Patents by Inventor Kouji Yokotani
Kouji Yokotani has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 11845839Abstract: A film having a dielectric dissipation factor at a frequency of 1 kHz and 160° C. of 0.02% or lower and a dielectric breakdown strength at 160° C. of 400 V/?m or higher. Also disclosed is a film including at least one fluoropolymer selected from a tetrafluoroethylene/perfluoro(alkyl vinyl ether) copolymer and a tetrafluoroethylene/hexafluoropropylene copolymer, the fluoropolymer having a crystallinity of 65% or higher.Type: GrantFiled: October 29, 2018Date of Patent: December 19, 2023Assignee: DAIKIN INDUSTRIES, LTD.Inventors: Mayuko Tatemichi, Takeshi Hazama, Nobuyuki Komatsu, Tatsuya Higuchi, Kouji Yokotani, Akio Higaki, Tomohiro Tanaka
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Patent number: 11479647Abstract: The invention provides a film having a high relative permittivity, a high volume resistivity, and a high breakdown strength. The film has a relative permittivity of 9 or higher at a frequency of 1 kHz and 30° C., a volume resistivity of 5E+15 ?·cm or higher at 30° C., and a breakdown strength of 500 V/?m or higher.Type: GrantFiled: September 27, 2017Date of Patent: October 25, 2022Assignee: DAIKIN INDUSTRIES. LTD.Inventors: Takeshi Hazama, Nobuyuki Komatsu, Kouji Yokotani, Mayuko Tatemichi, Tatsuya Higuchi, Keiko Koga
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Publication number: 20220267540Abstract: A fluororesin film contains a fluororesin. The fluororesin contains two fluororesin species having different composition ratios of polymerized units. The fluororesin film has on at least one surface thereof a ten-point average roughness of 0.100 to 1.200 ?m and an arithmetic average roughness of 0.010 to 0.050 ?m, and the fluororesin film has a breakdown strength of 400 V/?m or higher.Type: ApplicationFiled: May 2, 2022Publication date: August 25, 2022Applicant: Daikin Industries, Ltd.Inventors: Kouji Yokotani, Nobuyuki Komatsu, Takeshi Hazama, Mayuko Tatemichi, Akio Higaki, Tatsuya Higuchi, Keiko Yamazaki
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Patent number: 11352469Abstract: A fluororesin film containing a fluororesin. The fluororesin film has on at least one surface thereof a ten-point average roughness of 0.100 to 1.200 ?m and an arithmetic average roughness of 0.010 to 0.050 ?m. Further, the fluororesin film has a breakdown strength of 400 V/?m or higher.Type: GrantFiled: January 17, 2018Date of Patent: June 7, 2022Assignee: DAIKIN INDUSTRIES. LTD.Inventors: Kouji Yokotani, Nobuyuki Komatsu, Takeshi Hazama, Mayuko Tatemichi, Akio Higaki, Tatsuya Higuchi, Keiko Yamazaki
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Patent number: 11236208Abstract: A film having high heat resistance and a low total haze value and yellowness index. The film includes a fluorinated polyimide layer having a total haze value of 4 or lower, a yellowness index of 3 or lower, and a total luminous transmittance of 90% or higher.Type: GrantFiled: June 30, 2015Date of Patent: February 1, 2022Assignee: DAIKIN INDUSTRIES, LTD.Inventors: Meiten Koh, Kouji Yokotani
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Publication number: 20210023818Abstract: A radio wave absorbing material including a fluoropolymer. The fluoropolymer contains a vinylidene fluoride unit, and the radio wave absorbing material absorbs a radio wave having a frequency in a range of 1 MHz to 100 MHz.Type: ApplicationFiled: March 26, 2019Publication date: January 28, 2021Applicant: DAIKIN INDUSTRIES, LTD.Inventors: Takeshi HAZAMA, Nobuyuki KOMATSU, Kouji YOKOTANI, Mayuko TATEMICHI, Akio HIGAKI, Tomohiro TANAKA
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Publication number: 20200362127Abstract: A film having a dielectric dissipation factor at a frequency of 1 kHz and 160° C. of 0.02% or lower and a dielectric breakdown strength at 160° C. of 400 V/?m or higher. Also disclosed is a film including at least one fluoropolymer selected from a tetrafluoroethylene/perfluoro(alkyl vinyl ether) copolymer and a tetrafluoroethylene/hexafluoropropylene copolymer, the fluoropolymer having a crystallinity of 65% or higher.Type: ApplicationFiled: October 29, 2018Publication date: November 19, 2020Applicant: DAIKIN INDUSTRIES, LTD.Inventors: Mayuko TATEMICHI, Takeshi HAZAMA, Nobuyuki KOMATSU, Tatsuya HIGUCHI, Kouji YOKOTANI, Akio HIGAKI, Tomohiro TANAKA
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Patent number: 10745531Abstract: The present invention provides a film having excellent heat resistance and a small difference between the permittivity at low temperatures and the permittivity at high temperatures. The present invention provides a film having a relative permittivity of 8 or more at a frequency of 1 kHz at 30° C., wherein the rate of change is ?8 to +8% as calculated from a relative permittivity A at a frequency of 1 kHz at 30° C. and a relative permittivity B at a frequency of 1 kHz at 150° C. according to the following formula: Rate of change(%)=(B?A)/A×100.Type: GrantFiled: July 13, 2016Date of Patent: August 18, 2020Assignee: DAIKIN INDUSTRIES, LTD.Inventors: Takashi Kanemura, Eri Mukai, Takeshi Hazama, Tetsuhiro Kodani, Nobuyuki Komatsu, Hisako Nakamura, Kouji Yokotani, Mayuko Tatemichi, Akio Higaki
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Publication number: 20200032014Abstract: The invention provides a film having a high relative permittivity, a high volume resistivity, and a high breakdown strength. The film has a relative permittivity of 9 or higher at a frequency of 1 kHz and 30° C., a volume resistivity of 5E+15 ?·cm or higher at 30° C., and a breakdown strength of 500 V/?m or higher.Type: ApplicationFiled: September 27, 2017Publication date: January 30, 2020Applicant: DAIKIN INDUSTRIES, LTD.Inventors: Takeshi HAZAMA, Nobuyuki KOMATSU, Kouji YOKOTANI, Mayuko TATEMICHI, Tatsuya HIGUCHI, Keiko KOGA
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Publication number: 20190382544Abstract: A fluororesin film containing a fluororesin. The fluororesin film has on at least one surface thereof a ten-point average roughness of 0.100 to 1.200 ?m and an arithmetic average roughness of 0.010 to 0.050 ?m. Further, the fluororesin film has a breakdown strength of 400 V/?m or higher.Type: ApplicationFiled: January 17, 2018Publication date: December 19, 2019Applicant: DAIKIN INDUSTRIES, LTD.Inventors: Kouji YOKOTANI, Nobuyuki KOMATSU, Takeshi HAZAMA, Mayuko TATEMICHI, Akio HIGAKI, Tatsuya HIGUCHI, Keiko YAMAZAKI
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Publication number: 20180223059Abstract: The present invention provides a film having excellent heat resistance and a small difference between the permittivity at low temperatures and the permittivity at high temperatures. The present invention provides a film having a relative permittivity of 8 or more at a frequency of 1 kHz at 30° C., wherein the rate of change is ?8 to +8% as calculated from a relative permittivity A at a frequency of 1 kHz at 30° C. and a relative permittivity B at a frequency of 1 kHz at 150° C. according to the following formula: Rate of change (%)=(B?A)/A×100.Type: ApplicationFiled: July 13, 2016Publication date: August 9, 2018Applicant: DAIKIN INDUSTRIES, LTD.Inventors: Takashi KANEMURA, Eri MUKAI, Takeshi HAZAMA, Tetsuhiro KODANI, Nobuyuki KOMATSU, Hisako NAKAMURA, Kouji YOKOTANI, Mayuko TATEMICHI, Akio HIGAKI
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Publication number: 20170152358Abstract: A film having high heat resistance and a low total haze value and yellowness index. The film includes a fluorinated polyimide layer having a total haze value of 4 or lower, a yellowness index of 3 or lower, and a total luminous transmittance of 90% or higher.Type: ApplicationFiled: June 30, 2015Publication date: June 1, 2017Applicant: DAIKIN INDUSTRIES, LTD.Inventors: Meiten KOH, Kouji YOKOTANI
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Publication number: 20150368413Abstract: The present invention aims to provide a film having a high dielectric constant and a low dissipation factor. The high dielectric film of the present invention includes a vinylidene fluoride/tetrafluoroethylene copolymer (A) with a mole ratio (vinylidene fluoride)/(tetrafluoroethylene) of 95/5 to 80/20. The film includes an ?-crystal structure and a ?-crystal structure. The ratio of the ?-crystal structure is 50% or more.Type: ApplicationFiled: October 16, 2013Publication date: December 24, 2015Applicant: DAIKIN INDUSTRIES, LTD.Inventors: Mayuko TATEMICHI, Miharu OTA, Kouji YOKOTANI, Nobuyuki KOMATSU, Hisako NAKAMURA, Fumiko SHIGENAI, Takeshi HAZAMA, Masakazu KINOSHITA, Meiten KOH, Takuji ISHIKAWA, Takashi IGUCHI, Kazunobu UCHIDA, Tomoyuki FUKATANI, Takahiro KITAHARA, Tetsuhiro KODANI
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Publication number: 20150332855Abstract: The present invention aims to provide a multilayer film which can increase the capacitance. The present invention relates to a multilayer film including a first electrode layer, a resin substrate, a second electrode layer, and a dielectric layer stacked in the order set forth. The dielectric layer includes a vinylidene fluoride/tetrafluoroethylene copolymer (A). The copolymer (A) satisfies a mole ratio (vinylidene fluoride)/(tetrafluoroethylene) of 97/3 to 60/40.Type: ApplicationFiled: November 14, 2013Publication date: November 19, 2015Applicant: DAIKIN INDUSTRIES, LTD.Inventors: Meiten KOH, Nobuyuki KOMATSU, Takeshi HAZAMA, Hisako NAKAMURA, Kouji YOKOTANI, Miharu OTA, Fumiko SHIGENAI, Mayuko TATEMICHI, Masakazu KINOSHITA
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Patent number: 9156930Abstract: Provided is a film for a film capacitor in which electrical insulation, and especially electrical properties at high temperatures are improved while a high dielectric constant of a vinylidene fluoride resin is maintained. The film for a film capacitor includes a tetrafluoroethylene resin (a1) that includes a vinylidene fluoride unit and a tetrafluoroethylene unit in the vinylidene fluoride unit/tetrafluoroethylene unit ratio (mol %) of 0/100 to 49/51 as a film-forming resin (A).Type: GrantFiled: September 21, 2011Date of Patent: October 13, 2015Assignee: DAIKIN INDUSTRIES, LTD.Inventors: Meiten Koh, Eri Mukai, Nobuyuki Komatsu, Kouji Yokotani, Mayuko Tatemichi, Kakeru Hanabusa, Takahiro Kitahara, Takuma Kawabe
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Patent number: 8934216Abstract: The present invention provides a high dielectric film for a film capacitor obtained by molding a film forming composition for a film capacitor comprising a thermoplastic resin (A) and surface-treated high dielectric inorganic particles (B) obtained by treating the surfaces of high dielectric inorganic particles (b1) having a dielectric constant (20° C., 1 kHz) of 100 or more with a low dielectric compound (b2) having a dielectric constant (20° C., 1 kHz) of 10 or less. This high dielectric film for a film capacitor can restrain the decrease of electrical insulating property, in spite of the high dielectric inorganic particles being dispersed at a high filling rate.Type: GrantFiled: December 21, 2009Date of Patent: January 13, 2015Assignee: Daikin Industries, Ltd.Inventors: Kouji Yokotani, Miharu Ota, Mayuko Tatemichi, Nobuyuki Komatsu, Eri Mukai, Meiten Koh
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Patent number: 8871850Abstract: There is provided a highly dielectric film which has high dielectric property, can be formed into a think film and is excellent in winding property (flexibility). The highly dielectric film comprises (A) a vinylidene fluoride polymer, (B) barium titanate oxide particles and/or lead zirconium titanate oxide particles, and (C) an affinity improving agent, wherein the barium titanate oxide particles and/or lead zirconium titanate oxide particles (B) and the affinity improving agent (C) are contained in amounts of 10 to 500 parts by mass and 0.01 to 30 parts by mass, respectively based on 100 parts by mass of the vinylidene fluoride polymer (A).Type: GrantFiled: June 27, 2011Date of Patent: October 28, 2014Assignee: Daikin Industries, Ltd.Inventors: Meiten Koh, Kouji Yokotani, Miharu Matsumura
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Patent number: 8804307Abstract: The present invention relates to a highly dielectric film formed by using (A) a fluorine-containing resin comprising vinylidene fluoride unit and tetrafluoroethylene unit in a total amount of not less than 95% by mole, and provides a film for a film capacitor which has high dielectric property and high withstanding voltage and can be made thin.Type: GrantFiled: January 24, 2008Date of Patent: August 12, 2014Assignee: Daikin Industries, Ltd.Inventors: Meiten Koh, Kouji Yokotani, Miharu Matsumura, Eri Mukai, Nobuyuki Komatsu
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Patent number: 8779047Abstract: There is provided a coating composition comprising (A) a thermoplastic non-fluorine-containing polymer, (B) inorganic ferroelectric particles, (C) an affinity-improving agent comprising at least one of a coupling agent, a surfactant and an epoxy group-containing compound, and (D) a solvent, and there is provided a film formed using the coating composition which has highly dielectric property and low dielectric loss, can be made thin, is excellent in winding property (flexibility) and is suitable as a highly dielectric film for a film capacitor.Type: GrantFiled: July 9, 2007Date of Patent: July 15, 2014Assignee: Daikin Industries, Ltd.Inventors: Meiten Koh, Nobuyuki Komatsu, Kouji Yokotani, Miharu Matsumura
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Patent number: 8675345Abstract: There is provided a thin highly dielectric film for a film capacitor being excellent in mechanical strength, in which highly dielectric inorganic particles can be blended to a dielectric resin at high ratio, and rubber particles (B) and preferably highly dielectric inorganic particles (C) are dispersed in a thermoplastic resin (A).Type: GrantFiled: December 21, 2009Date of Patent: March 18, 2014Assignee: Daikin Industries, Ltd.Inventors: Mayuko Tatemichi, Miharu Ota, Kouji Yokotani, Nobuyuki Komatsu, Eri Mukai, Meiten Koh