Abstract: This glass bonding material (21) is made of a cladding material (1) in which at least a first layer (11) made of an Al-based alloy and configured to be bonded to glass and a second layer (12) made of an Fe—Ni based alloy having a thermal expansion coefficient from 30° C. to 400° C. of 11.5×10?6 (K?1) or less are bonded.

Abstract: This glass bonding material (21) is made of a cladding material (1) in which at least a first layer (11) made of an Al-based alloy and configured to be bonded to glass and a second layer (12) made of an Fe—Ni based alloy having a thermal expansion coefficient from 30° C. to 400° C. of 11.5×10?6 (K?1) or less are bonded.

Abstract: The present invention provides a percutaneous absorption formulation including a patch having an adhesive layer disposed on a substrate and the adhesive layer contains ketotifen fumarate and tris(hydroxymethyl)aminomethane, and the patch is packaged in a hygroscopic packaging material. In the percutaneous absorption formulation, tris(hydroxymethyl)aminomethane particularly selected from various basic substances is incorporated, and by packaging the patch in a hygroscopic packaging material, the percutaneous absorptivity and content stability of a drug can be simultaneously improved and the yellowing of the drug can be suppressed. These effects can be further improved by the incorporation of propyl gallate, the use of an adhesive layer including an SIS-based adhesive base and a rosin ester-based adhesion imparting resin, and/or the removal of oxygen from the atmosphere in the inside of the packaging material.

Abstract: A tamsulosin-containing transdermal patch. A transdermal patch comprising a backing-layer and an adhesive layer on the backing-layer, characterized in that the adhesive layer contains an acrylic adhesive, further contains tamsulosin as an active ingredient in an amount of 0.1 to 20% by mass of the total mass of the adhesive layer and, if desired, a polyoxyethylene alkyl ether which is an additive playing a role in increasing solubility and a propylene glycol fatty acid ester which is an additive playing a role in promoting percutaneous absorption is provided. Further, a transdermal patch comprising a backing-layer and an adhesive layer on the backing-layer, characterized in that the adhesive layer contains a synthetic rubber adhesive, further contains tamsulosin as an active ingredient in an amount of 0.1 to 20% by mass of the total mass of the adhesive layer and a propylene glycol fatty acid ester which is an additive playing a role in promoting percutaneous absorption is provided.

Abstract: A chemical mechanical polishing pad which can be advantageously used for the polishing of a metal film or the polishing of an insulating film, provides a flat polished surface, enables slurry to be efficiently removed, has sufficiently long service life, can provide a high polishing rate and has the effect of reducing the number of scratches. This polishing pad has one or more grooves on its polishing surface, wherein the groove(s) is/are formed in the polishing surface in such a manner that it/they intersect(s) a single virtual straight line extending from the center portion toward the peripheral portion of the polishing surface a plurality of times and has/have a width of 0.1 to 1.5 mm and a depth of 0.9 to 9.8 mm, the shortest distance between adjacent intersections between it/them and the virtual straight line is 0.3 to 2.0 mm, and the ratio of the depth of the groove(s) to the thickness of the polishing pad is 1/7 to 1/1.1.

Abstract: A chemical mechanical polishing pad which can be advantageously used for the polishing of a metal film or the polishing of an insulating film, provides a flat polished surface, enables slurry to be efficiently removed, has sufficiently long service life, can provide a high polishing rate and has the effect of reducing the number of scratches. This polishing pad has one or more grooves on its polishing surface, wherein the groove(s) is/are formed in the polishing surface in such a manner that it/they intersect(s) a single virtual straight line extending from the center portion toward the peripheral portion of the polishing surface a plurality of times and has/have a width of 0.1 to 1.5 mm and a depth of 0.9 to 9.8 mm, the shortest distance between adjacent intersections between it/them and the virtual straight line is 0.3 to 2.0 mm, and the ratio of the depth of the groove(s) to the thickness of the polishing pad is 1/7 to 1/1.1.

Abstract: A chemical mechanical polishing pad comprising a water-insoluble matrix which comprises (A) a styrene polymer and (B) a diene polymer. A method for producing the above chemical mechanical polishing pad, the method comprising the steps of preparing a composition comprising (A) a styrene polymer, (B) a diene polymer and (C) a crosslinking agent, shaping the above composition into a predetermined shape, and heating the composition during or after shaping to cure it. A chemical mechanical polishing process which comprises polishing a surface to be polished of an object to be polished by use of the chemical mechanical polishing pad. According to the present invention, it is possible to provide a chemical mechanical polishing pad which can be suitably applied to polishing of metal film and insulation film, particularly to an STI technique, provides a flat polished surface, can provide a high polishing rate and has a satisfactory useful life.

Abstract: A storage section 18, a communicating section 22, an openable section 20, and a discharged section are provided. Regions of container walls 12a (12b) that form an opening 21 to be formed by tearing the openable section 20 are approchable each other, and regions of the container walls 12a (12b) that form the communicating section 22 are approchable each other. When the regions of the container walls 12a (12b) that form the opening 21 are separated from each other over the entire width thereof, the regions of the container walls 12a (12b) that form the communicating section 22 can be separated from each other. Seal sheets 28a (28b) are respectively joined to the regions of the container walls 12a (12b) that form the communicating section 22. The seal sheets 28a (28b) are opposite each other and extend toward the storage section 18.

Abstract: A film for a display device produced by using a transparent (crosslinked) resin film formed of a composition including a cyclic olefin addition copolymer of the present invention has optical transparency, heat resistance, liquid crystal resistance, dimensional stability, and adhesion and is suitably used as an alternative to a glass substrate of a liquid crystal display device and an EL display device. The transparent (crosslinked) resin film can be used as a polarizing film, surface protective film, retardation film, transparent conductive film, light diffusion film, film for an EL display device, transparent conductive composite material, antireflection film, and the like.

Abstract: A coating composition excellent in dispersion stability of a photocatalyst even in a highly hydrophobic alcohol, excellent in storage stability, giving a coating layer excellent in durability and adhesion, and having a photocatalytic function, which comprises (a) at least one component selected from the group consisting of an organosilane represented by (R1)nSi (OR2)4-n (wherein, R1 represents a monovalent organic group; R2 represents an alkyl group or an acyl group; and n is an integer ranging from 0 to 2), a hydrolyzate and a condensates thereof; (b) an organosiloxane oligomer having an SiO bond and a specific Mw; (c) a photocatalyst; and (d-1) an organic solvent having a surface tension at 20° C. of 260 &mgr;N/cm or less.

Abstract: A film for a display device produced by using a transparent (crosslinked) resin film formed of a composition including a cyclic olefin addition copolymer of the present invention has optical transparency, heat resistance, liquid crystal resistance, dimensional stability, and adhesion and is suitably used as an alternative to a glass substrate of a liquid crystal display device and an EL display device. The transparent (crosslinked) resin film can be used as a polarizing film, surface protective film, retardation film, transparent conductive film, light diffusion film, film for an EL display device, transparent conductive composite material, antireflection film, and the like.

Abstract: The present invention intends to provide a polishing pad and a multi-layer polishing pad that can particularly effectively suppress scratch from occurring. The polishing pad of the invention comprises at least one part selected from a groove (a) having at least one kind of shape selected from annular, lattice-like and spiral form on a polishing surface side, a concave portion (b) and a through hole (c). In the above, surface roughness of an inner surface of the part is 20 &mgr;m or less and the polishing pad is used for chemical mechanical polishing.

Abstract: A composition comprising a cyclic olefin addition copolymer containing recurring units of the following formulas (1) and (2), and at least one compound selected from (A) a compound acting as an acid when heated to 50° C. or higher, (B) a metal compound of an alkoxy compound, aryloxy compound, carboxyl compound, &bgr;-diketone compound, halogen compound, or oxide, (C) an organic carboxylic acid, organic phosphoric acid, organic sulfonic acid, ammonia, primary to tertiary amine compound, or quaternary ammonium hydroxide compound. The composition exhibits excellent optical transparency, solvent resistance, dimensional stability, heat resistance, and adhesion to metals and inorganic materials, and suitable for use in optical transparent materials and electronic material parts, to a cross-linked product obtained by crosslinking the composition via siloxane bonds, and to a film, sheet, or coating made from the composition.

Abstract: A gas barrier coating composition comprising (a) a polyvinyl alcohol resin, (b) a metal alcoholate of the formula R1mM(OR2)n (wherein M Ti, Zr, or Al, R1 is C1-8 organic group, R2 is C1-5 alkyl, C1-6 acyl, or phenyl, and m and n are 0 or more, with m+n representing the valence of M), a hydrolyzate, condensate, or chelate compound of the metal alcoholate, a hydrolyzate or condensate of the metal chelate compound, a metal acylate of the of the formula R1mM(OR2)n, a hydrolyzate or condensate of the metal acylate, and (c) an organosilane of the formula R3pSi(OR4)4−p (wherein R3is C1-8 organic group, R4 is C1-5 alkyl, C1-6 acyl, or phenyl, and p is 0-2), a hydrolyzate or condensate of the organosilane.

Abstract: A coating composition excellent in storage stability, excellent in coating appearance, adhesion and weather resistance, high in hardness, having ultraviolet absorbing ability, and capable of preventing deterioration of a ground or a substrate, which comprises (A) a polymer containing (a1) a silyl group having a silicon atom bound to a hydrolytic group and/or a hydroxyl group, (a2) a group having ultraviolet absorbing ability and (a3) a group having ultraviolet stability in the same polymer chain, and further optionally comprises (B) at least one component selected from the group consisting of an organosilane represented by (R1)nSi(OR2)4-n, a hydrolyzate of the organosilane and a condensate of the organosilane; and a cured product thereof.

Abstract: A composition comprising a cyclic olefin addition copolymer containing recurring units of the following formulas (1) and (2), 1

Abstract: A coating composition excellent in dispersion stability of a photocatalyst even in a highly hydrophobic alcohol, excellent in storage stability, giving a coating layer excellent in durability and adhesion, and having a photocatalytic function, which comprises (a) at least one component selected from the group consisting of an organosilane represented by (R1)nSi (OR2)4-n (wherein, R1 represents a monovalent organic group; R2 represents an alkyl group or an acyl group; and n is an integer ranging fram 0 to 2), a hydrolyzate and a condensates thereof; (b) an organosiloxane oligomer having an SiO bond and a specific Mw; (c) a photocatalyst: and (d-1) an organic solvent having a surface tension at 20° C. of 260 &mgr;N/cm or less.