Abstract: In the method for inspecting plate patterns which are formed by exposure and development by use of exposure data patterns having a plurality of patterns, the method executes a fine pattern removal processing step, to a plurality of patterns included in the exposure data patterns, including a logical sum processing for changing a plurality of overlaid patterns into a sole pattern; a minus-sizing processing for fining a side of the patterns in a first width; and a plus-sizing processing for thickening the side of the patterns in the first width, thereby forming a reference data pattern. This fine pattern removal processing can remove the fine patterns acting as a cause of pseudo defect included in the exposure data patterns. In the following pattern inspection process, the plate pattern is compared with the reference data pattern, and the disagreement between both the patterns is detected as defective pattern.

Abstract: In the method for inspecting plate patterns which are formed by exposure and development by use of exposure data patterns having a plurality of patterns, the method executes a fine pattern removal processing step, to a plurality of patterns included in the exposure data patterns, including a logical sum processing for changing a plurality of overlaid patterns into a sole pattern; a minus-sizing processing for fining a side of the patterns in a first width; and a plus-sizing processing for thickening the side of the patterns in the first width, thereby forming a reference data pattern. This fine pattern removal processing can remove the fine patterns acting as a cause of pseudo defect included in the exposure data patterns. In the following pattern inspection process, the plate pattern is compared with the reference data pattern, and the disagreement between both the patterns is detected as defective pattern.