Abstract: The invader detector has a fixing portion attached and fixed within a vehicle, a sensor containing portion for enclosing an ultrasonic sensor for detecting an invader into the vehicle, and an angular displacement shaft for angularly displacing the sensor containing portion. The sensor containing portion can be driven to a detection position for detecting the invader into the vehicle or a storage position.

Abstract: The invader detector has a fixing portion attached and fixed within a vehicle, a sensor containing portion for enclosing an ultrasonic sensor for detecting an invader into the vehicle, and an angular displacement shaft for angularly displacing the sensor containing portion. The sensor containing portion can be driven to a detection position for detecting the invader into the vehicle or a storage position.

Abstract: A plasma generating apparatus capable of improving the uniformity of a plasma processing and coping with a larger diameter of a substrate is obtained. Microwaves are distributed and emitted from a waveguide through the branching portions of a T branch to four rod antennas. The microwaves are introduced through four dielectric tubes into a vacuum vessel. In the vacuum vessel, a multi-cusp magnetic field and an electron cyclotron resonance region are caused by permanent magnets located around the vessel and, by an interaction between a vibrational electric field of the microwaves and a magnetic field, highly uniform plasma is generated in a region where a substrate or the like is subjected to a plasma processing.

Abstract: There is provided a plasma generating apparatus comprising: a waveguide for guiding a microwave; a vacuum vessel connected to the waveguide, having a means for supplying a gas for discharging electrons and a means for evacuating; and a dielectric member in a tube-like shape or a rod-like shape which is inserted in the vacuum vessel, wherein the dielectric member is provided with a means for emitting the microwave, whereby it is possible to apply the electric power of microwave effectively to plasma of high density exceeding so-called cut-off density and to homogenize the distribution of plasma in the vacuum vessel.

Abstract: In a plasma apparatus, electric power is transmitted from a high-frequency power supply to an electrode in a plasma chamber through a feeding cable. A stub connected to the feeding cable as a matching component removes the capacitive component of the impedance of a plasma produced in the plasma chamber and equalizes the resistive component of the impedance of the plasma to the characteristic impedance of the feeding cable. As a result, the impedance of the plasma and the characteristic impedance of the feeding cable are matched, and the transmitting efficiency of the electric power is enhanced. A phase shift circuit may be used instead of the stub.