Patents by Inventor Kouji Nakanishi

Kouji Nakanishi has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20240304548
    Abstract: A semiconductor memory device of the embodiment includes first to fourth gate electrode layers which extend in a first direction, a first semiconductor layer which extends in a second direction intersecting the first direction and is provided between the first gate electrode layer and the third gate electrode layer, and between the second gate electrode layer and the fourth gate electrode layer, a first wiring layer which extends in a third direction intersecting the first direction and the second direction and is electrically connected to the first gate electrode layer, a second wiring layer which is electrically connected to the second gate electrode layer, a third wiring layer which extends in the third direction and is electrically connected to the third gate electrode layer, and a fourth wiring layer which extends in the third direction and is electrically connected to the fourth gate electrode layer.
    Type: Application
    Filed: February 27, 2024
    Publication date: September 12, 2024
    Applicant: Kioxia Corporation
    Inventors: Toru NAKANISHI, Fumitaka ARAI, Kouji MATSUO
  • Publication number: 20230220240
    Abstract: Provided are abrasive grains and a composition for chemical mechanical polishing which are for selectively polishing a silicon nitride film, and which are applicable not only to silicon oxide films but also to amorphous silicon films and polysilicon films. This method for manufacturing abrasive grains includes: a first step of heating a mixture which contains particles having a sulfanyl group (—SH) fixed to the surface thereof via covalent bonds, and which contains a compound having carbon-carbon unsaturated double bonds; and a second step, which is performed after the first step, of further adding a peroxide and carrying out heating.
    Type: Application
    Filed: May 25, 2021
    Publication date: July 13, 2023
    Applicant: JSR CORPORATION
    Inventors: Takanori Yanagi, Pengyu Wang, Kouji Nakanishi, Yuuya Yamada, Atsushi Baba
  • Publication number: 20230064047
    Abstract: Provided are a composition for chemical mechanical polishing and a method for chemical mechanical polishing, whereby a tungsten film as a wiring material can be polished at high speed, and the occurrence of surface defects in a polished surface can be reduced. A composition for chemical mechanical polishing pertaining contains (A) alumina particles, at least a portion of the surface of which is coated with a coating film of silica alumina, and (B) a liquid medium.
    Type: Application
    Filed: November 18, 2020
    Publication date: March 2, 2023
    Applicant: JSR CORPORATION
    Inventors: Pengyu Wang, Kouji Nakanishi, Tatsuya Yamanaka
  • Publication number: 20230034503
    Abstract: Provided are a composition for chemical mechanical polishing and a chemical mechanical polishing method, which enable reduction in occurrence of surface defects in a polished surface and which enable high speed polishing of a tungsten film which is a wiring material. The composition for chemical mechanical polishing contains: (A) particles containing alumina and having a functional group represented by general formula (1); and (B) a liquid medium. (1): —SO3?M+ (In the formula, M+ represents a monovalent cation.
    Type: Application
    Filed: November 18, 2020
    Publication date: February 2, 2023
    Applicant: JSR CORPORATION
    Inventors: Pengyu Wang, Kouji Nakanishi, Tatsuya Yamanaka
  • Publication number: 20200024483
    Abstract: An aqueous dispersion for chemical mechanical polishing includes: (A) silica particles; (B) at least one kind selected from the group consisting of organic acids and salts thereof; and (C) at least one kind selected from the group consisting of amino group-containing silane compounds and condensates thereof, and has a pH of 7 or more and 14 or less.
    Type: Application
    Filed: June 14, 2019
    Publication date: January 23, 2020
    Applicant: JSR Corporation
    Inventors: Masashi Okamoto, Yuuji Hirai, Eiichirou Kunitani, Kouji Nakanishi
  • Patent number: 5247292
    Abstract: A sensor signal transmission system for transmitting serially sensor signals produced in parallel by a plurality of sensors installed at a remote station to a central control station. The central control station includes a clock generating circuit, a signal conversion circuit for converting a voltage of a power supply source into clock-pulse superposed voltage signal, a start signal generating circuit, and a data extracting/converting circuit for detecting levels of an input signal to the central control station at the timing of the clock signal. The local station is connected to the central control station and signal includes a power generating circuit for generating a source voltage required for electrical energization of the sensors by smoothing the pulse superposed voltage signal. The clock pulses are modulated by the sensor state signals, which modulation is detected by the data extracting/converting circuit of the central station for evaluation or other processing thereof.
    Type: Grant
    Filed: September 25, 1990
    Date of Patent: September 21, 1993
    Assignees: Nakamura Kiki Engineering Co. Ltd., Precision Industries Ltd. Kuroda
    Inventors: Kouji Nakanishi, Yoshitane Saito
  • Patent number: 5229628
    Abstract: An electroluminescence device is constituted by sequentially stacking a glass substrate, a transparent electrode, a luminescent layer, an interlayer containing a semiconductor having a band gap of 2.4 eV or more, a current-limiting layer containing a conductive powder, and a backplate.
    Type: Grant
    Filed: July 26, 1990
    Date of Patent: July 20, 1993
    Assignee: Nippon Sheet Glass Co., Ltd.
    Inventors: Shiro Kobayashi, Yuichi Aoki, Kouji Nakanishi, Toshitaka Shigeoka, Tetsuro Yoshii, Katsuhisa Enjoji, Etsuo Ogino