Abstract: This invention relates to a vacuum processing apparatus having vacuum processing chambers the insides of which must be dry cleaned, and to a method of operating such an apparatus. When the vacuum processing chambers are dry-cleaned, dummy substrates are transferred into the vacuum processing chamber by substrates conveyor means from dummy substrate storage means which is disposed in the air atmosphere together with storage means for storing substrates to be processed, and the inside of the vacuum processing chamber is dry-cleaned by generating a plasma. The dummy substrate is returned to the dummy substrate storage means after dry cleaning is completed. Accordingly, any specific mechanism for only the cleaning purpose is not necessary and the construction of the apparatus can be made simple.

Abstract: This invention relates to a vacuum processing apparatus having vacuum processing chambers the insides of which must be dry cleaned, and to a method of operating such an apparatus. When the vacuum processing chambers are dry-cleaned, dummy substrates are transferred into the vacuum processing chamber by substrates conveyor means from dummy substrate storage means which is disposed in the air atmosphere together with storage means for storing substrates to be processed, and the inside of the vacuum processing chamber is dry-cleaned by generating a plasma. The dummy substrate is returned to the dummy substrate storage means after dry cleaning is completed. Accordingly, any specific mechanism for only the cleaning purpose is not necessary and the construction of the apparatus can be made simple.

Abstract: A wafer conveyor system for use in a vacuum processing apparatus wherein the conveyor structure is provided with a robot disposed in the conveyor chamber of the vacuum loader. The robot includes an arm which is extendible into the lock chambers which are connected to the conveyor structure.

Abstract: A wafer conveyor system for used in a vacuum processing apparatus wherein the conveyor structure is provided with a transfer structure and a robot apparatus is arranged on the transfer structure. The robot provides for rotation of the wafer horizontally from a position in a cassette to an opposite postion of the cassette.

Abstract: A vacuum processing apparatus which includes a cassette mount table for holding at least one cassette, a conveying structure that includes a robot, a cassette table for holding the cassette, an additional conveying structure for transferring a wafer held on the cassette table. Further, the apparatus is provided with a vacuum loader which is connected to the additional conveying device by a lock chamber. a controller system controls the second conveyor structure and manages the replacement of the cassette on the cassette table; and further, instructs the replacement of the cassette.

Abstract: This invention relates to a vacuum processing apparatus having vacuum processing chambers the insides of which must be dry cleaned, and to a method of operating such an apparatus. When the vacuum processing chambers are dry-cleaned, dummy substrates are transferred into the vacuum processing chamber by substrates conveyor means from dummy substrate storage means which is disposed in the air atmosphere together with storage means for storing substrates to be processed, and the inside of the vacuum processing chamber is dry-cleaned by generating a plasma. The dummy substrate is returned to the dummy substrate storage means after dry cleaning is completed. Accordingly, any specific mechanism for only the cleaning purpose is not necessary and the construction of the apparatus can be made simple.

Abstract: A transferring device for a semiconductor wafer which transfers a wafer storing structure to a table and/or other positions within the vicinity of a vacuum processing apparatus and removes wafers from the wafer storing structure. The transfer devices maintain a horizontally transferring state of both the wafer storing structure and of the wafers in the wafer storing structure.

Abstract: A vacuum processing system, including a vacuum processing chamber for processing wafers, provides a controller for controlling a wafer processing mode and a cleaning mode for the processing chamber. The vacuum processing system further provides for a wafer moving mechanism which is controlled by the controller and allows for the transferring of a dummy wafer into the processing chamber when the cleaning mode is started and then returning the dummy wafer when the cleaning mode is finished.

Abstract: This invention relates to a vacuum processing apparatus having vacuum processing chambers the insides of which must be dry cleaned, and to a method of operating such an apparatus. When the vacuum processing chambers are dry-cleaned, dummy substrates are transferred into the vacuum processing chamber by substrates conveyor means from dummy substrate storage means which is disposed in the air atmosphere together with storage means for storing substrates to be processed, and the inside of the vacuum processing chamber is dry-cleaned by generating a plasma. The dummy substrate is returned to the dummy substrate storage means after dry cleaning is completed. Accordingly, any specific mechanism for only the cleaning purpose is not necessary and the construction of the apparatus can be made simple.

Abstract: A method and apparatus for transferring a substrate that includes a cassette table capable of holding a plurality of cassettes, wherein the cassettes are capable of receiving a plurality of substrates. An atmospheric loader is arranged between the plurality of cassettes and two lock chambers, and an atmospheric transferring device is provided for transferring one of the plurality of substrates to or from a substrate process.

Abstract: A vacuum processing apparatus which includes a means for transferring wafer cassettes from a transferring chamber to a lock chamber. The wafer cassettes are mounted within a cassette table in a vertical direction and a first transferring means carries a wafer to and from the cassette tables. The vacuum processing apparatus further includes lock chambers into which the wafers are carried my the first transferring means. A second transferring means carries the wafers to either of the lock chambers.

Abstract: A wafer conveyor system for use in a vacuum processing apparatus wherein the conveyor structure is provided with a transfer structure and a robot apparatus is arranged on the transfer structure. The robot provides for rotation of the wafer horizontally from a position in a cassette to an opposite position of the cassette.

Abstract: A vacuum processing method and apparatus processing units for conducting processing, a transfer processing unit connected with the plurality of processing units for carrying wafers, and a control unit for controlling the processing units. A processing order information storing device stores a processing order of the wafers for the processing units, an operational information signal generating device generates an operational information signal indicating an operable or inoperable state of each of the processing units, an operational information signal storing device stores the operational information signal indicating the state of each of the processing units, and a control device matches and processes the processing order information and the operational information signal, and continues operation without using an inoperable processing unit while using other operable processing units.

Abstract: A method of operating a vacuum processing system including a plurality of processing units for processing wafers, a transferring unit for carrying wafers, and a control unit for controlling the processing units and the transferring unit, wherein at least two of the plurality of processing units are connected to the transferring unit and the wafers are processed using the processing units The method includes processing the wafers in each of the processing units and recovering the wafers thus processed into a cassette, carrying a cleaning dummy wafer into the processing unit in which the wafers have been processed using the transferring unit, cleaning the interior of the processing unit into which the cleaning dummy wafer has been carried, recovering the cleaning dummy wafer into a cassette, and processing the wafers in the processing unit thus cleaned.

Abstract: A vacuum processing apparatus and method wherein a plurality of processing units are for conducting processing, a transfer processing unit is connected with the plurality of processing units for carrying wafers to the processing units, a transfer device is disposed in the transfer processing unit and carries the wafers and cassettes for containing the wafers, and a control unit is provided for conducting transfer control for transferring the wafers from respective cassettes to the transfer processing unit. The wafers are processed by using the plural processing units, and at least two of the cassettes are used. Parallel processing is conducted of applying different processing to the wafers contained on each of the cassettes by applying different recipes and the wafers, after applying the parallel processing, are turned to the original cassette.

Abstract: A vacuum processing apparatus which includes a cassette mount table for holding a cassette, a conveying structure for transferring a wafer from the held on the cassette mount table, a robot, and a vacuum loader. The vacuum loader is provided with a vacuum conveyor chamber and a conveying structure which further include an additional robot.

Abstract: This invention relates to a vacuum processing apparatus having vacuum processing chambers the insides of which must be dry cleaned, and to a method of operating such an apparatus. When the vacuum processing chambers are dry-cleaned, dummy substrates are transferred into the vacuum processing chamber by substrates conveyor means from dummy substrate storage means which is disposed in the air atmosphere together with storage means for storing substrates to be processed, and the inside of the vacuum processing chamber is dry-cleaned by generating a plasma. The dummy substrate is returned to the dummy substrate storage means after dry cleaning is completed. Accordingly, any specific mechanism for only the cleaning purpose is not necessary and the construction of the apparatus can be made simple.

Abstract: The present invention provides a remote diagnostic system and diagnostic method to ensure harmony between two requirements of protection of company security and prevention of increased economic loss in the remote diagnosis of facilities.

Abstract: This invention relates to a vacuum processing apparatus having vacuum processing chambers the insides of which must be dry cleaned, and to a method of operating such an apparatus. When the vacuum processing chambers are dry-cleaned, dummy substrates are transferred into the vacuum processing chamber by substrates conveyor means from dummy substrate storage means which is disposed in the air atmosphere together with storage means for storing substrates to be processed, and the inside of the vacuum processing chamber is dry-cleaned by generating a plasma. The dummy substrate is returned to the dummy substrate storage means after dry cleaning is completed. Accordingly, any specific mechanism for only the cleaning purpose is not necessary and the construction of the apparatus can be made simple.