Patents by Inventor Kouji Yonemura

Kouji Yonemura has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Positive resist composition and resist pattern formation method
    Patent number: 7364831
    Abstract: A positive resist composition includes a resin component (A) whose alkaline solubility changes by an action of an acid, an acid generator component (B), and polypropylene glycol, wherein the component (A) includes a resin component (A1) including a constitutional unit (a1) represented by general formula (I), a constitutional unit (a2) represented by general formula (II), and a constitutional unit (a3) having an acid dissociable dissolution inhibiting group, wherein R represents a hydrogen atom or a methyl group, and m represents an integer of 1 to 3, wherein R represents a hydrogen atom or a methyl group, and R1 represents alkyl group having a carbon number of 1 to 5, and l represents an integer of 0 to 3.
    Type: Grant
    Filed: May 6, 2005
    Date of Patent: April 29, 2008
    Assignee: Tokyo Ohka Kogyo Co., Ltd.
    Inventors: Kouji Yonemura, Taku Nakao
  • Positive resist composition and resist pattern formation method
    Publication number: 20060014100
    Abstract: A positive resist composition includes a resin component (A) whose alkaline solubility changes by an action of an acid, an acid generator component (B), and polypropylene glycol, wherein the component (A) includes a resin component (A1) including a constitutional unit (a1) represented by general formula (I), a constitutional unit (a2) represented by general formula (II), and a constitutional unit (a3) having an acid dissociable dissolution inhibiting group, wherein R represents a hydrogen atom or a methyl group, and m represents an integer of 1 to 3, wherein R represents a hydrogen atom or a methyl group, and R1 represents alkyl group having a carbon number of 1 to 5, and 1 represents an integer of 0 to 3.
    Type: Application
    Filed: May 6, 2005
    Publication date: January 19, 2006
    Inventors: Kouji Yonemura, Taku Nakao
  • Positive photoresist composition
    Patent number: 6869742
    Abstract: A positive photoresist composition includes (A) an alkali-soluble novolak resin containing 1,2-naphthoquinonediazidosulfonyl groups substituting for part of hydrogen atoms of phenolic hydroxyl groups, (B) an ester of, for example, a compound represented by the following formula with a naphthoquinonediazidosulfonyl compound, and (C) a sensitizer:
    Type: Grant
    Filed: April 1, 2002
    Date of Patent: March 22, 2005
    Assignee: Tokyo Ohka Kogyo Co., Ltd.
    Inventors: Jyunichi Mizuta, Kouji Yonemura, Akira Katano, Satoshi Niikura, Kousuke Doi
  • Positive photoresist composition
    Publication number: 20020182531
    Abstract: A positive photoresist composition includes (A) an alkali-soluble novolak resin containing 1,2-naphthoquinonediazidosulfonyl groups substituting for part of hydrogen atoms of phenolic hydroxyl groups, (B) an ester of, for example, a compound represented by the following formula with a naphthoquinonediazidosulfonyl compound, and (C) a sensitizer: 1
    Type: Application
    Filed: April 1, 2002
    Publication date: December 5, 2002
    Applicant: TOKYO OHKA KOGYO CO., LTD.
    Inventors: Jyunichi Mizuta, Kouji Yonemura, Akira Katano, Satoshi Niikura, Kousuke Doi