Patents by Inventor Kouji Ohkoshi

Kouji Ohkoshi has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 5604063
    Abstract: An electrophotographic member which can give printed images of high quality and is markedly high in photoresponsiveness can be provided without using halogen solvents by using a composition for charge transport layer which contains a polycarbonate resin having a recurring structural unit represented by the following formula (I) and, if necessary, a specific styryl compound, a specific hydrazone compound and the like: ##STR1## wherein R.sub.1 and R.sub.2 =alkyl, etc.R.sub.3 through R.sub.18 =H, alkyl, etc.k/m=1/1-10/1.
    Type: Grant
    Filed: November 16, 1992
    Date of Patent: February 18, 1997
    Assignee: Hitachi Chemical Company, Ltd.
    Inventors: Keiichi Endo, Seiji Miyaoka, Kouji Ohkoshi, Susumu Kaneko, Yasuo Katsuya, Akira Kageyama, Yoshii Morishita
  • Patent number: 5534375
    Abstract: A charge transport layer formed from a composition comprising a mixed solvent containing alkoxybenzene and a charge transport material, or a photoconductive layer formed from a composition comprising alkoxybenzene and an organic photoconductive material are effective for producing electrophotographic members excellent in image without damaging the circumstances as well as stable in maintaining good charging characteristics and dark decay characteristics after repeated use.
    Type: Grant
    Filed: December 22, 1994
    Date of Patent: July 9, 1996
    Assignee: Hitachi Chemical Co., Ltd.
    Inventors: Susumu Kaneko, Kouji Ohkoshi, Keiichi Endo, Seiji Miyaoka, Megumi Matsui, Shigeru Hayashida, Takayuki Akimoto, Mikio Itagaki
  • Patent number: 5380805
    Abstract: In one aspect, the present invention relates to polyimides having excellent thermal resistance and process for preparing the same comprising carrying out condensation of 4,4'-bis(3-aminophenoxy)biphenyl with pyromellitic dianhydride in the presence of a different diamine compound and optionally with a different tetracarboxylic acid dianhydride.In a second aspect, the present invention relates to a heat resistant resin composition consisting essentially of an aromatic polyetherimide and a defined polyimide.In a third aspect, the present invention relates to a polyimide resin composition comprised on a defined polyimide and a separate high-temperature engineering polymer.In a fourth aspect, the present invention relates to a resin composition comprised of a defined polyimide and an aromatic polyamideimide.
    Type: Grant
    Filed: October 29, 1993
    Date of Patent: January 10, 1995
    Assignee: Mitsui Toatsu Chemicals, Inc.
    Inventors: Shoji Tamai, Masahiro Ohta, Saburo Kawashima, Katsuaki Iiyama, Hideaki Oikawa, Akihiro Yamaguchi, Kouji Ohkoshi, Masao Yoshikawa
  • Patent number: 5288843
    Abstract: In one aspect, the present invention relates to polyimides having excellent thermal resistance and process for preparing the same comprising carrying out condensation of 4,4'-bis(3-aminophenoxy)biphenyl with pyromellitic dianhydride in the presence of a different diamine compound and optionally with a different tetracarboxylic acid dianhydride.In a second aspect, the present invention relates to a heat resistant resin composition consisting essentially of an aromatic polyetherimide and a defined polyimide.In a third aspect, the present invention relates to a polyimide resin composition comprised on a defined polyimide and a separate high-temperature engineering polymer.In a fourth aspect, the present invention relates to a resin composition comprised of a defined polyimide and an aromatic polyamideimide.
    Type: Grant
    Filed: November 5, 1990
    Date of Patent: February 22, 1994
    Assignee: Mitsui Toatsu Chemicals, Inc.
    Inventors: Shoji Tamai, Masahiro Ohta, Saburo Kawashima, Katsuaki Iiyama, Hideaki Oikawa, Akihiro Yamaguchi, Kouji Ohkoshi, Masao Yoshikawa
  • Patent number: 5278276
    Abstract: Polyimide having repeating units of the following formula (I) and its polyamic acid precursor having repeating units of the following formula (II) are disclosed; ##STR1## (where Y is a radical selected from the group consisting of a bond, divalent hydrocarbon having 1 to 10 carbons, hexafluorinated isopropylidene, carbonyl, thio, sulfinyl, sulfonyl and oxide, and R is a tetra-valent radical selected from the group consisting of aliphatic radical having 2 and more carbons, cyclo-aliphatic radical, monoaromatic radical, condensed polyaromatic radical, and non-condensed polyaromatic radical wherein aromatic radicals are mutually connected with a bond or a crosslinking function).Typical examples of polyimide and polyamic acid include where Y is thio radical and R is ##STR2## Y is a bond and R is III or IV, and Y is isopropylidene radical and R is IV.The polymers can be prepared from corresponding diamine and tetracarboxylic acid dianhydride.
    Type: Grant
    Filed: January 26, 1993
    Date of Patent: January 11, 1994
    Assignee: Mitsui Toatsu Chemicals, Incorporated
    Inventors: Masahiro Ohta, Saburo Kawashima, Yoshiho Sonobe, Shoji Tamai, Hideaki Oikawa, Kouji Ohkoshi, Akihiro Yamaguchi
  • Patent number: 5205894
    Abstract: Polyimide having repeating units of the following formula (I) and its polyamic acid precursor having repeating units of the following formula (II) are disclosed; ##STR1## (where Y is a radical selected from the group consisting of a bond, divalent hydrocarbon having 1 to 10 carbons, hexafluorinated isopropylidene, carbonyl, thio, sulfinyl, sulfonyl and oxide, and R is a tetra-valent radical selected from the group consisting of aliphatic radical having 2 and more carbons, cyclo-aliphatic radical, monoaromatic radical, condensed polyaromatic radical, and non-condensed polyaromatic radical wherein aromatic radicals are mutually connected with a bond or a crosslinking function).Typical examples of polyimide and polyamic acid include where Y is thio radical and R is ##STR2## Y is a bond and R is III or IV, and Y is isopropylidene radical and R is IV.The polymers can be prepared from corresponding diamine and tetracarboxylic acid dianhydride.
    Type: Grant
    Filed: June 17, 1991
    Date of Patent: April 27, 1993
    Assignee: Mitsui Toatsu Chemicals, Inc.
    Inventors: Masahiro Ohta, Saburo Kawashima, Yoshiho Sonobe, Shoji Tamai, Hideaki Oikawa, Kouji Ohkoshi, Akihiro Yamaguchi
  • Patent number: 5155191
    Abstract: By dispersing and polymerizing at least one N-alkyl-or N-alkylene-substituted (meth)acrylamide or a mixture of at least one N-alkyl- or N-alkylene-substituted (meth)acrylamide and other copolymerizable monomer is an aqueous inorganic salt solution having inorganic particulates suspended, there is provided a preparation process of granular polymers containing no impurities such as polymer stabilizers, surface active agents, etc. The granular polymers are useful as concentrating agents, slow releasing base materials, etc.
    Type: Grant
    Filed: February 14, 1992
    Date of Patent: October 13, 1992
    Assignee: Mitsui Toatsu Chemicals, Incorporated
    Inventors: Hiroshi Itoh, Takashi Abe, Kouji Ohkoshi, Atsuhiko Nitta
  • Patent number: 5087689
    Abstract: Polyimide having repeating units of the following formula (I) and its polyamic acid precursor having repeating units of the following formula (II) are disclosed; ##STR1## (where Y is a radical selected from the group consisting of a bond, divalent hydrocarbon having 1 to 10 carbons, hexafluorinated isopropylidene, carbonyl, thio, sulfinyl, sulfonyl and oxide, and R is a tetra-valent radical selected from the group consisting of aliphatic radical having 2 and more carbons, cyclo-aliphatic radical, monoaromatic radical, condensed polyaromatic radical, and noncondensed polyaromatic radical wherein aromatic radicals are mutually connected with a bond or a crosslinking function).Typical examples of polyimide and polyamic acid include where Y is thio radical and R is ##STR2## Y is a bond and R is III or IV, and Y is isopropylidene radical and R is IV.The polymers can be prepared from corresponding diamine and tetracarboxylic acid dianhydride.
    Type: Grant
    Filed: November 9, 1990
    Date of Patent: February 11, 1992
    Assignee: Mitsui Toatsu Chemicals, Inc.
    Inventors: Masahiro Ohta, Saburo Kawashima, Yoshiho Sonobe, Shoji Tamai, Hideaki Oikawa, Kouji Ohkoshi, Akihiro Yamaguchi
  • Patent number: 4847349
    Abstract: Polyimide having repeating units of the following formula (I) and its polyamic acid precursor having repeating units of the following formula (II) are disclosed; ##STR1## (where Y is a radial selected from the group consisting of a bond, divalent hydrocarbon having 1 to 10 carbons, hexafluorinated isopropylidene, carbonyl, thio, sulfinyl, sulfonyl and oxide, and R is a tetra-valent radical selected from the group consisting of aliphatic radical having 2 and more carbons, cyclo-aliphatic radical, monoaromatic radical, condensed polyaromatic radical, and noncondensed polyaromatic radical wherein aromatic radicals ae mutually connected with a bond or a crosslinking function).Typical examples of polyimide and polyamic acid include where Y is thio radical and R is ##STR2## Y is a bond and R is III or IV, andy is isopropylidene radical and R is IV.The polymers can be prepared from corresponding diamine and tetracarboxylic acid dianhydride.
    Type: Grant
    Filed: June 3, 1987
    Date of Patent: July 11, 1989
    Assignee: Mitsui Toatsu Chemicals, Inc.
    Inventors: Masahiro Ohta, Saburo Kawashima, Yoshiho Sonobe, Shoji Tamai, Hideaki Oikawa, Kouji Ohkoshi, Akihiro Yamaguchi
  • Patent number: 4795798
    Abstract: This invention discloses high-temperature adhesives having a good light-transmittance and excellent high-temperature flowability which comprises polyimide having recurring units represented by the following formula (I) ##STR1## (where R is a tetra-valent radical selected from the group consisting of aliphatic radical having not less than two carbons, cyclo-aliphatic radical, monoaromatic radical, condensed polyaromatic radical, and non condensed polyaromatic radical wherein aromatic radicals are mutually connected with a bond or a crosslinking function).
    Type: Grant
    Filed: February 25, 1987
    Date of Patent: January 3, 1989
    Assignee: Mitsui Toatsu Chemicals, Inc.
    Inventors: Shoji Tamai, Saburo Kawashima, Masahiro Ohta, Hideaki Oikawa, Kouji Ohkoshi, Akihiro Yamaguchi