliminates the possibility of the gas igniting by maintaining the internal pressure of the catalytic reactor for generating moisture at a high level while supplying moisture gas from the reactor under reduced pressure. A heat dissipation reactor improvement substantially increases moisture generation without being an enlargement in size by efficient cooling of the reactor alumite-treated fins.Type: GrantFiled: December 1, 2003Date of Patent: May 6, 2008Assignees: Fujikin IncorporatedInventors: Tadahiro Ohmi, Nobukazu Ikeda, Yukio Minami, Kouji Kawada, Katunori Komehana, Teruo Honiden, Touru Hirai, Akihiro Morimoto, Toshirou Nariai, Keiji Hirao, Masaharu Taguchi, Osamu Nakamura
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Publication number: 20070231225Abstract: A safe, reduced pressure apparatus for generating water vapor from hydrogen and oxygen and feeding high purity moisture to processes such as semiconductor production. The apparatus eliminates the possibility of the gas igniting by maintaining the internal pressure of the catalytic reactor for generating moisture at a high level while supplying moisture gas from the reactor under reduced pressure. A heat dissipation reactor improvement substantially increases moisture generation without being an enlargement in size by efficient cooling of the reactor alumite-treated fins.Type: ApplicationFiled: June 8, 2007Publication date: October 4, 2007Applicants: FUJIKIN INCORPORATED, Tadahiro OHMIInventors: Tadahiro Ohmi, Nobukazu Ikeda, Yukio Minami, Kouji Kawada, Katunori Komehana, Teruo Honiden, Touru Hirai, Akihiro Morimoto, Toshirou Nariai, Keiji Hirao, Masaharu Taguchi, Osamu Nakamura
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Patent number: 7258845Abstract: A safe, reduced pressure apparatus for generating water vapor from hydrogen and oxygen and feeding high purity moisture to processes such as semiconductor production. The apparatus eliminates the possibility of the gas igniting by maintaining the internal pressure of the catalytic reactor for generating moisture at a high level while supplying moisture gas from the reactor under reduced pressure. A heat dissipation reactor improvement substantially increases moisture generation without being an enlargement in size by efficient cooling of the reactor alumite-treated fins.Type: GrantFiled: February 2, 2001Date of Patent: August 21, 2007Assignee: Fujikin IncorporatedInventors: Tadahiro Ohmi, Nobukazu Ikeda, Yukio Minami, Kouji Kawada, Katunori Komehana, Teruo Honiden, Touru Hirai, Akihiro Morimoto, Toshirou Nariai, Keiji Hirao, Masaharu Taguchi, Osamu Nakamura
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Publication number: 20060292047Abstract: A safe, reduced pressure apparatus for generating water vapor from hydrogen and oxygen and feeding high purity moisture to processes such as semiconductor production. The apparatus eliminates the possibility of the gas igniting by maintaining the internal pressure of the catalytic reactor for generating moisture at a high level while supplying moisture gas from the reactor under reduced pressure. A heat dissipation reactor improvement substantially increases moisture generation without being an enlargement in size by efficient cooling of the reactor alumite-treated fins.Type: ApplicationFiled: July 26, 2006Publication date: December 28, 2006Applicant: FUJIKIN INCORPORATEDInventors: Tadahiro Ohmi, Nobukazu Ikeda, Yukio Minami, Kouji Kawada, Katunori Komehana, Teruo Honiden, Touru Hirai, Akihiro Morimoto, Toshirou Nariai, Keiji Hirao, Masaharu Taguchi, Osamu Nakamura
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Patent number: 7008598Abstract: A reactor for generating moisture wherein ignition of hydrogen gas, backfire to the gas supply source side, the peeling off of the platinum coat catalyst layer inside are prevented more completely to further increase the safety of the reactor for generating moisture and wherein the dead space in the interior space is reduced to further reduce the size of the reactor shell.Type: GrantFiled: July 7, 2004Date of Patent: March 7, 2006Assignees: Fujikin Incorporated, Tadahiro OHMIInventors: Tadahiro Ohmi, Kouji Kawada, Nobukazu Ikeda, Akihiro Morimoto, Yukio Minami, Kenji Tubota, Teruo Honiden, Touru Hirai, Katunori Komehana, Keiji Hirao
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Patent number: 6919056Abstract: A reactor for generating moisture wherein ignition of hydrogen gas, backfire to the gas supply source side, and the peeling off of the platinum coat catalyst layer inside are all prevented more completely to further increase the safety of the reactor for generating moisture, and wherein the dead space in the interior space is reduced to further reduce the size of the reactor shell. The reactor has a reactor shell A with an interior space; a reflector on an inlet side facing a gas feed port in the interior space of the reactor; a reflector on an outlet side facing a moisture gas take-out port in the interior space; and a platinum coat catalyst layer 8 formed on an inside wall of a reactor structural component on the outlet side. Hydrogen and oxygen fed into the interior space of the reactor react without combustion.Type: GrantFiled: July 12, 2001Date of Patent: July 19, 2005Assignees: Fujikin IncorporatedInventors: Tadahiro Ohmi, Kouji Kawada, Nobukazu Ikeda, Akihiro Morimoto, Yukio Minami, Kenji Tubota, Teruo Honiden, Touru Hirai, Katunori Komehana, Keiji Hirao
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Publication number: 20040247502Abstract: A reactor for generating moisture wherein ignition of hydrogen gas, backfire to the gas supply source side, the peeling off of the platinum coat catalyst layer inside are prevented more completely to further increase the safety of the reactor for generating moisture and wherein the dead space in the interior space is reduced to further reduce the size of the reactor shell.Type: ApplicationFiled: July 7, 2004Publication date: December 9, 2004Applicant: Fujikin IncorporatedInventors: Tadahiro Ohmi, Kouji Kawada, Nobukazu Ikeda, Akihiro Morimoto, Yukio Minami, Kenji Tubota, Teruo Honiden, Touru Hirai, Katunori Komehana, Keiji Hirao
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Publication number: 20040137744Abstract: A safe, reduced pressure apparatus for generating water vapor from hydrogen and oxygen and feeding high purity moisture to processes such as semiconductor production. The apparatus eliminates the possibility of the gas igniting by maintaining the internal pressure of the catalytic reactor for generating moisture at a high level while supplying moisture gas from the reactor under reduced pressure. A heat dissipation reactor improvement substantially increases moisture generation without being an enlargement in size by efficient cooling of the reactor alumite-treated fins.Type: ApplicationFiled: December 1, 2003Publication date: July 15, 2004Applicants: Fujikin Incorporated, Tadahiro OHMIInventors: Tadahiro Ohmi, Nobukazu Ikeda, Yukio Minami, Kouji Kawada, Katunori Komehana, Teruo Honiden, Touru Hirai, Akihiro Morimoto, Toshirou Nariai, Keiji Hirao, Masaharu Taguchi, Osamu Nakamura
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Patent number: 6622543Abstract: A gas detection sensor permits precise measurement of the concentration of flammable gas in a detection or subject gas and the concentration of oxygen in a detection gas containing flammable gases. In the sensor, the heating of the sensor by contact catalytic reaction of flammable gas gives off a detection signal of the flammable gas. The gas detection sensor has a first detection sensor including a diaphragm having a platinum coat on a side which the flowing detection gas comes in contact with, and a thermocouple having respective ends of two different metals placed close to each other and fixed on the side of the diaphragm not coming in contact with the flowing detection gas and which is heated by the contact catalytic reaction of flammable gas. A second detection sensor similar to the first detection sensor detects the temperature of the flowing detection gas.Type: GrantFiled: November 15, 2001Date of Patent: September 23, 2003Assignees: Fujikin IncorporatedInventors: Tadahiro Ohmi, Kouji Kawada, Nobukazu Ikeda, Akihiro Morimoto, Yukio Minami, Katunori Komehana, Teruo Honiden
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Publication number: 20020122758Abstract: A safe, reduced pressure apparatus for generating water vapor from hydrogen and oxygen and feeding high purity moisture to processes such as semiconductor production. The apparatus eliminates the possibility of the gas igniting by maintaining the internal pressure of the catalytic reactor for generating moisture at a high level while supplying moisture gas from the reactor under reduced pressure. A heat dissipation reactor improvement substantially increases moisture generation without being an enlargement in size by efficient cooling of the reactor alumite-treated fins.Type: ApplicationFiled: February 2, 2001Publication date: September 5, 2002Inventors: Tadahiro Ohmi, Nobukazu Ikeda, Yukio Minami, Kouji Kawada, Katunori Komehana, Teruo Honiden, Touru Hirai, Akihiro Morimoto, Toshirou Nariai, Keiji Hirao, Masaharu Taguchi, Osamu Nakamura
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Patent number: 6387158Abstract: A method of removing moisture efficiently in the gas supply system by evacuation at normal temperature without using the baking method. The method involves flowing a gas to remove moisture in the gas supply system with the flow pressure of the gas to remove moisture set at not lower than a minimum pressure at which the gas flow becomes viscous and not higher than a water saturated vapor pressure at a flow temperature of the gas to remove moisture. The gas to remove moisture achieves a viscous flow when a mean free path of gas molecules is smaller than a diameter of piping of the gas supply system. If the gas for removing moisture is evacuated at normal temperature under such conditions, the adsorbed moisture on an inside surface of the piping and in the valves and filters can be removed effectively.Type: GrantFiled: May 4, 2001Date of Patent: May 14, 2002Assignee: Fujikin IncorporatedInventors: Nobukazu Ikeda, Akihiro Morimoto, Yukio Minami, Teruo Honiden, Kouji Kawada, Katunori Komehana, Touru Hirai, Michio Yamaji
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Publication number: 20020000161Abstract: A method of removing moisture efficiently in the gas supply system by evacuation at normal temperature without using the baking method. The method involves flowing a gas to remove moisture in the gas supply system with the flow pressure of the gas to remove moisture set at not lower than a minimum pressure at which the gas flow becomes viscous and not higher than a water saturated vapor pressure at a flow temperature of the gas to remove moisture. The gas to remove moisture achieves a viscous flow when a mean free path of gas molecules is smaller than a diameter of piping of the gas supply system. If the gas for removing moisture is evacuated at normal temperature under such conditions, the adsorbed moisture on an inside surface of the piping and in the valves and filters can be removed effectively.Type: ApplicationFiled: May 4, 2001Publication date: January 3, 2002Inventors: Nobukazu Ikeda, Akihiro Morimoto, Yukio Minami, Teruo Honiden, Kouji Kawada, Katunori Komehana, Touru Hirai, Michio Yamaji
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Publication number: 20010048907Abstract: A reactor for generating moisture wherein ignition of hydrogen gas, backfire to the gas supply source side, the peeling off of the platinum coat catalyst layer inside are prevented more completely to further increase the safety of the reactor for generating moisture and wherein the dead space in the interior space is reduced to further reduce the size of the reactor shell.Type: ApplicationFiled: July 12, 2001Publication date: December 6, 2001Applicant: Fujikin IncorporatedInventors: Tadahiro Ohmi, Kouji Kawada, Nobukazu Ikeda, Akihiro Morimoto, Yukio Minami, Kenji Tubota, Teruo Honiden, Touru Hirai, Katunori Komehana, Keiji Hirao